Technology area: Semiconductors, Circuits & Optics
2 pending office actions • 1 art units • 1 examiners • 0 of 2 (0%) have an AI response strategy ready
Lids Semiconductor Technology Co. Ltd. has 2 pending office actions within the Semiconductors, Circuits & Optics technology area. Both of these matters are currently assigned to a distinct art unit, indicating a concentrated technical focus for the company's current USPTO filings. This concentration suggests that the company's semiconductor innovations are being evaluated within a specialized division of the USPTO, which may lead to consistent procedural expectations across the portfolio.
The prosecution is handled by a distinct examiner, ASFAW, MESFIN T, who is responsible for 2 pending actions. This concentration means that the company's immediate patent outcomes in this area are entirely dependent on the review and feedback of this specific official. Having a single examiner for the entire active workload allows for a more focused prosecution strategy, as the legal team only needs to navigate the preferences and interpretations of that individual.
While this centralized structure provides consistency, it also means that the company lacks the diversification of examiner perspectives found in larger portfolios. Practitioners should focus on building a clear understanding of the specific examination style and technical requirements favored by ASFAW, MESFIN T. The outcome of these matters will significantly shape the company's current standing within the Semiconductors, Circuits & Optics sector.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| ASFAW, MESFIN T | 2 | 83.1% | +13.9% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19078475 | ALIGNMENT SYSTEM AND ALIGNMENT METHOD FOR SEMICONDUCTOR LITHOGRAPHY PROCESSES | ASFAW, MESFIN T | — |
| 19078494 | METHOD AND SYSTEM FOR ADJUSTING MASK DEFORMATION | ASFAW, MESFIN T | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19078475 | ALIGNMENT SYSTEM AND ALIGNMENT METHOD FOR SEMICONDUCTOR LITHOGRAPHY PROCESSES | ASFAW, MESFIN T | — |
| 19078494 | METHOD AND SYSTEM FOR ADJUSTING MASK DEFORMATION | ASFAW, MESFIN T | — |
| Art Unit | Apps |
|---|---|
| 2882 | 2 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19078475 | ALIGNMENT SYSTEM AND ALIGNMENT METHOD FOR SEMICONDUCTOR LITHOGRAPHY PROCESSES | ASFAW, MESFIN T | 2882 | §103 | Non-Final OA | — | Pending | Mar 13, 2025 |
| 19078494 | METHOD AND SYSTEM FOR ADJUSTING MASK DEFORMATION | ASFAW, MESFIN T | 2882 | §103 | Non-Final OA | — | Pending | Mar 13, 2025 |
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Start Free TrialLids Semiconductor Technology Co. Ltd. has 2 pending office actions as of October 2026, spread across 1 art units and 1 examiners.
Mesfin T Asfaw has the most, with 2 of Lids Semiconductor Technology Co. Ltd.'s pending office actions.
Mostly Semiconductors, Circuits & Optics (USPTO Tech Center 2800), based on where its pending office actions are examined.
