Prosecution Insights
Last updated: April 19, 2026

Examiner: HERNANDEZ-KENNEY, JOSE

Tech Center 1700 • Art Units: 1717

This examiner grants 54% of resolved cases

Performance Statistics

53.6%
Allow Rate
-11.4% vs TC avg
632
Total Applications
+23.2%
Interview Lift
1215
Avg Prosecution Days
Based on 588 resolved cases, 2023–2026

Rejection Statute Breakdown

0.6%
§101 Eligibility
17.6%
§102 Novelty
44.7%
§103 Obviousness
29.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18215454 SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREOF Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18001580 ADDITIVE MANUFACTURING OF LARGE-AREA COVALENT ORGANIC FRAMEWORK THIN FILMS Final Rejection NORTHWESTERN UNIVERSITY
18226376 System And Method For Applying A Coating Material To A Web Non-Final OA Graphic Packaging International, LLC
18555055 SURFACE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE Non-Final OA Tokyo Electron Limited
18247497 FILLING METHOD AND FILM FORMING APPARATUS Final Rejection Tokyo Electron Limited
17647185 METHOD FOR FORMING FILM AND PROCESSING APPARATUS Final Rejection Tokyo Electron Limited
19107127 MANUFACTURING METHOD FOR OPTICAL FIBER TAPE CORE WIRE AND MANUFACTURING APPARATUS FOR OPTICAL FIBER TAPE CORE WIRE Non-Final OA SWCC Corporation
18268484 CELL CULTURE MICROCARRIER AND CELL CULTURING METHOD Non-Final OA SEKISUI CHEMICAL CO., LTD.
18644475 METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS Non-Final OA ASM IP Holding B.V.
17705206 METHOD AND SYSTEM FOR DEPOSITING SILICON NITRIDE WITH INTERMEDIATE TREATMENT PROCESS Non-Final OA ASM IP Holding B.V.
17543023 METHOD OF FORMING A STRUCTURE INCLUDING SILICON-CARBON MATERIAL, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR FORMING THE STRUCTURE Final Rejection ASM IP Holding B.V.
18929742 METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS Non-Final OA KOKUSAI ELECTRIC CORPORATION
18036975 METHOD OF PRODUCING THIN-FILM Final Rejection ADEKA CORPORATION
18956785 DEPOSITION OF IODINE-CONTAINING CARBON FILMS Final Rejection American Air Liquide, Inc.
18379397 PRECURSORS FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS Non-Final OA Lam Research Corporation
18315778 VISIBLE QUALITY ADDITIVE MANUFACTURED ALUMINUM MIRROR FINISHING Final Rejection Raytheon Company
18785193 METHOD OF MAKING FLAT POTASSIUM-INTERCALATED METALLIC TRANSITION METAL CHALCOGEN NANOARRAYS Non-Final OA CITY UNIVERSITY OF HONG KONG
18446099 METHOD FOR DIRECT FORMATION OF ORIGAMI 3D GRAPHENE ON COPPER FOIL USING CHEMICAL VAPOR DEPOSITION Final Rejection CITY UNIVERSITY OF HONG KONG
18212607 PROCESS FOR AN IPC COATING Non-Final OA FUJIFILM DIMATIX, INC.
18749872 Systems and Methods for Producing Carbon Solids Non-Final OA Soane Labs, LLC
18338017 OXYANIONIC TEMPLATES FOR SURFACE REPLICATION Non-Final OA Dickinson Corporation
18010490 COMPOSITE FILM AND PRODUCTION THEREOF USING A COATING FACILITY Non-Final OA Klebchemie M. G. Becker GmbH & Co. KG

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