Prosecution Insights
Last updated: October 27, 2026

Kaitlyn Renee Haefner, USPTO Patent Examiner

Listed by the USPTO as HAEFNER, KAITLYN RENEE

Tech Center 2100 • Art Units: 2148

This examiner grants 0% of resolved cases

Analysis

Kaitlyn Renee Haefner has resolved 1 case in Tech Center 2100. This case resulted in an allowance rate of 0.0% with a pendency of 1209 days in Art Unit 2148. The interview lift is 0.0%. Rockwell Automation Technologies Inc. is the top company associated with this examiner's limited docket of 1 resolved case. Practitioners should note that the 0.0% allowance rate is based on a single resolution.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

0.0%
Allow Rate
-55.0% vs TC avg
2
Total Applications
+0.0%
Interview Lift
1209
Avg Prosecution Days
Based on 1 resolved cases, 2023–2026

Rejection Statute Breakdown

30.0%
§101 Eligibility
20.0%
§102 Novelty
30.0%
§103 Obviousness
20.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
17661408 SYSTEMS AND METHODS FOR PROVIDING PREDICTIONS WITH SUPERVISED AND UNSUPERVISED DATA IN INDUSTRIAL SYSTEMS Final Rejection Rockwell Automation Technologies, Inc.

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Frequently Asked Questions

What is examiner Kaitlyn Renee Haefner's allowance rate?

0.0% of resolved applications examined by Kaitlyn Renee Haefner were allowed (1 resolved cases), compared with 75.7% across Art Unit 2148 over the last five years.

Does an interview help with examiner Kaitlyn Renee Haefner?

This examiner's interview lift is +0.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Kaitlyn Renee Haefner take to allow a patent?

Applications allowed by Kaitlyn Renee Haefner took 1,209 days on average from filing to allowance.

Which art unit does examiner Kaitlyn Renee Haefner work in?

Kaitlyn Renee Haefner examines applications in Art Unit 2148 in Tech Center 2100 (Computing & Software).

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