Listed by the USPTO as HAY, GRANT DAVID
Tech Center 4100 • Art Units: 3723 4100
This examiner grants 0% of resolved cases
HAY, GRANT DAVID works in tech center 4100 and art unit 3723. The profile contains 1 resolved case, with an allowance rate of 0.0%, an interview lift of 0.0%, and a median of 1019 days to allowance. The single resolved case did not reach allowance, and interviews show no measured lift.
The leading companies are Samsung Electronics Co., Ltd., RTX Corporation, and Ebara Corporation. The listed firms are Chrisman Gallo Tochtrop LLC, BakerHostetler, and BCF LLP (Misc.). Because the record is limited to one resolved case, practitioners should treat these figures as preliminary and focus on the application-specific examination record.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18821480 | NOZZLE OF CLEANER | Non-Final OA | LG ELECTRONICS INC. |
| 18937275 | CHEMICAL MECHANICAL POLISHING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18808876 | CARRIER HEAD AND SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18619536 | ASSEMBLY JIGS AND METHODS OF INSTALLING DOORS TO AN AIRCRAFT | Final Rejection | Airbus Operations Limited |
| 18993632 | FAIRED WINDSCREEN WIPER BLADE | Non-Final OA | VALEO SYSTEMES D'ESSUYAGE |
| 18619378 | SEMICONDUCTOR MANUFACTURING APPARATUS | Final Rejection | Mitsubishi Electric Corporation |
| 18644934 | PHYSICS-BASED PROCESS CONTROL METHOD AND SYSTEM | Final Rejection | RTX Corporation |
| 18644846 | PROCESS CONTROL METHOD AND APPARATUS | Non-Final OA | RTX Corporation |
| 18842680 | SUBSTRATE POLISHING METHOD | Non-Final OA | EBARA CORPORATION |
| 18854171 | FIXING SYSTEM | Non-Final OA | TECHNOLOGIES CGC INC. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy0.0% of resolved applications examined by Grant David Hay were allowed (1 resolved cases), compared with 56.5% across Art Unit 3723 over the last five years.
This examiner's interview lift is +0.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Grant David Hay took 1,019 days on average from filing to allowance.
Grant David Hay examines applications in Art Unit 3723 in Tech Center 4100.
