Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2851 2882 2884
This examiner grants 83% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18783670 | EXPOSURE EQUIPMENT | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18740139 | STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS | Final Rejection | ASM IP Holding B.V. |
| 18775344 | METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE | Non-Final OA | Carl Zeiss SMT GmbH |
| 18590076 | EUV LITHOGRAPHY SYSTEM COMPRISING A GAS-BINDING COMPONENT IN THE FORM OF A FOIL | Final Rejection | Carl Zeiss SMT GmbH |
| 18714640 | DIGITAL EXPOSURE SYSTEM | Non-Final OA | KOREA INSTITUTE OF MACHINERY & MATERIALS |
| 18542169 | EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD | Final Rejection | NIKON CORPORATION |
| 18776559 | RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18844757 | METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES | Non-Final OA | ASML Netherlands B.V. |
| 18844478 | SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES | Non-Final OA | ASML NETHERLANDS B.V. |
| 18843936 | METHOD FOR DETERMINING A SPATIAL DISTRIBUTION OF A PARAMETER OF INTEREST OVER AT LEAST ONE SUBSTRATE OR PORTION THEREOF | Non-Final OA | ASML NETHERLANDS B.V. |
| 18705509 | DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION | Non-Final OA | ASML NETHERLANDS B.V. |
| 18690979 | METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES | Final Rejection | ASML Netherlands B.V. |
| 18825486 | CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18807533 | LINE NARROWING LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18807607 | DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18588670 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 18741659 | Determination of Imaging Transfer Function of a Charged-Particle Exposure Apparatus Using Isofocal Dose Measurements | Non-Final OA | IMS Nanofabrication GmbH |
| 18736307 | HIGH RESOLUTION PHOTOLITHOGRAPHY | Non-Final OA | TERA-PRINT LLC |
| 18709199 | TEMPERATURE STABILIZATION OF CLIMATE CHAMBER | Non-Final OA | Mycronic AB |
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