Prosecution Insights
Last updated: April 19, 2026
Application No. 19/070,505

SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Final Rejection §102§103§DP
Filed
Mar 04, 2025
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Samsung Electronics
OA Round
2 (Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
3y 1m
To Grant
82%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
740 granted / 959 resolved
+12.2% vs TC avg
Moderate +5% lift
Without
With
+5.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
65 currently pending
Career history
1024
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
48.2%
+8.2% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
12.1%
-27.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 959 resolved cases

Office Action

§102 §103 §DP
DETAILED CORRESPONDENCE This Office action is in response to the application received December 22, 2025. All new rejections and any new language in the office action are in bold. Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 19-37 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-18 of U.S. Patent No. 12,242,189 and claims 1-18 of U.S. Patent No. 12,013,635 in view of MEYERS et al (20107/0102612). MEYERS et al disclose alcohol solvents with tin alkoxide metal ligands as seen in para. [0042] and [0043] wherein the formation of the hydrolyzed organotin alkoxide release alcohol when hydrolyzed by water and can be dissolved in a protic solvent such as an alcohol as taught to the skilled artisan for the coating composition. It would have been prima facie obvious to one of ordinary skill in the art of metal containing photosensitive compositions to add alcohol as a solvent as taught by MEYERS et al with the reasonable expectation for an organometal tin containing composition having high resolution at a relatively low radiation does and is useful for EUV patterning. Although the claims at issue are not identical, they are not patentably distinct from each other as recited above and would extend the grant to an obvious invention beyond the 20-year term from filing. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 19-22, 24-28, and 30-37 are rejected under 35 U.S.C. 103 as being unpatentable over MEYERS et al (2017/0102612)). The claimed invention now recites the following: PNG media_image1.png 520 678 media_image1.png Greyscale MEYERS et al disclose a tin containing composition comprising a precursor as prepared from Example 4, page 15, para. [0122] to [0128] and reported in Example 5 comprising the BuSn (NEt2)3 meeting the claimed Chemical Formula 2 above in claim 19. The composition comprises a solvent, wherein the water would come from the water vapor as reported in para. [0008]: PNG media_image2.png 386 376 media_image2.png Greyscale PNG media_image3.png 434 370 media_image3.png Greyscale . With respect to the method claim 31, Example 5 disclose a patterning process wherein the coating compositions are deposited on a silicon wafers, exposed to EUV light, post-exposure baked and then contacted with 5-heptanone to form a negative image. Applicants are directed to para. [0100] wherein the pattern process can be followed by an etching step to transfer the pattern to the substrate, see below: PNG media_image4.png 746 378 media_image4.png Greyscale It would have been prima facie obvious to one of ordinary skill in the art of organometallic compositions having a tin compound derived from t-Bu Sn (Et2 )3 dissolved in a solvent and contacted with water vapor, exposed and developed to have patterned images which can be transferred to the substrate with the reasonable expectation of same or similar results for high patterns with low LWR for high-integration and improved circuit function. The rejection is repeated wherein MEYERS et al disclose alcohol solvents with tin alkoxide metal ligands as seen in paras. [0042] and [0043] wherein the formation of the hydrolyzed organotin alkoxide release alcohol when hydrolyzed by water and can be dissolved in a protic solvent such as an alcohol as taught to the skilled artisan for the coating composition. It would have been prima facie obvious to one of ordinary skill in the art of metal containing photosensitive compositions to add alcohol as a solvent as taught by MEYERS et al with the reasonable expectation of success for an organometal tin containing compound having high resolution at a relatively low radiation does and is useful for EUV patterning. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu March 23, 2026
Read full office action

Prosecution Timeline

Mar 04, 2025
Application Filed
Apr 03, 2025
Response after Non-Final Action
Sep 30, 2025
Non-Final Rejection — §102, §103, §DP
Dec 22, 2025
Response Filed
Mar 23, 2026
Final Rejection — §102, §103, §DP (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12601975
COMPOSITIONS FOR REDUCING RESIST CONSUMPTION OF EXTREME ULTRAVIOLET METALLIC TYPE RESIST
2y 5m to grant Granted Apr 14, 2026
Patent 12585186
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
2y 5m to grant Granted Mar 24, 2026
Patent 12578646
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING
2y 5m to grant Granted Mar 17, 2026
Patent 12554198
Functional hydrogen silsesquioxane resins and the use thereof
2y 5m to grant Granted Feb 17, 2026
Patent 12547074
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT
2y 5m to grant Granted Feb 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
82%
With Interview (+5.1%)
3y 1m
Median Time to Grant
Moderate
PTA Risk
Based on 959 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month