Prosecution Insights
Last updated: May 29, 2026
Application No. 18/884,420

SEMICONDUCTOR MEASUREMENT DEVICE AND OPERATING METHOD THEREOF

Non-Final OA §102
Filed
Sep 13, 2024
Priority
Feb 27, 2024 — RE 10-2024-0028081
Examiner
STAFIRA, MICHAEL PATRICK
Art Unit
2877
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Electronics Co., Ltd.
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allowance Rate
1119 granted / 1267 resolved
+20.3% vs TC avg
Moderate +9% lift
Without
With
+8.7%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 10m
Avg Prosecution
27 currently pending
Career history
1294
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
68.5%
+28.5% vs TC avg
§102
24.7%
-15.3% vs TC avg
§112
2.3%
-37.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1267 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Claims 11-20 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected Group, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on March 17, 2026. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-3 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by JUNG et al. (2022/0074848). Claim 1 JUNG et al. (2022/0074848) discloses operating method of a semiconductor measurement device including an optical system (Fig. 1, Ref. 1000), comprising: aligning the optical system (Fig. 1, Ref. 1000) and a sample (Fig. 1, Ref. 2000) to be measured; adjusting an angle of an analyzer (Fig. 1, Ref. 620; polarizer; Para. 0045; “and the rotation of a polarizer and the compensator may also be required”; rotation of the polarizer would be adjusting the angle of the analyzer) included in the optical system (Fig. 1, Ref. 1000) to extinguish, with an interference generator (Fig. 1, Ref. 600; “self-interference generator), a first electromagnetic field from a light reflected from the sample (Fig. 2A; black dots with bidirectional arrows), the light including the first electromagnetic field (Fig. 2A, a first polarized beam represented by black dots) and a second electromagnetic field (Fig. 2A, a second polarized beam represented by bidirectional arrows); measuring (Fig. 2A, Ref. 720) an intensity of the second electromagnetic field (Para. 0040); generating a hologram (Para. 0040, lines 1-2) of the sample (Fig. 1, Ref. 2000) by rotating the analyzer to a first rotation angle (Para. 0045; “and the rotation of a polarizer and the compensator may also be required”); and measuring an interference pattern by measuring an intensity of the hologram (Para. 0041; “The image of this interference pattern may be a hologram image. While an ordinary image includes information about only the intensity of light, a hologram image may include information about both the intensity and the phase of light”). PNG media_image1.png 642 388 media_image1.png Greyscale PNG media_image2.png 552 278 media_image2.png Greyscale PNG media_image3.png 376 384 media_image3.png Greyscale Claim 2 JUNG et al. (2022/0074848) discloses the sample (Fig. 1, Ref. 2000) includes a wafer (Para. 0032; “mask or wafer”), and the aligning (Para. 0008; “pupil ellipsometry”) includes aligning the wafer (Fig. 1, Ref. 2000) using an optical vision system (Fig. 1, Ref. 1000). Claim 3 JUNG et al. (2022/0074848) discloses the interference generator (Fig. 2A, Ref. 600) includes a prism (Fig. 2A, Ref. 610) configured to separate the light reflected from the sample (Fig. 1, Ref. 2000) into the first electromagnetic field (Fig. 2A, a first polarized beam represented by black dots) and the second electromagnetic field (Fig. 2A, a second polarized beam represented by bidirectional arrows) having a different polarization to the first electromagnetic field (Para. 0037; “The polarizing prism 610 may split incident light into beams having different polarization states.”). Allowable Subject Matter Claims 4-10 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The closest prior art of JUNG et al. (2022/0074848) discloses a pupil ellipsometry measurement apparatus having a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object. But the prior art fails to show the following: Regarding claim 4, the prior art fails to disclose or make obvious the adjusting the angle of the analyzer comprises: adjusting the angle of the analyzer to be perpendicular to a polarization direction of the first electromagnetic field and to be parallel to a polarization direction of the second electromagnetic field, and in combination with the other recited limitations of claim 1. Regarding claim 5, the prior art fails to disclose or make obvious the rotating the analyzer to the first rotation angle includes rotating the analyzer such that an intensity of the first electromagnetic field is less than the intensity of the second electromagnetic field, and in combination with the other recited limitations of claim 1. Claim 6 would be allowed by the virtue of dependency on the allowable subject matter of claims 1, 5. Regarding claim 7, the prior art fails to disclose or make obvious restoring reflectance information about the sample based on a Kramers-Kronig relation of the intensity of the second electromagnetic field and the intensity of the hologram, and in combination with the other recited limitations of claim 1. Claims 8-10 would be allowed by the virtue of dependency on the allowable subject matter of claims 1, 7. Any inquiry concerning this communication or earlier communications from the examiner should be directed to MICHAEL PATRICK STAFIRA whose telephone number is (571)272-2430. The examiner can normally be reached M-F 6:30am-3pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Tarifur Chowdhury can be reached at 571-272-2287. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MICHAEL P STAFIRA/Primary Examiner, Art Unit 2877 April 15, 2026
Read full office action

Prosecution Timeline

Sep 13, 2024
Application Filed
Apr 20, 2026
Non-Final Rejection mailed — §102
May 08, 2026
Interview Requested
May 26, 2026
Examiner Interview Summary

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
97%
With Interview (+8.7%)
1y 10m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1267 resolved cases by this examiner. Grant probability derived from career allowance rate.

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