Prosecution Insights
Last updated: July 17, 2026
Application No. 18/852,970

INDIUM COMPOUND, INDIUM-CONTAINING THIN FILM DEPOSITION COMPOSITION COMPRISING SAME, AND INDIUM-CONTAINING THIN FILM MANUFACTURING METHOD

Non-Final OA §103§112
Filed
Sep 30, 2024
Priority
Apr 14, 2022 — RE 10-2022-0046350 +1 more
Examiner
HERNANDEZ-KENNEY, JOSE
Art Unit
1717
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Dnf Co. Ltd.
OA Round
1 (Non-Final)
54%
Grant Probability
Moderate
1-2
OA Rounds
1y 6m
Est. Remaining
77%
With Interview

Examiner Intelligence

Grants 54% of resolved cases
54%
Career Allowance Rate
327 granted / 601 resolved
-10.6% vs TC avg
Strong +23% interview lift
Without
With
+22.9%
Interview Lift
resolved cases with interview
Typical timeline
3y 3m
Avg Prosecution
37 currently pending
Career history
644
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
83.3%
+43.3% vs TC avg
§102
4.8%
-35.2% vs TC avg
§112
4.0%
-36.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 601 resolved cases

Office Action

§103 §112
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . As of the response restriction requirement filed on February 2, 2026, claims 1 – 13 are pending. Claim 12 has been amended. Claims 1 – 11 have been withdrawn from consideration. Election/Restrictions Applicant’s election without traverse of Group III, claims 8 – 13 in the reply filed on February 2, 2026 is acknowledged. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Specification The specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant’s cooperation is requested in correcting any errors of which applicant may become aware in the specification. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 9 and 12 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Regarding claims 9 and 12: A broad range or limitation together with a narrow range or limitation that falls within the broad range or limitation (in the same claim) may be considered indefinite if the resulting claim does not clearly set forth the metes and bounds of the patent protection desired. See MPEP § 2173.05(c). In the present instance, claims 9 and 12 recites the broad recitation “…one … or more…”, and the claim also recites “… two or more…” which is the narrower statement of the range/limitation. The claim(s) are considered indefinite because there is a question or doubt as to whether the feature introduced by such narrower language is (a) merely exemplary of the remainder of the claim, and therefore not required, or (b) a required feature of the claims. Claim Rejections - 35 USC § 103 This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim 8, 10 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hostalek et al. US 5015747 A1 (hereinafter “Hostalek”). Regarding claim 8: Hostalek is directed to organometallic compounds for use in gas phase deposition techniques such as MOCVD (Abstract; col 1 lines 1 –30). Such organometallic precursors follow the general formula I disclosed: PNG media_image1.png 200 400 media_image1.png Greyscale In which (Col 2 lines 10 – 35): R1 and R2 independently of one another are each H, a straight-chain or branched alkyl group having up to 7 C atoms, which can be partially or completely fluorinated, a cycloalkyl, alkenyl or cycloalkenyl group having each 3-8 C atoms or an unsubstituted or substituted phenyl group, M is Al, In or Ga, Y is N, P, As or Sb, m is 2, 3 or 4, n and o are each 0 or 1 and n+o is 1. Hostalek discloses that suitable precursors for such techniques include e.g. 1,5-dimethyl-1-inda-5-aza-cyclooctane (col 3 lines 30 –41), which comports with R1 and R2 being methyl m = 3, where the 1 position and 5 position are substituted with indium and nitrogen respectively (M = In, Y = N), and o being zero. Hostalek further discloses an embodiment of their method of depositing gallium onto surfaces [substrates] comprising: charging the bubbler with 1,5-dimethyl-1-galla-5-azacyclooctane; connecting an inert gas inlet to the bubbler and a decomposition chamber/reactor, and depositing gallium within the reactor (col 1 lines 30 – 50, col 5 line 45 – col 6 line 5). Hostalek does not expressly teach a specific embodiment of their method with indium. However, Hostalek clearly