DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application is being examined under the pre-AIA first to invent provisions.
Double Patenting
A rejection based on double patenting of the “same invention” type finds its support in the language of 35 U.S.C. 101 which states that “whoever invents or discovers any new and useful process... may obtain a patent therefor...” (Emphasis added). Thus, the term “same invention,” in this context, means an invention drawn to identical subject matter. See Miller v. Eagle Mfg. Co., 151 U.S. 186 (1894); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Ockert, 245 F.2d 467, 114 USPQ 330 (CCPA 1957).
A statutory type (35 U.S.C. 101) double patenting rejection can be overcome by canceling or amending the claims that are directed to the same invention so they are no longer coextensive in scope. The filing of a terminal disclaimer cannot overcome a double patenting rejection based upon 35 U.S.C. 101.
Claims 1-20 are rejected under 35 U.S.C. 101 as claiming the same invention as that of claims of prior U.S. Patent No. US10085335 B2 (Watson 335) This is a statutory double patenting rejection.
See the claims comparison listed below.
US 18908436 claim
Identical with US10085335 B2 claim
1. A device for producing a multi-frequency cold plasma comprising: a housing having a first chamber and a second chamber, wherein the first chamber is communicatively coupled with the second chamber;
an electrode positioned within the first chamber, the electrode being configured to be in electrical communication with a first power source;
an input port configured to introduce a working gas into the first chamber upstream of the electrode;
a magnetic assembly positioned within the second chamber, the second chamber being downstream of the electrode, and wherein
the magnetic assembly is configured to provide a compressed magnetic field; a grid positioned in the compressed magnetic field, and configured to be in electrical communication with a second power source; and an orifice adjacent to a downstream end of the housing, and configured to permit the multi-
frequency cold plasma to exit the housing.
1. A device for producing a multi-frequency cold plasma comprising: a housing having a first chamber and a second chamber, wherein the first chamber is communicatively coupled with the second chamber; an electrode positioned within the first chamber, the electrode being configured to be in electrical communication with an radio frequency (RF) power source; an input port configured to introduce a working gas into the first chamber upstream of the electrode; a magnetic assembly positioned within the second chamber, the second chamber being downstream of the electrode, and wherein the magnetic assembly is configured to provide a compressed magnetic field; a grid positioned in the compressed magnetic field, and configured to be in electrical communication with a power source; and an orifice adjacent to a downstream end of the housing, and configured to permit the multi-frequency cold plasma to exit the housing.
2. The device of claim 1, wherein the electrode comprises a plurality of plates that are spaced apart from one another.
2. The device of claim 1, wherein the
electrode comprises a plurality of plates
that are spaced apart from one another.
3. The device of claim 1, wherein the electrode comprises a plurality of plates, and wherein a surface area of a first one of the plurality of plates exceeds a surface area of a second one of the plurality of plates.
3. The device of claim 1, wherein the electrode comprises a plurality of plates, and wherein a surface area of a first one of the plurality of plates exceeds a surface area of a second one of the plurality of plates.
4. The device of claim 1, wherein the electrode comprises a plurality of plates having a common axis, and wherein each of the plurality of plates has a different thickness.
4. The device of claim 1, wherein the electrode comprises a plurality of plates having a common axis, and wherein each of the plurality of plates has a different thickness.
5. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein one of the plurality of elements is a magnetically inert support plate.
5. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein one of the plurality of elements is a magnetically inert support plate.
6. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein at least two of the plurality of elements are configured to resonate at difference frequencies.
6. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein at least two of the plurality of elements are configured to resonate at difference frequencies.
7. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein at least two of the plurality of elements are a rod and a sphere respectively.
7. The device of claim 1, wherein the grid comprises a plurality of elements, and wherein at least two of the plurality of elements are a rod and a sphere respectively.
8. The device of claim 1, wherein the magnetic assembly comprises a first magnet and a second magnet, the first magnet and the second magnet being magnetically aligned in opposition with one another.
8. The device of claim 1, wherein the magnetic assembly comprises a first magnet and a second magnet, the first magnet and the second magnet being magnetically aligned in opposition with one another.
9. The device of claim 8, wherein the first magnet and the second magnet are magnetically aligned in a south-to-south alignment.
9. The device of claim 8, wherein the first magnet and the second magnet are magnetically aligned in a south-to-south alignment.
10. The device of claim 1, wherein the first power source and the second power source are the same power source.
10. The device of claim 1, wherein the RF power source and the power source are the same power source.
11. A method comprising: injecting a working gas onto an electrode disposed within a first chamber of a housing; supplying a first power to the electrode to thereby energize the working gas; channeling the energized working gas onto a grid, wherein the grid is located in a second chamber of the housing, the second chamber being communicatively coupled to the first chamber; applying a compressed magnetic field to the grid; supplying a second power to the grid to further energize the working gas, and thereby creating a multi-frequency cold plasma; and outputting the multi-frequency cold plasma emerging from the grid to impact a surface external to the housing.
11. A method comprising: injecting a working gas onto an electrode disposed within a first chamber of a housing; supplying radio-frequency (RF) energy to the electrode to thereby energize the working gas; channeling the energized working gas onto a grid, wherein the grid is located in a second chamber of the housing, the second chamber being communicatively coupled to the first chamber; applying a compressed magnetic field to the grid; supplying power to the grid to further energize the working gas, and thereby creating a multi-frequency cold plasma; and outputting the multi-frequency cold plasma emerging from the grid to impact a surface external to the housing.
12. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates that are spaced apart from one another.
12. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates that are spaced apart from one another.
13. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates, and wherein a surface area of a first one of the plurality of plates exceeds a surface area of a second one of the plurality of plates.
13. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates, and wherein a surface area of a first one of the plurality of plates exceeds a surface area of a second one of the plurality of plates.
14. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates having a common axis, and wherein each of the plurality of plates has a different thickness.
14. The method of claim 11, wherein injecting a working gas onto an electrode includes injecting a working gas onto an electrode comprising a plurality of plates having a common axis, and wherein each of the plurality of plates has a different thickness.
15. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein one of the plurality of elements is a magnetically inert support plate.
15. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein one of the plurality of elements is a magnetically inert support plate.
16. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein at least two of the plurality of elements are configured to resonate at difference frequencies.
16. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein at least two of the plurality of elements are configured to resonate at difference frequencies.
17. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein at least two of the plurality of elements are a rod and a sphere respectively.
17. The method of claim 11, wherein channeling the energized working gas onto a grid includes channeling the energized working gas onto a grid comprising a plurality of elements, and wherein at least two of the plurality of elements are a rod and a sphere respectively.
18. The method of claim 11, wherein applying a compressed magnetic field to the grid includes using a magnetic assembly comprising a first magnet and a second magnet, the first magnet and the second magnet being magnetically aligned in opposition with one another.
18. The method of claim 11, wherein applying a compressed magnetic field to the grid includes using a magnetic assembly comprising a first magnet and a second magnet, the first magnet and the second magnet being magnetically aligned in opposition with one another.
19. The method of claim 18, wherein the first magnet and the second magnet are magnetically aligned in a south-to-south alignment.
19. The method of claim 18, wherein the first magnet and the second magnet are magnetically aligned in a south-to-south alignment.
20. The method of claim 11, wherein supplying the first power to the electrode and supplying the second power to the grid include using the same power source.
20. The method of claim 11, wherein supplying radio-frequency (RF) energy to the electrode and supplying power to the grid include using the same power source.
Conclusion
Claims 1-20 are rejected under statutory double patenting.
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/SRINIVAS SATHIRAJU/Examiner, Art Unit 2844 01/24/2026