Listed by the USPTO as GOURLIE, LAURA ELOISE
Tech Center 2800 • Art Units: 2881
This examiner grants 69% of resolved cases
GOURLIE, LAURA ELOISE is a USPTO patent examiner in Tech Center 2800 and art unit 2881. The profile includes 64 resolved cases, an allowance rate of 68.8%, and a median of 1167 days to allowance. Interviews show a lift of 33.3%, indicating a favorable association between interview participation and allowance in the available record.
The listed companies are The Ohio State University, Applied Materials Inc., and Esol Inc. The listed firms are Meunier Carlin & Curfman LLC, OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P., and Revolution IP, PLLC. Practitioners should review the underlying cases for art-specific patterns, while using interviews to clarify claim scope and address outstanding issues.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17946750 | ION ACTIVATION AND FRAGMENTATION IN SUB-AMBIENT PRESSURE FOR ION MOBILITY AND MASS SPECTROMETRY | Non-Final OA | AGILENT TECHNOLOGIES, INC. |
| 18865208 | AIR-TIGHT AMBIENT MASS SPECTROMETRY | Non-Final OA | Ohio State Innovation Foundation |
| 18293052 | DEVICE AND METHOD FOR VIBRATION FREE LOW TEMPERATURE SAMPLE HOLDER FOR SIDE ENTRY ELECTRON MICROSCOPES | Final Rejection | Ohio State Innovation Foundation |
| 17978693 | PRE-CALCULATED COLLIMATOR MODEL FOR DOSE CALCULATION SOURCE MODELING | Non-Final OA | Siemens Healthineers International AG |
| 18696487 | Ion Milling Device | Non-Final OA | Hitachi High-Tech Corporation |
| 18415326 | ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM | Final Rejection | Applied Materials, Inc. |
| 18107819 | System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter | Final Rejection | Applied Materials, Inc. |
| 17917672 | NANOTIP ION SOURCES AND METHODS | Final Rejection | Brown University |
| 18204593 | IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BEAM DEVICE | Final Rejection | Carl Zeiss Microscopy GmbH |
| 18413929 | MASS SPECTROMETRY IMAGE PROCESSING METHOD, IMAGE PROCESSING METHOD AND MASS SPECTROMETRY APPARATUS | Final Rejection | SHIMADZU CORPORATION |
| 17591569 | COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE IMAGING | Final Rejection | KLA Corporation |
| 18448430 | METHOD AND SYSTEM FOR PREPARING A SPECIMEN | Final Rejection | FEI Company |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy68.8% of resolved applications examined by Laura Eloise Gourlie were allowed (64 resolved cases), compared with 69.6% across Art Unit 2881 over the last five years.
This examiner's interview lift is +33.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Laura Eloise Gourlie took 1,167 days on average from filing to allowance.
Laura Eloise Gourlie examines applications in Art Unit 2881 in Tech Center 2800 (Semiconductors, Circuits & Optics).
