Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Medical Devices & Mechanical Engineering
3 pending office actions • 3 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready • 7 patents granted in the last 365 days
Mks Inc. is currently managing 3 pending office actions within the Chemistry & Materials technology area. These actions are distributed across 3 distinct examiners and 3 distinct art units, representing a high degree of diversification for a portfolio of this size. Each pending matter is being handled by a different examiner in a different art unit, which suggests that the company's innovations in Chemistry & Materials span several distinct technical sub-fields or applications.
The busiest examiner, VAN, LUAN V, is responsible for 1 pending office action. Given that there are 3 pending office actions in total, the workload is distributed among the 3 distinct examiners so that each handles 1 matter. This alignment of 3 pending actions to 3 examiners and 3 art units means that no single examiner or art unit has a concentrated influence over the company's current prosecution. Practitioners should expect a variety of perspectives and procedural styles across these 3 active matters.
Based on the USPTO statutory response window for each pending office action. 3 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 3 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Multi-statute (no §101) | 3 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| VAN, LUAN V | 1 | 34.3% | +40.4% |
| ROST, ANDREW J | 1 | 65.6% | +19.9% |
| CHAUDHRI, OMAIR | 1 | 65.9% | +22.7% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17830232 | Light-Enhanced Ozone Wafer Processing System and Method of Use | CHAUDHRI, OMAIR | 21d |
| 18170964 | Method and Apparatus for Integrated Pressure and Flow Controller | ROST, ANDREW J | 34d |
| 18134087 | COATINGS FOR USE IN REMOTE PLASMA SOURCE APPLICATIONS AND METHOD OF THEIR MANUFACTURE | VAN, LUAN V | 48d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17830232 | Light-Enhanced Ozone Wafer Processing System and Method of Use | CHAUDHRI, OMAIR | 21d |
| 18170964 | Method and Apparatus for Integrated Pressure and Flow Controller | ROST, ANDREW J | 34d |
| 18134087 | COATINGS FOR USE IN REMOTE PLASMA SOURCE APPLICATIONS AND METHOD OF THEIR MANUFACTURE | VAN, LUAN V | 48d |
| Art Unit | Apps |
|---|---|
| 1795 | 1 |
| 3753 | 1 |
| 1711 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18134087 | COATINGS FOR USE IN REMOTE PLASMA SOURCE APPLICATIONS AND METHOD OF THEIR MANUFACTURE | VAN, LUAN V | 1795 | §102§103§112 | Final Rejection | 48d | Pending | Apr 13, 2023 |
| 18170964 | Method and Apparatus for Integrated Pressure and Flow Controller | ROST, ANDREW J | 3753 | §102§103 | Final Rejection | 34d | Pending | Feb 17, 2023 |
| 17830232 | Light-Enhanced Ozone Wafer Processing System and Method of Use | CHAUDHRI, OMAIR | 1711 | §102§103 | Final Rejection | 21d | Pending | Jun 01, 2022 |
IP Author helps IP teams respond to office actions faster with AI-generated responses, examiner analytics, and prosecution intelligence.
Start Free Trial