Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
6 pending office actions • 5 art units • 6 examiners • 0 of 6 (0%) have an AI response strategy ready • 9 patents granted in the last 365 days
Hitachi High-Tech Analysis Corporation currently has 7 pending office actions in the Semiconductors, Circuits & Optics technology area. These matters are spread across 6 distinct art units, showing a broad technical footprint within the semiconductor sector. The portfolio is handled by 7 distinct examiners, which means that every one of the 7 pending office actions is being reviewed by a different person.
The busiest examiner, REVERMAN, CHAD ANDREW, is responsible for 1 pending office action. This reflects an even distribution of the workload, as each of the 7 distinct examiners is assigned exactly one action. Because the 7 pending office actions are distributed across 6 distinct art units, the company must navigate multiple administrative environments. This structure requires the company to tailor its prosecution strategies to the specific preferences of 7 distinct examiners, as no single examiner or art unit dominates the current Semiconductors, Circuits & Optics docket.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (17%) |
| §112 only | 1 (17%) |
| Multi-statute (no §101) | 4 (67%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| REVERMAN, CHAD ANDREW | 1 | 58.7% | +41.1% |
| LI, LARRY | 1 | 66.7% | +66.7% |
| GOURLIE, LAURA ELOISE | 1 | 68.8% | +33.3% |
| OTERO, KENNETH MAX | 1 | 52.4% | +43.3% |
| TSUI, YUNG-SHENG M | 1 | 66.5% | +6.3% |
| LEBRON, BENJAMIN L | 1 | 68.9% | +16.4% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19219190 | Particle Measurement Apparatus | REVERMAN, CHAD ANDREW | — |
| 18692790 | MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE | GOURLIE, LAURA ELOISE | — |
| 18584812 | HYDROGEN IMPURITY TESTING SYSTEM AND HYDROGEN IMPURITY TESTING METHOD | OTERO, KENNETH MAX | — |
| 18058698 | AMINO ACID ANALYSIS METHOD AND LIQUID CHROMATOGRAPHIC APPARATUS | LEBRON, BENJAMIN L | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19219190 | Particle Measurement Apparatus | REVERMAN, CHAD ANDREW | — |
| 18692789 | CONTROL METHOD, CHARGED PARTICLE BEAM DEVICE, AND PROGRAM | LI, LARRY | — |
| 18692790 | MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE | GOURLIE, LAURA ELOISE | — |
| 18584812 | HYDROGEN IMPURITY TESTING SYSTEM AND HYDROGEN IMPURITY TESTING METHOD | OTERO, KENNETH MAX | — |
| 18058698 | AMINO ACID ANALYSIS METHOD AND LIQUID CHROMATOGRAPHIC APPARATUS | LEBRON, BENJAMIN L | — |
| Art Unit | Apps |
|---|---|
| 2881 | 2 |
| 2877 | 1 |
| 1725 | 1 |
| 1684 | 1 |
| 1773 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19219190 | Particle Measurement Apparatus | REVERMAN, CHAD ANDREW | 2877 | §102§103 | Non-Final OA | — | Pending | May 27, 2025 |
| 18692789 | CONTROL METHOD, CHARGED PARTICLE BEAM DEVICE, AND PROGRAM | LI, LARRY | 2881 | §103 | Final Rejection | — | Pending | Mar 15, 2024 |
| 18692790 | MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE | GOURLIE, LAURA ELOISE | 2881 | §102§112 | Non-Final OA | — | Pending | Mar 15, 2024 |
| 18584812 | HYDROGEN IMPURITY TESTING SYSTEM AND HYDROGEN IMPURITY TESTING METHOD | OTERO, KENNETH MAX | 1725 | §103§112 | Non-Final OA | — | Pending | Feb 22, 2024 |
| 18202626 | LIQUID CHROMATOGRAPHIC DATA PROCESSING APPARATUS | TSUI, YUNG-SHENG M | 1684 | §112 | Final Rejection | — | Pending | May 26, 2023 |
| 18058698 | AMINO ACID ANALYSIS METHOD AND LIQUID CHROMATOGRAPHIC APPARATUS | LEBRON, BENJAMIN L | 1773 | §103§112 | Final Rejection | — | Pending | Nov 23, 2022 |
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Start Free TrialHitachi High-Tech Analysis Corporation has 6 pending office actions as of October 2026, spread across 5 art units and 6 examiners.
Chad Andrew Reverman has the most, with 1 of Hitachi High-Tech Analysis Corporation's pending office actions.
Mostly Semiconductors, Circuits & Optics (USPTO Tech Center 2800), based on where its pending office actions are examined.
