Prosecution Insights
Last updated: May 29, 2026

Examiner: PERSAUD, DEORAM

Tech Center 2800 • Art Units: 2882

This examiner grants 77% of resolved cases

Performance Statistics

76.7%
Allow Rate
+8.7% vs TC avg
792
Total Applications
+11.8%
Interview Lift
1014
Avg Prosecution Days
Based on 755 resolved cases, 2023–2026

Rejection Statute Breakdown

1.3%
§101 Eligibility
28.3%
§102 Novelty
63.2%
§103 Obviousness
0.8%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18884268 METHODS OF FABRICATING SEMICONDUCTOR DEVICES Non-Final OA Samsung Electronics Co., Ltd.
18659932 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USING THE SAME Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18230472 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18100698 PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLIGHT IN DISPLAY SYSTEMS Final Rejection Meta Platforms Technologies, LLC
18489404 FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS Non-Final OA GOOGLE LLC
18486726 SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING Non-Final OA Applied Materials, Inc.
18648561 OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM Non-Final OA Carl Zeiss SMT GmbH
18361092 LAYER-FORMING METHOD, OPTICAL ELEMENT AND OPTICAL SYSTEM Non-Final OA Carl Zeiss SMT GmbH
18889003 PHOTOLITHOGRAPHY APPARATUS AND METHOD OF OPERATING THE SAME Non-Final OA Taiwan Semiconductor Manufacturing Company, Ltd.
18749556 COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME Non-Final OA ASML NETHERLANDS B.V.
18712671 SURROUNDING PATTERN AND PROCESS AWARE METROLOGY Non-Final OA ASML NETHERLANDS B.V.
18690871 OUT-OF-BAND LEAKAGE CORRECTION METHOD AND METROLOGY APPARATUS Final Rejection ASML NETHERLANDS B.V.
18567053 METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS Final Rejection ASML NETHERLANDS B.V.
18281614 METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS Final Rejection ASML NETHERLANDS B.V.
18277223 METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS Final Rejection ASML NETHERLANDS B.V.
18233263 METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS Final Rejection ASML NETHERLANDS B.V.
18237527 MEASURING DEVICE AND MACHINING DEVICE Final Rejection Tokyo Seimitsu Co., Ltd.
18558455 REAL-TIME PATTERNING HOTSPOT ANALYZER Non-Final OA Siemens Industry Software Inc.
18835571 DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VARIABLE ILLUMINATION Non-Final OA Carl Zeiss Jena GmbH
18675653 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD Non-Final OA Ushio Denki Kabushiki Kaisha

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