Prosecution Insights
Last updated: October 01, 2026
Application No. 18/979,952

PIEZOELECTRIC TRANSFORMER

Non-Final OA §DOUBLEPATENT
Filed
Dec 13, 2024
Priority
Nov 20, 2015 — DE 102015120160.7 +3 more
Examiner
SATHIRAJU, SRINIVAS
Art Unit
2844
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
TDK Corporation
OA Round
1 (Non-Final)
89%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allowance Rate
746 granted / 839 resolved
+20.9% vs TC avg
Moderate +6% lift
Without
With
+6.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
31 currently pending
Career history
856
Total Applications
across all art units

Statute-Specific Performance

§101
3.5%
-36.5% vs TC avg
§103
46.6%
+6.6% vs TC avg
§102
17.6%
-22.4% vs TC avg
§112
15.8%
-24.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 839 resolved cases

Office Action

§DOUBLEPATENT
CTNF 18/979,952 CTNF 89996 Notice of Non-Final Rejection Notice of Pre-AIA or AIA Status 07-03-aia AIA 15-10-aia The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA. Double Patenting 08-33 AIA The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg , 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman , 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi , 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum , 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel , 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington , 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA. A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA/25, or PTO/AIA/26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. 08-34 AIA Claim s 1-8, 10-20, 23 are rejected on the ground of nonstatutory double patenting as being unpatentable over claim s 1-8, 10-19, 22 of U.S. Patent No. US12207559 B2 . Although the claims at issue are not identical, they are not patentably distinct from each other because they represent identical limitations with obvious variations . US18979952 claim is obvious over Claim of US12207559 B2 1. A plasma generator comprising: a piezoelectric transformer comprising an input region and an output region, wherein the input region is configured to convert an applied AC voltage into a mechanical oscillation, wherein the output region is configured to convert the mechanical oscillation into an electrical voltage, wherein the piezoelectric transformer is configured to ignite a plasma at an output-side end side of the piezoelectric transformer, wherein the piezoelectric transformer comprises a longest edge and a shortest edge, and wherein the longest edge comprises a length that is twenty times a length of the shortest edge or less. . A method for generating a plasma using a piezoelectric transformer, the method comprising: applying an AC voltage to an input region; converting, by the input region, the AC voltage into a mechanical oscillation; converting, by an output region, the mechanical oscillation into an electrical voltage; and igniting the plasma at an output-side end side of the piezoelectric transformer, wherein the piezoelectric transformer comprises the input region and the output region, wherein the piezoelectric transformer comprises a longest edge and a shortest edge, and wherein the longest edge comprises a length that is twenty times a length of the shortest edge or less. 2. The plasma generator according to claim 1, wherein the longest edge comprises the length of less than 45 mm. 2. The method according to claim 1, wherein the longest edge comprises the length of less than 45 mm. 3. The plasma generator according to claim 1, wherein the longest edge comprises the length of less than 35 mm. 3. The method according to claim 1, wherein the longest edge comprises the length of less than 35 mm. 4. The plasma generator according to claim 1, wherein a first external electrode is arranged on a first side surface of the input region, wherein a second external electrode is arranged on a second side surface of the input region, the second side surface arranged opposite the first side surface, wherein the input region comprises piezoelectric layers and electrodes stacked one above another in a stacking direction, wherein the electrodes are contacted either with the first external electrode or with the second external electrode alternately in the stacking direction, and wherein the output region comprises a monolithic piezoelectric layer. 4. The method according to claim 1, wherein a first external electrode is arranged on a first side surface of the input region, wherein a second external electrode is arranged on a second side surface of the input region, the second side surface arranged opposite the first side surface, wherein the input region comprises piezoelectric layers and electrodes stacked one above another in a stacking direction, wherein the electrodes are contacted either with the first external electrode or with the second external electrode alternately in the stacking direction, and wherein the output region comprises a monolithic piezoelectric layer. 