1 pending office actions • 0 art units • 1 examiners • 0 of 1 (0%) have an AI response strategy ready • 5 patents granted in the last 365 days
The Institute Of Chemistry Chinese Academy Of Sciences currently has 2 pending office actions. These actions are distributed across 2 distinct examiners, showing that the portfolio's current prosecution is not concentrated under 1 official. The data indicates 0 distinct art units for these pending matters.
KIM, TONG-HO is the busiest examiner for this portfolio, with 1 pending office action. This examiner handles a portion of the total pending actions currently facing the organization. The presence of 2 distinct examiners suggests a range of technical reviews for the institute's pending applications.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §112 only | 1 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| FRASER, STEWART A | 1 | 85.9% | +14.5% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18692248 | SILICON-CONTAINING MOLECULAR GLASS PHOTORESIST COMPOUND WITH HIGH ETCHING RESISTANCE, PREPARATION METHOD THEREFOR, AND USE THEREOF | FRASER, STEWART A | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18692248 | SILICON-CONTAINING MOLECULAR GLASS PHOTORESIST COMPOUND WITH HIGH ETCHING RESISTANCE, PREPARATION METHOD THEREFOR, AND USE THEREOF | FRASER, STEWART A | — |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18692248 | SILICON-CONTAINING MOLECULAR GLASS PHOTORESIST COMPOUND WITH HIGH ETCHING RESISTANCE, PREPARATION METHOD THEREFOR, AND USE THEREOF | FRASER, STEWART A | — | §112 | Non-Final OA | — | Pending | Mar 14, 2024 |
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