Listed by the USPTO as ASFAW, MESFIN T
Tech Center 3700 • Art Units: 1724 2851 2882 2884 3652 3723
This examiner grants 83% of resolved cases
ASFAW, MESFIN T is assigned to tech center 3700 and art unit 1724. The record covers 997 resolved cases, with an 83.1% allowance rate and a median of 975 days to allowance. The case volume provides a substantial basis for planning, and the allowance rate indicates that favorable outcomes occur frequently in the recorded matters.
Interview lift is 13.9%, reflecting a positive but limited association with the recorded outcomes. The listed companies are ASML Holding N.V., Taiwan Semiconductor Manufacturing Company, Ltd., and Carl Zeiss SMT GmbH. The firms are Pillsbury Winthrop Shaw Pittman, LLP, Bruce Stone LLP, and Rossi, Kimms & McDowell LLP. Practitioners may emphasize technically precise written submissions, using interviews to resolve focused issues without treating them as the primary driver of outcome.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19063911 | EXPOSURE APPARATUS, CONTROL METHOD THEREFOR, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, NON-TRANSITORY COMPUTER READABLE MEDIUM, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19018323 | IMPRINT METHOD, MOLD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19036574 | SUBSTARATE PROCESSING APPARATUS WITH VUV INTENSITY CONTROL | Non-Final OA | ASM IP Holding B.V. |
| 19171607 | ION EXPOSURE METHOD AND APPARATUS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19084896 | LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18947761 | NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19091549 | OPTICAL SYSTEM INCLUDING OPTICAL FILTER AND CORRESPONDING METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18942306 | RETICLE POD WITH AIR FLOW MANAGEMENT FEATURE | Final Rejection | ENTEGRIS, INC. |
| 18223241 | METHOD OF PRODUCING AN OPTICAL ELEMENT FOR A LITHOGRAPHY APPARATUS | Final Rejection | Carl Zeiss Jena GmbH |
| 19210413 | SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS | Non-Final OA | ASML HOLDING N.V. |
| 19125621 | CONTAMINATION CONTROL | Non-Final OA | ASML Netherlands B.V. |
| 19008794 | APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION | Non-Final OA | ASML NETHERLANDS B.V. |
| 18844478 | SETUP AND CONTROL METHODS FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES | Non-Final OA | ASML NETHERLANDS B.V. |
| 18843936 | METHOD FOR DETERMINING A SPATIAL DISTRIBUTION OF A PARAMETER OF INTEREST OVER AT LEAST ONE SUBSTRATE OR PORTION THEREOF | Final Rejection | ASML NETHERLANDS B.V. |
| 18690979 | METHOD FOR FOCUS METROLOGY AND ASSOCIATED APPARATUSES | Non-Final OA | ASML Netherlands B.V. |
| 19074961 | BIPOD, OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 19068695 | ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMINATING A RETICLE, AND LITHOGRAPHY SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 19063773 | INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 19044083 | LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19042393 | FIDUCIAL PATTERN ALIGNMENT TECHNIQUES | Non-Final OA | Onto Innovation Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy83.1% of resolved applications examined by Mesfin T Asfaw were allowed (997 resolved cases), compared with 63.2% across Art Unit 1724 over the last five years.
This examiner's interview lift is +13.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Mesfin T Asfaw took 975 days on average from filing to allowance.
Mesfin T Asfaw examines applications in Art Unit 1724 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
