Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2882
This examiner grants 77% of resolved cases
Deoram Persaud works in Art Unit 2882 of Tech Center 2800. The examiner has 771 resolved cases. The allowance rate for these cases is 76.9 percent. This suggests a favorable environment for applicants seeking allowance. The volume of cases indicates the examiner's experience in this technical area.
The interview lift is 12.0 percent, showing that applications with interviews are more likely to be allowed than those without. Practitioners should consider interviews as a way to expedite the process relative to the baseline rate of 76.9 percent. For cases that reach allowance, the median time to allowance is 1015 days. This pendency figure provides a benchmark for the duration of the prosecution process.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18868349 | UNDERLAYER WITH BONDED DOPANTS FOR PHOTOLITHOGRAPHY | Non-Final OA | Lam Research Corporation |
| 19026754 | SEMICONDUCTOR DEVELOPER TOOL AND METHODS OF OPERATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18978369 | RETICLE CLEANING DEVICE AND METHOD OF USE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18942941 | GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY | Non-Final OA | Applied Materials, Inc. |
| 18486726 | SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING | Final Rejection | Applied Materials, Inc. |
| 19044299 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18969886 | EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19008383 | APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 19092004 | COOLING DEVICE FOR COOLING A POSITION-SENSITIVE COMPONENT OF A LITHOGRAPHY SYSTEM | Non-Final OA | ASML Netherlands B.V. |
| 19026708 | SUBSTRATE HOLDER FOR USE IN LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
| 19009394 | LITHOGRAPHIC APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V |
| 19009546 | ABERRATION IMPACT SYSTEMS, MODELS, AND MANUFACTURING PROCESSES | Non-Final OA | ASML NETHERLANDS B.V. |
| 18876810 | METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE | Non-Final OA | ASML Netherlands B.V. |
| 18870245 | SYSTEM, APPARATUS AND METHOD FOR SELECTIVE SURFACE TREATMENT | Non-Final OA | ASML Netherlands B.V. |
| 18790520 | EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT | Final Rejection | ASML Netherlands B.V. |
| 18749556 | COMPUTATIONAL METROLOGY BASED SAMPLING SCHEME | Final Rejection | ASML NETHERLANDS B.V. |
| 18712671 | SURROUNDING PATTERN AND PROCESS AWARE METROLOGY | Final Rejection | ASML NETHERLANDS B.V. |
| 18687727 | THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPHIC APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18567053 | METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS | Final Rejection | ASML NETHERLANDS B.V. |
| 18233263 | METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS | Non-Final OA | ASML NETHERLANDS B.V. |
| 18675653 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD | Final Rejection | Ushio Denki Kabushiki Kaisha |
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