Tech Center 1700 • Art Units: 1717 1784 1788
This examiner grants 54% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18215454 | SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREOF | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18212607 | PROCESS FOR AN IPC COATING | Final Rejection | FUJIFILM DIMATIX, INC. |
| 19401507 | METHOD OF FILLING GAP WITH FLOWABLE CARBON LAYER | Non-Final OA | ASM IP Holding B.V. |
| 18644475 | METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS | Non-Final OA | ASM IP Holding B.V. |
| 17543023 | METHOD OF FORMING A STRUCTURE INCLUDING SILICON-CARBON MATERIAL, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR FORMING THE STRUCTURE | Non-Final OA | ASM IP Holding B.V. |
| 18226376 | System And Method For Applying A Coating Material To A Web | Final Rejection | Graphic Packaging International, LLC |
| 18664706 | PLASMA-ENHANCED SILICON NITRIDE DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18585303 | IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION | Final Rejection | Applied Materials, Inc. |
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