Prosecution Insights
Prosecution Insights
6 pending office actions • 5 art units • 5 examiners • 0 of 6 (0%) have an AI response strategy ready • 7 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 6 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 6 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 5 (83%) |
| §102 only | 1 (17%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| SATHIRAJU, SRINIVAS | 2 | 88.8% | +5.8% |
| REYES, JOSHUA NATHANIEL PI | 1 | 42.2% | +51.6% |
| ROST, ANDREW J | 1 | 65.1% | +19.8% |
| LUND, JEFFRIE ROBERT | 1 | 60.0% | +29.3% |
| CHAUDHRI, OMAIR | 1 | 65.5% | +26.1% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18631119 | INVERTED PLASMA SOURCE | SATHIRAJU, SRINIVAS | 14d |
| 18523178 | Source Tuning With Pulsed DC Bias | SATHIRAJU, SRINIVAS | 41d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 4 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17830232 | Light-Enhanced Ozone Wafer Processing System and Method of Use | CHAUDHRI, OMAIR | 21d |
| 18170964 | Method and Apparatus for Integrated Pressure and Flow Controller | ROST, ANDREW J | 34d |
| 18122509 | APPARATUS AND METHOD FOR CURRENT SENSING USING EMBEDDED ELECTRODES | REYES, JOSHUA NATHANIEL PI | 56d |
| 17983934 | Methods and Systems for Feedback Control in Plasma Processing Using Radical Sensing | LUND, JEFFRIE ROBERT | 70d |
| Art Unit | Apps |
|---|---|
| 2844 | 2 |
| 1718 | 1 |
| 3753 | 1 |
| 1716 | 1 |
| 1711 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18631119 | INVERTED PLASMA SOURCE | SATHIRAJU, SRINIVAS | 2844 | §103 | Non-Final OA | 14d | Pending | Apr 10, 2024 |
| 18523178 | Source Tuning With Pulsed DC Bias | SATHIRAJU, SRINIVAS | 2844 | §102 | Final Rejection | 41d | Pending | Nov 29, 2023 |
| 18122509 | APPARATUS AND METHOD FOR CURRENT SENSING USING EMBEDDED ELECTRODES | REYES, JOSHUA NATHANIEL PI | 1718 | §103 | Final Rejection | 56d | Pending | Mar 16, 2023 |
| 18170964 | Method and Apparatus for Integrated Pressure and Flow Controller | ROST, ANDREW J | 3753 | §103 | Non-Final OA | 34d | Pending | Feb 17, 2023 |
| 17983934 | Methods and Systems for Feedback Control in Plasma Processing Using Radical Sensing | LUND, JEFFRIE ROBERT | 1716 | §103 | Non-Final OA | 70d | Pending | Nov 09, 2022 |
| 17830232 | Light-Enhanced Ozone Wafer Processing System and Method of Use | CHAUDHRI, OMAIR | 1711 | §103 | Non-Final OA | 21d | Pending | Jun 01, 2022 |
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