Prosecution Insights
Last updated: April 19, 2026
Application No. 18/989,224

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

Non-Final OA §101§103§112
Filed
Dec 20, 2024
Examiner
ROLLAND, ALEX A
Art Unit
1759
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Kokusai Electric Corporation
OA Round
1 (Non-Final)
46%
Grant Probability
Moderate
1-2
OA Rounds
3y 7m
To Grant
74%
With Interview

Examiner Intelligence

Grants 46% of resolved cases
46%
Career Allow Rate
271 granted / 585 resolved
-18.7% vs TC avg
Strong +27% interview lift
Without
With
+27.4%
Interview Lift
resolved cases with interview
Typical timeline
3y 7m
Avg Prosecution
53 currently pending
Career history
638
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
61.4%
+21.4% vs TC avg
§102
12.3%
-27.7% vs TC avg
§112
24.1%
-15.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 585 resolved cases

Office Action

§101 §103 §112
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 101 35 U.S.C. 101 reads as follows: Whoever invents or discovers any new and useful process, machine, manufacture, or composition of matter, or any new and useful improvement thereof, may obtain a patent therefor, subject to the conditions and requirements of this title. Claims 1-20 are rejected under 35 U.S.C. 101 because the claimed invention is directed to an abstract idea of mathematical calculations without significantly more. The claim(s) recite(s) calculating a difference between a lifetime cumulative film thickness value and a cumulative etching amount in order to obtain a replacement time. This judicial exception is not integrated into a practical application because this replacement time is not used for anything. The claim(s) does/do not include additional elements that are sufficient to amount to significantly more than the judicial exception because the apparatus and controller configured to operate gas supplies are well known, routine, and conventional (see the below rejection) and/or extra solution activity. None of the dependent claims correct this issue. The examiner notes that claims 3 and 8 do use the replacement time, but for generating a notification. This does not overcome the 101 rejection because it is mere outputting and/or extra solution activity. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-20 rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 1 is rejected for the use of “processing container” and “processing chamber”. It is not clear if these are intended to be the same or different. If different, it is not clear how they are different. Claims 1-20 are rejection for the use of the phrase “replacement time”. This phrase is vague and indefinite because it is not actually a time value (sec, min, hours, days, etc.). Rather, it seems to be a binary output based on the comparison between the film thickness difference and a preset threshold value (claim 3; [0065]). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Inoshima (US 2016/0211157) in view of Nunomura (US 2013/0247937). Claims 1, 7, 9-10, 19-20: Inoshima teaches a CVD apparatus, method, and controller comprising a processing container (Fig. 1), a gas supplier (Fig. 5), a controller for controlling the gas supplier (Fig. 5) including forming deposits on the substrate and boat [0004] and etching [0137]. The controller is configured store cumulative film thickness information [0059] collected/determined by the cumulative depositions [0085-0087] and compare that to a predetermined threshold value to determine boat replacement (Id.). The cumulative film thickness information does take into account the cumulative etching value [0137] as a subtraction (because it is removal of the film by etching/cleaning) [0142]. Instead of just boat replacement, cleaning can be another possible outcome based on comparison with a different threshold value [0142]. Although Inoshima does imply the control is for the interior of the process chamber as a whole [0161], it is not explicit. However, Nunomura teaches a similar control where the cumulative film thickness is considered on the boat and on the interior of the process chamber (i.e., the tube) (Fig. 8). Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to practice the control method of Inoshima and monitor the cumulative film thickness on the inner side of the processing chamber in addition to the boat. Nunomura establishes that both are important for maintaining the CVD apparatus in good working order. Claims 2-5, 8, 11: A generic controller is capable of subtraction. The cumulative film thickness is compared to multiple threshold values, the results of which can be cautions/warnings/alerts [0142]. The results can be displayed [0143]. Claim 6: Inoshima teaches a support and boat elevator (Fig. 1). Claims 12-14: Nunomura covers the situations where just the boat is cleaned, both the boat and tube are cleaned simultaneously, and just the tube is cleaned (Fig. 8). Claims 15-16, 18: Insoshima teaches the cumulative film thickness becomes zero [0061]. The number of times the cleaning operation has occurred is also information that can be stored [0142]. Claim 17: Nunomura teaches over-etching [0137] which causes the cumulative film thickness value to become negative. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ALEX A ROLLAND whose telephone number is (571)270-5355. The examiner can normally be reached M-F 10-6:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Curtis Mayes can be reached at 5712721234. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ALEX A ROLLAND/Primary Examiner, Art Unit 1759
Read full office action

Prosecution Timeline

Dec 20, 2024
Application Filed
Jan 30, 2026
Non-Final Rejection — §101, §103, §112 (current)

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Prosecution Projections

1-2
Expected OA Rounds
46%
Grant Probability
74%
With Interview (+27.4%)
3y 7m
Median Time to Grant
Low
PTA Risk
Based on 585 resolved cases by this examiner. Grant probability derived from career allow rate.

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