5. The plasma generator according to claim 1, wherein the longest edge extends from the input region to the output region. 5. The method according to claim 1, wherein the longest edge extends from the input region to the output region. 6. The plasma generator according to claim 1, wherein the shortest edge is perpendicular to the longest edge. 6. The method according to claim 1, wherein the shortest edge is perpendicular to the longest edge. 7. The plasma generator according to claim 1, wherein the piezoelectric transformer has a resonant frequency of more than 100 kHz. 7. The method according to claim 1, wherein the piezoelectric transformer has a resonant frequency of more than 100 kHz. 8. The plasma generator according to claim 1, wherein the longest edge comprises a length that is fifteen times the length of the shortest edge of the piezoelectric transformer or less. 8. The method according to claim 1, wherein the longest edge comprises the length that is fifteen times the length of the shortest edge of the piezoelectric transformer or less. 9. The plasma generator according to claim 1, wherein the shortest edge comprises a length of between 10 mm and 1 mm, inclusive. Obvious claim 1 10. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured to avoid plasma ignitions along the longest edge in the output region based on a ratio of the length of the longest edge to the length of the shortest edge. 10. The method according to claim 1, further comprising: avoiding plasma ignitions along the longest edge in the output region based on a ratio of the length of the longest edge to the length of the shortest edge. 11. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured to reduce mechanical loadings of a piezoelectric material in the output region by a ratio of the length of the longest edge to the length of the shortest edge. 11. The method according to claim 1, further comprising: reducing mechanical loadings of a piezoelectric material in the output region by a ratio of the length of the longest edge to the length of the shortest edge. 12. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured to generate a high potential difference between the output-side end side of the piezoelectric transformer and an environment of the piezoelectric transformer, and wherein the potential difference is sufficient to generate a strong electric field that ionizes a process gas. 12. The method according to claim 1, further comprising: generating a high potential difference between the output- side end side of the piezoelectric transformer and an environment of the piezoelectric transformer, wherein the potential difference is sufficient to generate a strong electric field that ionizes a process gas. 13. The plasma generator according to claim 1, wherein the plasma generator is configured for a medical application. 13. The method according to claim 1, further comprising using the piezoelectric transformer for a medical application. 14. The plasma generator according to claim 1, wherein the plasma generator is configured for cutting tissue by plasma cutting. 14. The method according to claim 1, further comprising using the piezoelectric transformer for cutting tissue by plasma cutting. 15. The plasma generator according to claim 1, wherein the edges of the piezoelectric transformer are rounded with a radius of ≤ 0.5 mm. 15. The method according to claim 1, wherein the edges of the piezoelectric transformer are rounded with a radius of ≤0.5 mm. 16. The plasma generator according to claim 1, wherein an impedance of the piezoelectric transformer is matched to an impedance generated by the plasma. 16. The method according to claim 1, further comprising matching an impedance of the piezoelectric transformer to an impedance generated by the plasma. 17. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured such that a maximum of an output potential generated by the piezoelectric transformer lies on an end side of the output region. 17. The method according to claim 1, wherein a maximum of an output potential generated by the piezoelectric transformer lies on an end side of the output region. 18. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured to generate ozone when air is a process gas. 18. The method according to claim 1, further comprising generating, by the piezoelectric transformer, ozone when air is a process gas. 19. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured to generate 30-35 mg/h ozone for 1 Wcm3, or 50-55 mg/h ozone for 2 Wcm3 , or 70- 75 mg/h ozone for 3 Wcm3. 19. The method according to claim 1, further comprising generating, by the piezoelectric transformer, 30-35 mg/h ozone for 1 Wcm.sup.3, or 50-55 mg/h ozone for 2 Wcm.sup.3, or 70-75 mg/h ozone for 3 Wcm.sup.3. 20. The plasma generator according to claim 1, wherein the piezoelectric transformer is configured such that a location, at which a maximum of an electrical potential is generated, shifts depending on a capacitance of the output region, and wherein the piezoelectric transformer is configured such that the capacitance of the output region increases as a ratio of the length of the longest edge to the length of the shortest edge decreases. 20 A medical device comprising: a plasma generator comprising a piezoelectric transformer configured to generate a plasma, wherein the piezoelectric transformer comprises an input region and an output region, wherein the input region is configured to convert an AC voltage into a mechanical oscillation, wherein the output region is configured to convert the mechanical oscillation into an electrical voltage, wherein the piezoelectric transformer comprises a longest edge and a shortest edge, wherein the longest edge comprises a length that is twenty times the length of the shortest edge or less, wherein the piezoelectric transformer is configured such that a location, at which a maximum of an electrical potential, shifts depending on a capacitance of the output region, and wherein the piezoelectric transformer is further configured that the capacitance of the output region increases as a ratio of the length of the longest edge to the length of the shortest edge decreases. 21. The plasma generator according to claim 1, wherein the piezoelectric transformer comprises an insulating layer in the output region. Obvious over claim 1 22. The plasma generator according to claim 1, wherein the piezoelectric transformer is polarizable by a polarization voltage set by considering the length of the piezoelectric transformer. Obvious over claim 1 23. A piezoelectric transformer comprising: an input region and an output region, wherein the input region is configured to convert an applied AC voltage into a mechanical oscillation, wherein the output region is configured to convert the mechanical oscillation into an electrical voltage, wherein the piezoelectric transformer is configured to ignite a plasma at an output-side end side of the piezoelectric transformer, wherein the piezoelectric transformer comprises a longest edge and a shortest edge, and wherein the longest edge comprises a length that is twenty times a length of the shortest edge or less. A medical device comprising: a plasma generator comprising a piezoelectric transformer configured to generate a plasma, wherein the piezoelectric transformer comprises an input region and an output region, wherein the input region is configured to convert an AC voltage into a mechanical oscillation, wherein the output region is configured to convert the mechanical oscillation into an electrical voltage, wherein the piezoelectric transformer comprises a longest edge and a shortest edge, wherein the longest edge comprises a length that is twenty times the length of the shortest edge or less, wherein the piezoelectric transformer is configured such that a location, at which a maximum of an electrical potential, shifts depending on a capacitance of the output region, and wherein the piezoelectric transformer is further configured that the capacitance of the output region increases as a ratio of the length of the longest edge to the length of the shortest edge decreases . 08-36 AIA Claim s 9, 21, 22 are rejected on the ground of nonstatutory double patenting as being unpatentable over claim s 1 of U.S. Patent No. US12207559 B2 (US patent 559) in view of US2018/0375013 A1 by Weilguni et al (Weilguni) . Referring to claim 9, US Patent 559 claim 1 recites the method according to claim 1, wherein the shortest edge comprises a length of between 10 mm and 1 mm. Referring to claim 21, US Patent 559 claim 1 recites the plasma generator according to claim 1, but silent on wherein the piezoelectric transformer comprises an insulating layer in the output region. However, Weilguni teaches formation of an insulating layer at the output region (See paragraph 0055]). Hence, it would have been obvious to a person with ordinary skill in the art before the filing date of instant application to incorporate the insulating layer teachings in the claim limitations of US Patent 559 in order to cover the output region (see paragraph [00555] Weilguni) Referring to claim 22, US Patent 559 claim 1 recites the plasma generator according to claim 1, but silent on wherein the piezoelectric transformer is polarizable by a polarization voltage set by considering the length of the piezoelectric transformer. However Weilguni teaches wherein the piezoelectric transformer is polarizable by a polarization voltage set by considering the length of the piezoelectric transformer. (See paragraphs [0035]-[0037]). Hence, it would have been obvious to a person with ordinary skill in the art before the filing date of instant application to incorporate the teachings of Weilguni on the polarization and voltage associated with it in the longitudinal direction for plasma generation at the output region. (see paragraph [0036] Weilguni). Conclusion Claims 1-23 are rejected. Prior Art : Relevant Prior Art has been recorded at PTO 892 form. Based on Patent board findings previously this application has been allowed previously. This is a divisional and continued application. . Hence, no prior art rejection was made. 07-96 The prior of art made of record and not relied upon is considered to pertinent to applicant’s disclosure. Applicants are directed to consider additional pertinent prior art included on the notice of references cited PTOL 892 attached here with. The examiner has pointed out particular references contained in the prior art of record within the body of this action for the convenience of the Applicants. Although the specified citations are representative of the teachings in the art and are applied to the specific limitations within the individual claim other passages and figures may apply. Applicant, in preparing the response should consider fully the entire reference as potentially teaching all or part of the claimed invention as well as the context of the passage as taught by the prior art or disclosed by the examiner. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SRINIVAS SATHIRAJU whose telephone number is (571)272-4250. The examiner can normally be reached 8:30AM-5.30 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, ALEXANDER H TANINGCO can be reached at 571-272-8048. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. SRINIVAS . SATHIRAJU Primary Examiner Art Unit 2844 04/03/2026 Application/Control Number: 18/979,952 Page 2 Art Unit: 2844 Application/Control Number: 18/979,952 Page 3 Art Unit: 2844 Application/Control Number: 18/979,952 Page 4 Art Unit: 2844 Application/Control Number: 18/979,952 Page 5 Art Unit: 2844 Application/Control Number: 18/979,952 Page 6 Art Unit: 2844 Application/Control Number: 18/979,952 Page 7 Art Unit: 2844 Application/Control Number: 18/979,952 Page 8 Art Unit: 2844 Application/Control Number: 18/979,952 Page 9 Art Unit: 2844 Application/Control Number: 18/979,952 Page 10 Art Unit: 2844 Application/Control Number: 18/979,952 Page 11 Art Unit: 2844 Application/Control Number: 18/979,952 Page 12 Art Unit: 2844 Application/Control Number: 18/979,952 Page 13 Art Unit: 2844 Application/Control Number: 18/979,952 Page 14 Art Unit: 2844 Application/Control Number: 18/979,952 Page 15 Art Unit: 2844 Application/Control Number: 18/979,952 Page 16 Art Unit: 2844 Application/Control Number: 18/979,952 Page 17 Art Unit: 2844 Application/Control Number: 18/979,952 Page 18 Art Unit: 2844 Application/Control Number: 18/979,952 Page 19 Art Unit: 2844 Application/Control Number: 18/979,952 Page 20 Art Unit: 2844 Application/Control Number: 18/979,952 Page 21 Art Unit: 2844 Application/Control Number: 18/979,952 Page 22 Art Unit: 2844 Application/Control Number: 18/979,952 Page 23 Art Unit: 2844 Application/Control Number: 18/979,952 Page 24 Art Unit: 2844 Application/Control Number: 18/979,952 Page 25 Art Unit: 2844 Application/Control Number: 18/979,952 Page 26 Art Unit: 2844 Application/Control Number: 18/979,952 Page 27 Art Unit: 2844 Application/Control Number: 18/979,952 Page 28 Art Unit: 2844 Application/Control Number: 18/979,952 Page 29 Art Unit: 2844 Application/Control Number: 18/979,952 Page 30 Art Unit: 2844 Application/Control Number: 18/979,952 Page 31 Art Unit: 2844 Application/Control Number: 18/979,952 Page 32 Art Unit: 2844
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Prosecution Timeline

Dec 13, 2024
Application Filed
Apr 09, 2026
Non-Final Rejection mailed — §DOUBLEPATENT (current)

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Prosecution Projections

1-2
Expected OA Rounds
89%
Grant Probability
95%
With Interview (+6.2%)
2y 0m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 839 resolved cases by this examiner. Grant probability derived from career allowance rate.

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