Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2882
This examiner grants 77% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18903621 | RETICLE STAGE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18505041 | PHOTOLITHOGRAPHY APPARATUS AND OPERATION METHOD OF THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18489404 | FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS | Final Rejection | GOOGLE LLC |
| 18739931 | SUBSTRATE CHUCK, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18100698 | PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLIGHT IN DISPLAY SYSTEMS | Final Rejection | Meta Platforms Technologies, LLC |
| 19026754 | SEMICONDUCTOR DEVELOPER TOOL AND METHODS OF OPERATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18978369 | RETICLE CLEANING DEVICE AND METHOD OF USE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18942941 | GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY | Non-Final OA | Applied Materials, Inc. |
| 18486726 | SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING | Final Rejection | Applied Materials, Inc. |
| 18461096 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Final Rejection | Kioxia Corporation |
| 18892069 | CONTACTS FOR REDUCING WEAR IN A RETICLE CONTAINER | Non-Final OA | ENTEGRIS, INC. |
| 18868349 | UNDERLAYER WITH BONDED DOPANTS FOR PHOTOLITHOGRAPHY | Non-Final OA | Lam Research Corporation |
| 19046226 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18675653 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD | Final Rejection | Ushio Denki Kabushiki Kaisha |
| 19009394 | LITHOGRAPHIC APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V |
| 18870245 | SYSTEM, APPARATUS AND METHOD FOR SELECTIVE SURFACE TREATMENT | Non-Final OA | ASML Netherlands B.V. |
| 18868977 | METHOD FOR ALIGNING AN ILLUMINATION-DETECTION SYSTEM OF A METROLOGY DEVICE AND ASSOCIATED METROLOGY DEVICE | Non-Final OA | ASML Netherlands B.V. |
| 18790520 | EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT | Final Rejection | ASML Netherlands B.V. |
| 18687727 | THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPHIC APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18578947 | LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18567053 | METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS | Final Rejection | ASML NETHERLANDS B.V. |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy