Prosecution Insights
Last updated: October 02, 2026
Application No. 19/063,911

EXPOSURE APPARATUS, CONTROL METHOD THEREFOR, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, NON-TRANSITORY COMPUTER READABLE MEDIUM, AND ARTICLE MANUFACTURING METHOD

Non-Final OA §102
Filed
Feb 26, 2025
Priority
Feb 27, 2024 — JP 2024-027869
Examiner
ASFAW, MESFIN T
Art Unit
Tech Center
Assignee
Canon Inc.
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
1y 0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allowance Rate
823 granted / 991 resolved
+23.0% vs TC avg
Moderate +14% lift
Without
With
+13.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
28 currently pending
Career history
1011
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
57.8%
+17.8% vs TC avg
§102
33.2%
-6.8% vs TC avg
§112
3.0%
-37.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 991 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-18 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Kurosawa [US 20070250290 A1]. As per Claims 1 and 15, Kurosawa teaches an exposure apparatus (See fig. 1) for exposing an exposure region of a substrate by projecting a pattern of an original to the exposure region by a projection optical system (Para 14), comprising: a measurement system (the focus detector 14) configured to measure a height of the substrate at each of a plurality of measurement points in the exposure region (Para 53); a user interface configured to prompt a user to make a setting concerning use of each of the plurality of measurement points (Para 87); and a controller configured to control a focus operation of the exposure region with respect to an image plane of the projection optical system by using a measurement result of the measurement system based on the setting (Para 14). As per Claim 2, Kurosawa teaches the apparatus according to claim 1, wherein the user interface prompts the user to set whether to use each of the plurality of measurement points (See fig. 18, Para 87). As per Claim 3, Kurosawa teaches the apparatus according to claim 1, wherein the user interface prompts the user to set a weight for the measurement result at each of the plurality of measurement points, and the controller controls the focus operation based on the weight set for the measurement result at each of the plurality of measurement points (Para 83). As per Claim 4, Kurosawa teaches the apparatus according to claim 1, wherein the user interface displays information representing an arrangement of the plurality of measurement points (Para 87-88). As per Claim 5, Kurosawa teaches the apparatus according to claim 4, wherein the user interface further displays information representing a height map in the exposure region (Para 87-88). As per Claim 6, Kurosawa teaches the apparatus according to claim 4, wherein the user interface further displays information representing an arrangement of a plurality of dies in the exposure region (See fig. 18, Para 87-88). As per Claim 7, Kurosawa teaches the apparatus according to claim 4, wherein the user interface further displays information representing an evaluation result of repeatability of the measurement result at each of the plurality of measurement points (Para 84, wherein differences from the global tilt plane are averaged among a plurality of sample shots). As per Claim 8, Kurosawa teaches the apparatus according to claim 7, wherein the repeatability indicates repeatability among a plurality of exposure regions of the substrate (Para 83-84). As per Claim 9, Kurosawa teaches the apparatus according to claim 7, wherein the repeatability is an index indicating variations among a plurality of exposure regions of the substrate (Para 90, wherein the influence of variations in shot surface shape). As per Claim 10, Kurosawa teaches the apparatus according to claim 1, wherein the user interface displays at least two of information representing an arrangement of the plurality of measurement points, information representing a height map in the exposure region, information representing an arrangement of a plurality of dies in the exposure region, and information representing an evaluation result of repeatability of the measurement result at each of the plurality of measurement points (Para 15). As per Claim 11, Kurosawa teaches the apparatus according to claim 1, wherein the user interface superimposes and displays at least two of information representing an arrangement of the plurality of measurement points, information representing a height map in the exposure region, information representing an arrangement of a plurality of dies in the exposure region, and information representing an evaluation result of repeatability of the measurement result at each of the plurality of measurement points (Para 15). As per Claim 12, Kurosawa teaches an information processing apparatus for controlling a focus operation in an exposure apparatus including a measurement system capable of measuring a height of a substrate at each of a plurality of measurement points (in the direction of the optical axis) in an exposure region of the substrate, comprising: a user interface configured to prompt a user to make a setting concerning use of each of the plurality of measurement points in the exposure region, wherein the setting designates that the exposure apparatus performs the focus operation by using a measurement result of the measurement system based on the setting (Para 15). As per Claim 13, Kurosawa teaches a control method for an exposure apparatus including a measurement system capable of measuring a height of a substrate at each of a plurality of measurement points in an exposure region of the substrate, comprising: prompting a user to make a setting concerning use of each of the plurality of measurement points in the exposure region; and exposing the exposure region by controlling a focus operation of the exposure region with respect to an image plane of a projection optical system of the exposure apparatus by using a measurement result of the measurement system based on the setting (Para 62). As per Claim 14, Kurosawa teaches a non-transitory computer readable medium storing program for causing a computer to execute a control method for an exposure apparatus defined in claim 13 (See fig. 9, Para 16). As per Claim 16, Kurosawa teaches a non-transitory computer readable medium storing program for causing a computer to execute an information processing method defined in claim 15 (See fig. 9, Para 16). As per Claim 17, Kurosawa teaches an article manufacturing method comprising: exposing a substrate using an exposure apparatus defined in claim 1; developing the substrate having undergone the exposing; and obtaining an article by processing the substrate having undergone the developing (Para 18). As per Claim 18, Kurosawa teaches an article manufacturing method comprising: exposing a substrate by controlling an exposure apparatus in accordance with a control method for the exposure apparatus defined in claim 13; developing the substrate having undergone the exposing; and obtaining an article by processing the substrate having undergone the developing (Para 18). Additional Prior Art The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. The reference to Nishimura [US 20160306284 A1] listed in the attached form PTO-892 teach other prior art apparatus/method of an exposure method of exposing a plurality of exposure regions on a substrate includes the steps of acquiring first reference information indicating a reference height of the substrate, measuring heights of some exposure regions among the plurality of exposure regions, acquiring temporary height information indicating a temporary height of the substrate on the basis of a measurement result in the measuring step that may anticipate or obviate the claims of the applicant's invention. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MESFIN ASFAW whose telephone number is (571)270-5247. The examiner can normally be reached Monday - Friday 8 am - 4 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Toan Ton can be reached at 571-272-2303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MESFIN T ASFAW/ Primary Examiner, Art Unit 2882
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Prosecution Timeline

Feb 26, 2025
Application Filed
Sep 01, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
97%
With Interview (+13.9%)
2y 8m (~1y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 991 resolved cases by this examiner. Grant probability derived from career allowance rate.

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