Listed by the USPTO as CLEVELAND, MICHAEL B
Tech Center 1700 • Art Units: 1700 1712 1722 1724 1732 1737 1747 1748 1759 1761
This examiner grants 17% of resolved cases
Michael B. Cleveland is an examiner in Tech Center 1700 and Art Unit 1700, with 84 resolved cases. He has an allowance rate pct of 16.7%. However, the interview lift pct is 15.1%, suggesting that interviews can increase the likelihood of allowance compared to the base rate.
The median days to allowance is 1464. His docket includes Taiwan Semiconductor Manufacturing Company, Ltd., Samsung Electronics Co., Ltd., and Fujifilm Corporation. The firms BIRCH STEWART KOLASCH & BIRCH, LLP, CARTER, DELUCA & FARRELL LLP, and PNJ IP Law, P.C. are frequently involved. Practitioners should be prepared for a 1464-day median pendency and consider the 15.1% interview lift pct as a strategy.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17849124 | METHOD OF MANUFACTURING CONDUCTIVE SUBSTRATE, CONDUCTIVE SUBSTRATE, TOUCH SENSOR, ANTENNA, ELECTROMAGNETIC WAVE SHIELDING MATERIAL | Final Rejection | FUJIFILM Corporation |
| 17938656 | EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY PROCESSES FOR PATTERNING PHOTORESIST AND PHOTOLITHOGRAPHY MASKS USED THEREIN | Final Rejection | Samsung Electronics Co., Ltd. |
| 18166598 | Selective Deprotection via Dye Diffusion | Final Rejection | Tokyo Electron Limited |
| 17890766 | METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR STRESS FILM TUNING | Non-Final OA | Tokyo Electron Limited |
| 17818369 | PHOTOMASK AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 17880019 | EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17736772 | MANUFACTURING METHOD OF EUV PHOTO MASKS | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17710218 | METHOD FOR LITHOGRAPHY USING MIDDLE LAYER WITH POROUS TOP SURFACE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17679463 | SURFACE TREATMENT TO PHOTOSENSITIVE LAYER | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17461656 | Semiconductor Device and Methods of Manufacture | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18073568 | APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE | Final Rejection | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy16.7% of resolved applications examined by Michael B Cleveland were allowed (84 resolved cases), compared with 40.4% across Art Unit 1700 over the last five years.
This examiner's interview lift is +15.1 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Michael B Cleveland took 1,464 days on average from filing to allowance.
Michael B Cleveland examines applications in Art Unit 1700 in Tech Center 1700 (Chemistry & Materials).
