Prosecution Insights
Last updated: August 02, 2026
Application No. 19/014,787

PLASMA PROCESSING APPARATUS

Non-Final OA
Filed
Jan 09, 2025
Priority
May 17, 2021 — nonprovisional of PCTJP2021018561 +1 more
Examiner
SATHIRAJU, SRINIVAS
Art Unit
2844
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Hitachi Ltd.
OA Round
1 (Non-Final)
89%
Grant Probability
Favorable
1-2
OA Rounds
5m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allowance Rate
732 granted / 824 resolved
+20.8% vs TC avg
Moderate +6% lift
Without
With
+6.1%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
43 currently pending
Career history
851
Total Applications
across all art units

Statute-Specific Performance

§101
1.3%
-38.7% vs TC avg
§103
62.6%
+22.6% vs TC avg
§102
9.9%
-30.1% vs TC avg
§112
10.0%
-30.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 824 resolved cases

Prosecution Timeline

Jan 09, 2025
Application Filed
Apr 29, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12695058
Plasma Process Control of Multi-Electrode Systems Equipped with Ion Energy Sensors
3y 11m to grant Granted Jul 28, 2026
Patent 12696372
METHODS AND DEVICES FOR PRESSURIZATION OF PULSED-POWER DRIVERS
2y 2m to grant Granted Jul 28, 2026
Patent 12688999
SYMMETRIC ANTENNA ARRAYS FOR HIGH DENSITY PLASMA ENHANCED PROCESS CHAMBER
3y 10m to grant Granted Jul 21, 2026
Patent 12689004
Plasma Processing Apparatus
2y 3m to grant Granted Jul 21, 2026
Patent 12689238
MICROWAVE POWER DISTRIBUTION NETWORK AND METHOD BASED ON PHASE-FREQUENCY HYBRID CONTROL
1y 10m to grant Granted Jul 21, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
89%
Grant Probability
95%
With Interview (+6.1%)
2y 0m (~5m remaining)
Median Time to Grant
Low
PTA Risk
Based on 824 resolved cases by this examiner. Grant probability derived from career allowance rate.

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