Tech Center 3700 • Art Units: 2881 3791
This examiner grants 85% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18810735 | REFLECTOR FOR GENERATING NEUTRAL BEAMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18688499 | INTEGRATED FESEM AND LDI-TOF-MS ANALYSIS SYSTEM | Non-Final OA | LG Energy Solution, Ltd. |
| 18697079 | APPARATUS FOR PREPARING ELECTRON MICROSCOPY SAMPLES AND METHODS OF USE THEREOF | Non-Final OA | The Regents of the University of California |
| 18713248 | METHOD FOR CONTROLLING MASS SPECTROMETER, AND MASS SPECTROMETER | Non-Final OA | Hitachi High-Tech Corporation |
| 18390046 | Processor System, Correction Method, and Correction Program | Final Rejection | Hitachi High-Tech Corporation |
| 18010939 | Electron Microscope | Final Rejection | Hitachi High-Tech Corporation |
| 18061338 | CHARGED PARTICLE BEAM GENERATION | Non-Final OA | Microchip Technology Incorporated |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | Final Rejection | KLA Corporation |
| 18148003 | ELECTROMAGNETIC WAVE ABSORBING MATERIAL, PREPARING METHOD THEREOF AND COMPOSITE STRUCTURE FOR SUPPRESSING ELECTROMAGNETIC INTERFERENCE | Non-Final OA | Industrial Technology Research Institute |
| 18713037 | SINGLE-PARTICLE INDUCTIVELY-COUPLED PLASMA MASS SPECTROMETRY PARTICLE SIZING AND COUNTING METHOD, SYSTEM, COMPUTER PROGRAM AND COMPUTER-READABLE DATA CARRIER | Non-Final OA | ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) |
| 18767485 | REDUCED BOERSCH EFFECT IN DISPERSIVE OPTICS | Non-Final OA | FEI Company |
| 18485133 | DRY ELECTRON SOURCE ENVIRONMENT | Non-Final OA | FEI Company |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy