Last updated: July 05, 2026

Application No. 18/981,343

MASK MANUFACTURING DEVICE AND MANUFACTURING METHOD OF MASK USING THE SAME

Non-Final OA

Filed

Dec 13, 2024

Priority

Jan 31, 2024 — RE 10-2024-0015000

Examiner

KURPLE, KARL

Art Unit

1717

Tech Center

1700 — Chemical & Materials Engineering

Assignee

Samsung Display Co., Ltd.

OA Round

1 (Non-Final)

Interview Optional

— +63.7% interview lift. Interview already conducted in this application's prosecution history. This examiner has a 52% grant rate with +63.7% interview lift. Since an interview has already been tried, recommend written response with narrowed claims based on precedent claim evolution patterns.

Based on 602 resolved cases, 2023–2026

Examiner Intelligence

KURPLE, KARL View full profile →

Grants 52% of resolved cases

Career Allowance Rate

311 granted / 602 resolved

-13.3% vs TC avg

Strong +64% interview lift

Without

With

+63.7%

Interview Lift

resolved cases with interview

Typical timeline

3y 7m

Avg Prosecution

43 currently pending

Career history

661

Total Applications

across all art units

Statute-Specific Performance

§101

0.3%

-39.7% vs TC avg

§103

84.3%

+44.3% vs TC avg

§102

0.9%

-39.1% vs TC avg

§112

6.4%

-33.6% vs TC avg

Black line = Tech Center average estimate • Based on career data from 602 resolved cases

Prosecution Timeline

Dec 13, 2024

Application Filed

Apr 06, 2026

Non-Final Rejection mailed

Jun 18, 2026

Applicant Interview (Telephonic)

Jun 18, 2026

Examiner Interview Summary

Precedent Cases

Applications granted by this same examiner with similar technology

17/317,684

Patent 12660554

LAMP HEATING MODULE FOR AN EPITAXY PROCESS CHAMBER

5y 1m to grant Granted Jun 16, 2026

17/757,062

Patent 12649967

STABILIZATION APPARATUS FOR STABILIZING A METAL STRIP

4y 0m to grant Granted Jun 09, 2026

16/935,674

Patent 12645143

Method and Apparatus for Filtration in a Photoresist Dispense System

5y 10m to grant Granted Jun 02, 2026

18/824,322

Patent 12644188

APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE HAVING UPPER AND LOWER INLETS FOR SUPPLYING SUPERCRITICAL FLUIDS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

1y 9m to grant Granted Jun 02, 2026

18/145,952

Patent 12636597

EQUIPMENT FOR TREATING SUBSTRATE AND TREATMENT SOLUTION DEGASSING METHOD

3y 5m to grant Granted May 26, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2

Expected OA Rounds

52%

Grant Probability

99%

With Interview (+63.7%)

3y 7m (~2y 0m remaining)

Median Time to Grant

Low

PTA Risk

Based on 602 resolved cases by this examiner. Grant probability derived from career allowance rate.