Prosecution Insights
Prosecution Insights
1 pending office actions • 0 art units • 1 examiners • 0 of 1 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Lotus Applied Technology LLC has 1 pending office action. This action is being handled by 1 distinct examiner. The portfolio shows 0 distinct art units for the pending matter. MCCLURE, CHRISTINA D is the busiest examiner for the company. This examiner is managing 1 busiest examiner pending office action. As there is only 1 pending action in total, this examiner is responsible for the entire pending workload. This focused prosecution allows for a direct and singular point of contact at the patent office for the company's current application.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Multi-statute (no §101) | 1 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MCCLURE, CHRISTINA D | 1 | 29.9% | +32.7% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19216004 | METAL-FLUORIDE THIN FILMS AND DEPOSITION METHODS | MCCLURE, CHRISTINA D | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 19216004 | METAL-FLUORIDE THIN FILMS AND DEPOSITION METHODS | MCCLURE, CHRISTINA D | — |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19216004 | METAL-FLUORIDE THIN FILMS AND DEPOSITION METHODS | MCCLURE, CHRISTINA D | — | §103§112 | Non-Final OA | — | Pending | May 22, 2025 |
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