Listed by the USPTO as BENNER, JANE WEI
Tech Center 2100 • Art Units: 2131 2139
This examiner grants 84% of resolved cases
Benner, Jane Wei resolved 315 cases in Tech Center 2100 and Art Unit 2131. The allowance rate was 84.1%, with a median time to allowance of 921 days. Interview lift was 7.5%, a positive but comparatively limited association within the reported case set.
The leading companies were Samsung Electronics Co., Ltd., Micron Technology Inc., and Hitachi Ltd. The leading firms were NSIP LAW, SUGHRUE MION, PLLC, and VOLPE KOENIG. The profile combines a high allowance rate with a prosecution period approaching the reported median of 921 days, so practitioners may benefit from early attention to claim scope and clear responses to examiner issues.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19259074 | DEVICE AND METHOD WITH REDUCTION OF CACHE LINE FETCHES | Non-Final OA | Samsung Electronics Co., Ltd. |
| 19217362 | CXL DEVICE AND SYSTEM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19007171 | SYSTEM AND METHOD FOR CACHING IN A STORAGE DEVICE | Final Rejection | Samsung Electronics Co., Ltd. |
| 19201597 | ADAPTIVE MEMORY STATUS REPORTING | Non-Final OA | Micron Technology, Inc. |
| 18884935 | STORAGE SYSTEM | Final Rejection | Hitachi Vantara, Ltd. |
| 18982911 | SINGLE INPUT/OUTPUT WRITES IN A FILE SYSTEM HOSTED ON A CLOUD, VIRTUAL, OR COMMODITY-SERVER PLATFORM | Final Rejection | NetApp, Inc. |
| 19300712 | ELECTRONIC DEVICE INCLUDING NPU AND DRAM FOR PERFORMING INFERENCE OF AN ARTIFICIAL NEURAL NETWORK | Non-Final OA | DEEPX CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy84.1% of resolved applications examined by Jane Wei Benner were allowed (315 resolved cases), compared with 0.0% across Art Unit 2131 over the last five years.
This examiner's interview lift is +7.5 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jane Wei Benner took 921 days on average from filing to allowance.
Jane Wei Benner examines applications in Art Unit 2131 in Tech Center 2100 (Computing & Software).