contemplates 1,5-dimethyl-1-inda-5-aza-cyclooctane as preferred alongside 1,5-dimethyl-1-galla-5-azacyclooctane. Therefore, it would have been obvious to one of ordinary skill before the effective filing date of the claimed invention to have contemplated and performed the same method as that disclosed with regards to the gallium example because Hostalek indicates that such a deposition has a reasonable expectation of success and a desire to deposit indium films (col 1 lines 4 –20). Regarding claim 10: While Hostalek does not expressly teach an embodiment of their method wherein the deposition temperature is between 200°C and 600°C, Hostalek does disclose that their precursors are for use in an MOCVD method, where precursors are decomposed at temperatures below 1100°C (col 1 lines 20 – 40). Thus Hostalek discloses an overlapping range with regards to temperature. In the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art”, a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990); In re Geisler, 116 F.3d 1465, 1469-71, 43 USPQ2d 1362, 1365-66(Fed. Cir. 1997). See MPEP 2144.05. Claim(s) 8 – 13 is/are rejected under 35 U.S.C. 103 as being unpatentable over Koh et al. US 2014/0335363 A1 (hereinafter “Koh”). Regarding claims 8, 9, 10, 11, 12, 13: Koh is directed to deposition of indium oxide films and indium-gallium-zinc films (IGZO) (Abstract; [0003], [0020], [0052]). In an example, Koh discloses a method comprising: alternatively providing Et2InN(TMS)2 precursor gas, trimethylgallium [gallium precursor], diethylzinc [zinc precursor] and gaseous H2O [meeting claims 9 and 12] to contact the surface of a substrate that is heated to 500°C; and growing the IGZO film from the reaction of the gases with the surface of the substrate ([0052]). With regards to temperature, Koh discloses an overlapping range. In the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art”, a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990); In re Geisler, 116 F.3d 1465, 1469-71, 43 USPQ2d 1362, 1365-66(Fed. Cir. 1997). See MPEP 2144.05. Koh does not expressly teach that the indium precursor is among those represented by claimed Formula 1: Hostalek’s disclosure of such compounds as discussed above in the rejection of claim 8 over Hostalek applies to the present rejection, mutatis mutandis. Additionally, Hostalek discloses that their disclosed compounds are notably stable and resistant to air and oxygen, easy to handle and not self-igniting (col 2 lines 1 – 10, lines 35 – 45). Therefore, it would have been obvious to one of ordinary skill before the effective filing date of the claimed invention to have modified the method of Koh by substituting Koh’s disclosed precursor with that of Hostalek because Hostalek teaches that their precursors are easy to handle, relatively safe and resistant from oxidation. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure: Vaartstra US 6326505 B1, particularly col 6 lines 35 – 60 indicating similar precursor species. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOSE I HERNANDEZ-KENNEY whose telephone number is (571)270-5979. The examiner can normally be reached M-F 6:30-3:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Dah-Wei Yuan can be reached on (571) 272-1295. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JOSE I HERNANDEZ-KENNEY/ Primary Examiner Art Unit 1717
Read full office action

Prosecution Timeline

Sep 30, 2024
Application Filed
Apr 16, 2026
Non-Final Rejection mailed — §103, §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12685048
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
3y 3m to grant Granted Jul 14, 2026
Patent 12668879
ATOMIC LAYER DEPOSITION METHOD FOR METAL THIN FILMS
2y 8m to grant Granted Jun 30, 2026
Patent 12658527
SYSTEM AND METHOD FOR DEPOSITING SEPARATOR MATERIAL
2y 0m to grant Granted Jun 16, 2026
Patent 12649969
METHOD FOR SEASONING A CHAMBER
3y 9m to grant Granted Jun 09, 2026
Patent 12643249
METHOD OF COATING A RAZOR BLADE
3y 0m to grant Granted Jun 02, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
54%
Grant Probability
77%
With Interview (+22.9%)
3y 3m (~1y 6m remaining)
Median Time to Grant
Low
PTA Risk
Based on 601 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month