Tech Center 2800 • Art Units: 2882
This examiner grants 77% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18884268 | METHODS OF FABRICATING SEMICONDUCTOR DEVICES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18659932 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18230472 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18100698 | PHASE PLATE AND FABRICATION METHOD FOR COLOR-SEPARATED LASER BACKLIGHT IN DISPLAY SYSTEMS | Final Rejection | Meta Platforms Technologies, LLC |
| 18489404 | FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS | Non-Final OA | GOOGLE LLC |
| 18486726 | SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING | Non-Final OA | Applied Materials, Inc. |
| 18648561 | OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18361092 | LAYER-FORMING METHOD, OPTICAL ELEMENT AND OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18889003 | PHOTOLITHOGRAPHY APPARATUS AND METHOD OF OPERATING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18749556 | COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME | Non-Final OA | ASML NETHERLANDS B.V. |
| 18712671 | SURROUNDING PATTERN AND PROCESS AWARE METROLOGY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18690871 | OUT-OF-BAND LEAKAGE CORRECTION METHOD AND METROLOGY APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18567053 | METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS | Final Rejection | ASML NETHERLANDS B.V. |
| 18281614 | METHOD OF DETERMINING AT LEAST A TARGET LAYOUT AND ASSOCIATED METROLOGY APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18277223 | METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS | Final Rejection | ASML NETHERLANDS B.V. |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18237527 | MEASURING DEVICE AND MACHINING DEVICE | Final Rejection | Tokyo Seimitsu Co., Ltd. |
| 18558455 | REAL-TIME PATTERNING HOTSPOT ANALYZER | Non-Final OA | Siemens Industry Software Inc. |
| 18835571 | DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VARIABLE ILLUMINATION | Non-Final OA | Carl Zeiss Jena GmbH |
| 18675653 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD | Non-Final OA | Ushio Denki Kabushiki Kaisha |
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