Prosecution Insights
Last updated: August 15, 2026
Application No. 18/969,886

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

Non-Final OA §102
Filed
Dec 05, 2024
Priority
Jan 12, 2024 — JP 2024-003261
Examiner
PERSAUD, DEORAM
Art Unit
Tech Center
Assignee
Gigaphoton Inc.
OA Round
1 (Non-Final)
77%
Grant Probability
Favorable
1-2
OA Rounds
1y 1m
Est. Remaining
89%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
583 granted / 759 resolved
+16.8% vs TC avg
Moderate +12% lift
Without
With
+11.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
28 currently pending
Career history
799
Total Applications
across all art units

Statute-Specific Performance

§101
3.5%
-36.5% vs TC avg
§103
47.8%
+7.8% vs TC avg
§102
31.5%
-8.5% vs TC avg
§112
6.9%
-33.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 759 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Specification The lengthy specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant’s cooperation is requested in correcting any errors of which applicant may become aware in the specification. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Fujimaki et al. [US 2018/0288863 A1]. Regarding claims 1, 19 and 20, Fujimaki et al. discloses an extreme ultraviolet light generation system / an electronic device manufacturing method configured to generate extreme ultraviolet light by irradiating a target substance with laser light (Figs. 1, 17, 20, 31), comprising: a tank (82) configured to store the target substance in a liquid state (paragraph [0130] teaches liquid tin); a nozzle (80) configured to output the target substance stored in the tank (paragraph [0118]); a piezoelectric element (88) configured to apply vibration to the target substance to be output from the nozzle to generate droplets of the target substance (paragraphs [0135] teaches applying vibration using the piezoelectric element); a droplet detection device (76) configured to detect a time interval of passage of the droplets output from the nozzle (paragraphs [0146]-[0147] teaches detecting the timing of the droplet); and at least one processor (Fig. 36, see also paragraph [0419]), the processor acquiring a first value of a vibration parameter relating to the vibration of the piezoelectric element (88), acquiring a variation of the time interval corresponding to each of a plurality of values including the first value of the vibration parameter, and generating the droplets using a second value with which the variation of the time interval is smaller than that with the first value (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Regarding claim 2, Fujimaki et al. discloses wherein the processor acquires a variation of the time interval corresponding to each of the first value of the vibration parameter, a value larger than the first value, and a value smaller than the first value (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Regarding claim 3, Fujimaki et al. discloses wherein the processor calculates an approximate straight line in correlation between a value of the vibration parameter and the variation of the time interval, and causes the second value to be a value of the vibration parameter providing a smaller variation of the time interval than the first value based on a gradient of the approximate straight line (paragraph [0305]-[0307], see also Figs. 22A and 22B). Regarding claims 4-7, Fujimaki et al. discloses wherein the vibration parameter is a duty of a voltage waveform of a rectangular wave for driving the piezoelectric element (as shown in Figs. 16A and 16B, paragraph [0190]), wherein the vibration parameter is a voltage for driving the piezoelectric element (paragraph [0216]), wherein the vibration parameter is a temperature of the piezoelectric element (paragraph [0155]), wherein the vibration parameter is a temperature of the nozzle (paragraph [0360]). Regarding claims 8-10, Fujimaki et al. discloses wherein the processor generates the droplets by driving the piezoelectric element with a voltage waveform of a rectangular wave having a value of an operational duty, and generates the extreme ultraviolet light by irradiating the droplets with the laser light, wherein the processor acquires correlation between a duty of the rectangular wave and the variation of the time interval, and causes the value of the operational duty to be a value of the duty with which the variation of the time interval is smallest, wherein the processor causes the value of the operational duty to be the second value (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Regarding claims 11-13, Fujimaki et al. discloses wherein the target substance is a liquid target substance containing tin (paragraph [0130] teaches liquid tin), wherein the processor melts the tin at a predetermined temperature in a target supply unit including the tank (paragraph [0155]), wherein the processor controls a pressure of an inert gas to be supplied to the tank by a pressure regulator, and outputs outside liquid tin in the tank from the nozzle (paragraph [0125]-[0126]). Regarding claim 14, Fujimaki et al. discloses wherein the piezoelectric element generates the droplets by being driven with the second value of the vibration parameter (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Regarding claim 15, Fujimaki et al. discloses wherein the piezoelectric element is driven by a rectangular wave having a duty value with which the variation of the time interval is smaller than a threshold (as shown in Figs. 16A and 16B, paragraph [0190]). Regarding claim 16, Fujimaki et al. discloses wherein control of maintaining a combining state of the droplets is performed by finely adjusting a duty value for the piezoelectric element (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Regarding claims 17 and 18, Fujimaki et al. discloses wherein energy stability of the extreme ultraviolet light is improved by keeping the variation of the time interval small, wherein a combining state of the droplets is controlled using the variation of the time interval as an index (Figs. 14 and 19, see also paragraph [0240] teaches wherein the smallest value as an optimum operation duty value, paragraph [0259] teaches choosing a smaller timing interval, see also paragraph [0282] and claim 3). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DEORAM PERSAUD whose telephone number is (571)270-5476. The examiner can normally be reached M-F 8AM-5PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Minh-Toan Ton can be reached at 571-272-2303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DEORAM PERSAUD/Primary Examiner, Art Unit 2882
Read full office action

Prosecution Timeline

Dec 05, 2024
Application Filed
Jul 31, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12704789
Flexible Measurement Models For Model Based Measurements Of Semiconductor Structures
3y 0m to grant Granted Aug 11, 2026
Patent 12687786
Method for Operating an Optical Component, and Optical Component
2y 10m to grant Granted Jul 21, 2026
Patent 12676447
APPARATUS FOR AND METHOD OF OPTICAL COMPONENT ALIGNMENT
3y 1m to grant Granted Jul 07, 2026
Patent 12675052
SUBSTRATE WARPAGE DETERMINATION SYSTEM
1y 9m to grant Granted Jul 07, 2026
Patent 12663732
SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING
2y 5m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
77%
Grant Probability
89%
With Interview (+11.8%)
2y 9m (~1y 1m remaining)
Median Time to Grant
Low
PTA Risk
Based on 759 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month