Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1717 1784 1788
This examiner grants 55% of resolved cases
Jose Hernandez-Kenney is an examiner in Art Unit 1717, part of Tech Center 1700. He has handled 604 resolved cases, providing a robust data set for analysis. His allowance rate is 54.6 percent, which is a solid indicator of a fair examination process. This 54.6 percent rate suggests that more than half of the applications he reviews result in a granted patent, provided the claims are well-supported. The 604 resolved cases establish a reliable baseline for predicting outcomes in Art Unit 1717.
The interview lift for this examiner is 22.8 percent. This is a strong positive indicator that interviews are a productive tool in his cases. The 22.8 percent lift suggests that verbal discussions can effectively resolve misunderstandings or technical disagreements that might otherwise lead to a final rejection. For applications in Tech Center 1700, leveraging this lift can significantly improve the odds of success beyond the 54.6 percent baseline. Practitioners should prioritize interviews to address complex rejections.
The median days to allowance for his cases is 1202. This timeline is standard and provides a clear expectation for the duration of the prosecution cycle. With 604 resolved cases, the 1202-day median pendency is a stable metric. Applicants can use these figures to develop a realistic strategy that balances the 54.6 percent allowance rate with the strategic use of examiner interviews. The 1202-day duration is a key benchmark for managing client expectations.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18215454 | SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREOF | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18212607 | PROCESS FOR AN IPC COATING | Final Rejection | FUJIFILM DIMATIX, INC. |
| 18802472 | PLANARIZATION METHOD AND METHOD OF MANUFACTURING ARTICLE | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19401507 | METHOD OF FILLING GAP WITH FLOWABLE CARBON LAYER | Non-Final OA | ASM IP Holding B.V. |
| 18644475 | METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS | Non-Final OA | ASM IP Holding B.V. |
| 17666681 | METHOD AND SYSTEM FOR FORMING BORON NITRIDE ON A SURFACE OF A SUBSTRATE | Non-Final OA | ASM IP Holding B.V. |
| 18226376 | System And Method For Applying A Coating Material To A Web | Final Rejection | Graphic Packaging International, LLC |
| 18887130 | FORMING A PASSIVATION COATING FOR MEMS DEVICES | Final Rejection | Texas Instruments Incorporated |
| 17759096 | PROTECTIVE COATING FOR A SEMICONDUCTOR REACTION CHAMBER | Non-Final OA | Lam Research Corporation |
| 19206441 | METHOD OF COATING A SUBSTRATE INCLUDING A MULTI-LAYER COATING | Final Rejection | Applied Materials, Inc. |
| 18909425 | NOBLE GAS PLASMA CURES TO ENABLE INCREASED CROSSLINKING IN LOW-K DIELECTRIC FILMS | Final Rejection | Applied Materials, Inc. |
| 18664706 | PLASMA-ENHANCED SILICON NITRIDE DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18585303 | IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION | Final Rejection | Applied Materials, Inc. |
| 19212511 | Substrate Processing Method and Substrate Processing Apparatus | Final Rejection | Tokyo Electron Limited |
| 18555055 | SURFACE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE | Final Rejection | Tokyo Electron Limited |
| 18785193 | METHOD OF MAKING FLAT POTASSIUM-INTERCALATED METALLIC TRANSITION METAL CHALCOGEN NANOARRAYS | Final Rejection | CITY UNIVERSITY OF HONG KONG |
| 18930500 | METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18561833 | New Precursors For Depositing Films With High Elastic Modulus | Final Rejection | VERSUM MATERIALS US, LLC |
| 18720470 | METHOD FOR PRODUCING INSULATION PRODUCTS BASED ON MINERAL FIBRES OR ORGANIC FIBRES OF NATURAL ORIGIN | Non-Final OA | SAINT-GOBAIN ISOVER |
| 18529626 | GLASS AND CERAMIC STRUCTURES, AND METHODS FOR FABRICATION AND USE THEREOF | Non-Final OA | UNIVERSITY OF MARYLAND, COLLEGE PARK |
| 18928605 | APPLYING TEXTURE TO HARD SUBSTRATE | Final Rejection | HESSELING & SONS, LLC |
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