Prosecution Insights
Last updated: August 17, 2026
Application No. 19/059,871

STATIC RANDOM-ACCESS MEMORY

Non-Final OA §102
Filed
Feb 21, 2025
Priority
Mar 22, 2024 — continuation of PCTUS2024021233
Examiner
NGUYEN, VIET Q
Art Unit
Tech Center
Assignee
Intel Corporation
OA Round
1 (Non-Final)
95%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 95% — above average
95%
Career Allowance Rate
1197 granted / 1259 resolved
+35.1% vs TC avg
Minimal +4% lift
Without
With
+3.5%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 8m
Avg Prosecution
24 currently pending
Career history
1273
Total Applications
across all art units

Statute-Specific Performance

§101
1.8%
-38.2% vs TC avg
§103
27.5%
-12.5% vs TC avg
§102
34.2%
-5.8% vs TC avg
§112
23.5%
-16.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1259 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . 1. Claims 1-20 are present for examination. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. 2. Claims 1, 13 & 15 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Xi et al (US 2023/0089185). Claim 1, 13 & 15, Xie (Fig. 1-2) show an integrated CFET (or complementary field-effect transistor device) which could be utilized in any general semiconductor applications including memory chips and/or other chip package as well-known in this art. This CFET device includes at least one p-type transistor layer 104 (or 205, Fig. 2 below) comprising p-type transistors , see para [0071 to 0075] disclosure, and one n-type transistor layer comprising n-type transistors 108 (or 209), wherein the n-type transistor layer is above the p-type transistor layer; see [0073] stated that bottom layer is P-Type and top layer is N-Type as claimed, and Fig. 2 shows at least one intermediate/vertical layer (244/246) as the claimed “one or more intermediate metal layers” between the p-type transistor layer and the n-type transistor layer for coupling the bottom layer 212 (left side) to the top layer 234 (right side), wherein the one or more intermediate metal layers are coupled to the p-type transistor layer and to the n-type [AltContent: textbox (At least one intermediate layer 244/246 for connecting two layers N-P)]transistor layer through this intermediate/vertical layer as seen by a skilled person in this [AltContent: arrow]art. [AltContent: arrow][AltContent: arrow][AltContent: textbox (Top N-Type layer 209)][AltContent: textbox (Bottom P-Type layer 205)] PNG media_image1.png 432 724 media_image1.png Greyscale 3. Claims 1, 13 & 15 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Reznicek et al (2019/0131394). Claim 1, 13 & 15, Reznicek (see Fig. 11) show an integrated CFET (or complementary field-effect transistor device) which could be utilized in any general semiconductor applications including memory SRAM chips and/or other chip package as well-known in this art. This CFET device includes at least one p-type transistor layer 22S at bottom comprising only p-type transistors (or pFET), see disclosure, and one n-type transistor layer 26S comprising only n-type transistors 108 (or nFET), wherein the n-type transistor layer is above the p-type transistor layer, and that Fig. 11 also shows at least two intermediate/vertical layer 28 (on both left & right sides)) as the claimed “one or more intermediate metal layers” between the p-type transistor layer and the n-type transistor layer for coupling the bottom layer 22S (to the top layer 26S as claimed, wherein the one or more intermediate metal layers are coupled to the p-type transistor layer and to the n-type transistor layer through this intermediate/vertical layer as seen by a skilled person in this art. [AltContent: textbox (At least one intermediate layers 36 for connecting two different epitaxy layers N-P)] [AltContent: arrow][AltContent: arrow][AltContent: arrow][AltContent: arrow] [AltContent: arrow][AltContent: arrow][AltContent: textbox (Top N-Type layer 26S)][AltContent: textbox (Bottom P-Type layer 22S)] PNG media_image2.png 466 676 media_image2.png Greyscale Allowable Subject Matter 4. The claims 16-20 are allowable over the prior arts of record. Additionally, other clams 2-12 & 14 are objected as being dependent upon the rejcted claims above, but they tentatively contain additional/novel limitations to the recited structure above, which are all neither suggested by eth prior arts nor seen elsewhere at this time. 5. Any inquiry concerning this communication or earlier communications from the examiner should be directed to VIET Q NGUYEN whose telephone number is (571)272-1788. The examiner can normally be reached M-F 7:30-3PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Amir Zarabian can be reached at 571-272-1852. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /VIET Q NGUYEN/Primary Examiner, Art Unit 2827
Read full office action

Prosecution Timeline

Feb 21, 2025
Application Filed
Aug 05, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
95%
Grant Probability
99%
With Interview (+3.5%)
1y 8m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1259 resolved cases by this examiner. Grant probability derived from career allowance rate.

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