Tech Center 2800 • Art Units: 2882
This examiner grants 76% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18659932 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18486726 | SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING | Non-Final OA | Applied Materials, Inc. |
| 18100698 | PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLIGHT IN DISPLAY SYSTEMS | Final Rejection | Meta Platforms Technologies, LLC |
| 18489404 | FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS | Non-Final OA | GOOGLE LLC |
| 18248474 | RETICLE EXCHANGE DEVICE WITH RETICLE LEVITATION | Final Rejection | Massachusetts Institute of Technology |
| 18648561 | OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18361092 | LAYER-FORMING METHOD, OPTICAL ELEMENT AND OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18790520 | EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT | Non-Final OA | ASML Netherlands B.V. |
| 18712671 | SURROUNDING PATTERN AND PROCESS AWARE METROLOGY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18704337 | INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPLACER, AND METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18690871 | OUT-OF-BAND LEAKAGE CORRECTION METHOD AND METROLOGY APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18578947 | LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD | Final Rejection | ASML Netherlands B.V. |
| 18567053 | METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS | Final Rejection | ASML NETHERLANDS B.V. |
| 18281614 | METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18242842 | METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES | Non-Final OA | ASML NETHERLANDS B.V. |
| 18277223 | METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS | Final Rejection | ASML NETHERLANDS B.V. |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18237527 | MEASURING DEVICE AND MACHINING DEVICE | Non-Final OA | Tokyo Seimitsu Co., Ltd. |
| 18793570 | SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION | Non-Final OA | KLA Corporation |
| 18675653 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD | Non-Final OA | Ushio Denki Kabushiki Kaisha |
| 18558455 | REAL-TIME PATTERNING HOTSPOT ANALYZER | Non-Final OA | Siemens Industry Software Inc. |
| 18398919 | SUBSTRATE EDGE PATTERNING TECHNIQUES | Final Rejection | Onto Innovation Inc. |
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