Tech Center 1700 • Art Units: 1700 1712 1737 1761
This examiner grants 15% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18395586 | FILAMENT WINDING DEVICE AND FILAMENT WINDING METHOD | Final Rejection | HONDA MOTOR CO., LTD. |
| 17818369 | PHOTOMASK AND METHOD OF MANUFACTURING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 17880019 | EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17710218 | METHOD FOR LITHOGRAPHY USING MIDDLE LAYER WITH POROUS TOP SURFACE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18151413 | NEGATIVE TONE PHOTORESIST FOR EUV LITHOGRAPHY | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
| 17684329 | OXIDATION TREATMENT FOR POSITIVE TONE PHOTORESIST FILMS | Final Rejection | Applied Materials, Inc. |
| 17890766 | METHOD TO ENHANCE LITHOGRAPHY PATTERN CREATION USING SEMICONDUCTOR STRESS FILM TUNING | Final Rejection | Tokyo Electron Limited |
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