Prosecution Insights
Prosecution Insights
Technology area: Medical Devices & Mechanical Engineering
5 pending office actions • 1 art units • 4 examiners • 0 of 5 (0%) have an AI response strategy ready • 7 patents granted in the last 365 days
Enpulse Co. Ltd. is currently overseeing 5 pending office actions within the Medical Devices & Mechanical Engineering technology area. These 5 pending office actions are distributed among 4 distinct examiners, suggesting a distribution of the workload across different individuals. However, all of these matters are contained within 1 distinct art unit, which centralizes the prosecution within a specific administrative division of the patent office.
The busiest examiner identified in the portfolio is VO, HAI, who is currently handling 2 pending office actions. This means that VO, HAI is responsible for a larger portion of the portfolio than the other distinct examiners. For the practitioner, this concentration requires a focused approach to the specific examination style of VO, HAI while also managing the distinct examiners involved in the broader portfolio. The use of the distinct art unit may provide consistency in the legal standards applied to the various applications.
Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Double-patenting + other | 1 (20%) |
| Multi-statute (no §101) | 4 (80%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| VO, HAI | 2 | 57.1% | +72.4% |
| NEIBAUR, ROBERT F | 1 | 76.8% | +31.6% |
| HAWKINS, JASON KHALIL | 1 | 67.5% | +44.3% |
| CASE, SARAH CATHERINE | 1 | 41.1% | +50.8% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18590378 | POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE | HAWKINS, JASON KHALIL | 13d |
| 18882756 | POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | VO, HAI | — |
| 18817224 | POLISHING PAD WITH IMPROVED SLURRY FLOWABILITY AND PROCESS FOR PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | NEIBAUR, ROBERT F | — |
| 18581387 | POLISHING PAD AND PREPARATION METHOD THEREOF | CASE, SARAH CATHERINE | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18590378 | POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE | HAWKINS, JASON KHALIL | 13d |
| 18882756 | POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | VO, HAI | — |
| 18817224 | POLISHING PAD WITH IMPROVED SLURRY FLOWABILITY AND PROCESS FOR PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | NEIBAUR, ROBERT F | — |
| 18609288 | POLISHING PAD WITH ADJUSTED CONTENT OF CHLORINE AND PROCESS FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME | VO, HAI | — |
| 18581387 | POLISHING PAD AND PREPARATION METHOD THEREOF | CASE, SARAH CATHERINE | — |
| Art Unit | Apps |
|---|---|
| 3723 | 2 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18882756 | POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | VO, HAI | — | §102§103§112 | Non-Final OA | — | Pending | Sep 12, 2024 |
| 18817224 | POLISHING PAD WITH IMPROVED SLURRY FLOWABILITY AND PROCESS FOR PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | NEIBAUR, ROBERT F | — | §102§103§112 | Non-Final OA | — | Pending | Aug 28, 2024 |
| 18609288 | POLISHING PAD WITH ADJUSTED CONTENT OF CHLORINE AND PROCESS FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME | VO, HAI | 3723 | §102§103§112DP | Non-Final OA | — | Pending | Mar 19, 2024 |
| 18590378 | POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE | HAWKINS, JASON KHALIL | 3723 | §102§103 | Final Rejection | 13d | Pending | Feb 28, 2024 |
| 18581387 | POLISHING PAD AND PREPARATION METHOD THEREOF | CASE, SARAH CATHERINE | — | §103§112 | Non-Final OA | — | Pending | Feb 20, 2024 |
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