Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1723 1754 1794 1795
This examiner grants 45% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18009532 | Secondary Battery | Final Rejection | LG Energy Solution, Ltd. |
| 17687961 | SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION | Non-Final OA | Samsung Display Co., LTD. |
| 18177285 | ENERGY STORAGE SYSTEM, COOLING SYSTEM, AND RELATED METHOD | Non-Final OA | Caterpillar Inc. |
| 18418930 | METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD IN A PROCESS CHAMBER | Final Rejection | Applied Materials, Inc. |
| 17990536 | SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE | Final Rejection | Applied Materials, Inc. |
| 17687157 | COIL FOR IMPROVED PROCESS CHAMBER DEPOSITION AND ETCH UNIFORMITY | Final Rejection | Applied Materials, Inc. |
| 18399237 | SPUTTER TARGETS FOR SELF-DOPED SOURCE AND DRAIN CONTACTS | Final Rejection | Intel Corporation |
| 17676411 | APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF | Non-Final OA | Tokyo Electron Limited |
| 17428597 | FILM FORMING APPARATUS AND FILM FORMING METHOD | Non-Final OA | TOKYO ELECTRON LIMITED |
| 18120358 | LOW CARBON DEFECT COPPER-MANGANESE SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME | Final Rejection | Tosoh SMD, Inc. |
| 18319958 | RETAINING COMPONENT, BATTERY ASSEMBLY AND END STRUCTURE FOR BATTERY ASSEMBLY | Non-Final OA | TECHTRONIC CORDLESS GP |
| 18117568 | METHOD FOR MANUFACTURING GAS DIFFUSION LAYER FOR FUEL CELL AND GAS DIFFUSION LAYER MANUFACTURED THEREBY | Non-Final OA | INHA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
| 18247670 | HARD CARBON COATINGS WITH IMPROVED ADHESION STRENGTH BY MEANS OF HIPIMS AND METHOD THEREOF | Non-Final OA | Oerlikon Surface Solutions AG, Pfäffikon |
| 17613065 | PVD COATINGS COMPRISING MULTI-ANION HIGH ENTROPY ALLOY OXY-NITRIDES | Non-Final OA | OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON |
| 18258499 | MAGNETRON SPUTTERING APPARATUS | Non-Final OA | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. |
| 18286506 | SPUTTERING TARGET AND METHOD FOR FORMING CESIUM TUNGSTEN OXIDE FILM | Final Rejection | SUMITOMO METAL MINING Co., Ltd., |
| 18283870 | Sputtering Apparatus | Final Rejection | Sumitomo Precision Products Co., Ltd. |
| 18427610 | SYSTEMS AND METHODS FOR IN-SITU ETCHING PRIOR TO PHYSICAL VAPOR DEPOSITION IN THE SAME CHAMBER | Non-Final OA | OEM Group, LLC |
| 18048442 | BATTERY PACK INCLUDING SURFACE PRESSURE MAINTAINING STRUCTURE | Non-Final OA | SEOYON E-HWA CO., LTD. |
| 18557430 | METHOD FOR DEPOSITION OF DENSE CHROMIUM ON A SUBSTRATE | Final Rejection | Hydromecanique Et Frottement |
| 18063687 | NON-AQUEOUS ELECTROLYTIC SECONDARY BATTERY AND ASSEMBLED BATTERY | Final Rejection | PRIMEARTH EV ENERGY CO., LTD. |
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