Tech Center 3700 • Art Units: 2881 3791
This examiner grants 84% of resolved cases
Alina Rose Kaliszewski, working in Tech Center 3700 and Art Unit 2881, maintains a high allowance rate of 84.4 percent across 64 resolved cases. This rate suggests a favorable environment for applicants seeking to secure patent rights. The efficiency of the process is reflected in a median days to allowance of 1094, which establishes a clear expectation for the duration of the prosecution.
The data also highlights an interview lift of 23.8 percent, indicating that personal engagement with the examiner is a highly effective strategy. Given the 84.4 percent allowance rate, an interview may help expedite the 1094-day median timeline or resolve specific technical hurdles. With 64 resolved cases as a baseline, practitioners can approach Art Unit 2881 with confidence in achieving a positive outcome through standard prosecution and proactive communication. The 23.8 percent lift provides a significant advantage for those seeking to move past initial rejections.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18810735 | REFLECTOR FOR GENERATING NEUTRAL BEAMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18357183 | ANALYSIS APPARATUS AND ANALYSIS METHOD | Final Rejection | FUJIFILM Corporation |
| 18843063 | CAP UNIT, STORAGE TANK, AND FLOWING WATER STERILIZATION DEVICE | Non-Final OA | Stanley Electric Co., Ltd. |
| 18688499 | INTEGRATED FESEM AND LDI-TOF-MS ANALYSIS SYSTEM | Non-Final OA | LG Energy Solution, Ltd. |
| 18697079 | APPARATUS FOR PREPARING ELECTRON MICROSCOPY SAMPLES AND METHODS OF USE THEREOF | Non-Final OA | The Regents of the University of California |
| 18864289 | ION MILLING DEVICE AND ION MILLING METHOD | Non-Final OA | Hitachi High-Tech Corporation |
| 18713248 | METHOD FOR CONTROLLING MASS SPECTROMETER, AND MASS SPECTROMETER | Non-Final OA | Hitachi High-Tech Corporation |
| 18390046 | Processor System, Correction Method, and Correction Program | Final Rejection | Hitachi High-Tech Corporation |
| 18010939 | Electron Microscope | Final Rejection | Hitachi High-Tech Corporation |
| 18797558 | Devices for Controlling Trapped Ions and Methods for Manufacturing Thereof | Non-Final OA | Infineon Technologies Austria AG |
| 18548062 | ELECTRONIC TWEEZERS | Non-Final OA | ZHEJIANG UNIVERSITY |
| 18508669 | ION SOURCE APPARATUS AND MASS SPECTROMETER | Non-Final OA | SHIMADZU CORPORATION |
| 18897888 | BEAM ANGLE ROTATION AND SAMPLE ROTATION | Non-Final OA | Carl Zeiss SMT GmbH |
| 18148003 | ELECTROMAGNETIC WAVE ABSORBING MATERIAL, PREPARING METHOD THEREOF AND COMPOSITE STRUCTURE FOR SUPPRESSING ELECTROMAGNETIC INTERFERENCE | Non-Final OA | Industrial Technology Research Institute |
| 18864463 | OBTAINING HIGH RESOLUTION INFORMATION FROM LOW RESOLUTION IMAGES | Non-Final OA | ASML Netherlands B.V. |
| 18596467 | PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS | Final Rejection | ASML Netherlands B.V. |
| 17941897 | APERTURE BODY, FLOOD COLUMN AND CHARGED PARTICLE TOOL | Non-Final OA | ASML Netherlands B.V. |
| 17909352 | BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM | Final Rejection | ASML Netherlands B.V. |
| 18744091 | AXIAL ION SOURCE | Non-Final OA | Thermo Fisher Scientific (Bremen) GmbH |
| 18466766 | TUNING A MASS SPECTROMETER FILTER | Final Rejection | Thermo Fisher Scientific (Bremen) GmbH |
| 18909820 | ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY | Non-Final OA | KLA Corporation |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | Final Rejection | KLA Corporation |
| 18673251 | DEFECT DEPTH ESTIMATION FOR A SEMICONDUCTOR SPECIMEN | Non-Final OA | Applied Materials Israel Ltd. |
| 17998289 | NEUTRON BEAM SHIELDING GYPSUM-BASED BUILDING BOARD AND METHOD OF MANUFACTURING NEUTRON BEAM SHIELDING GYPSUM-BASED BUILDING BOARD | Final Rejection | YOSHINO GYPSUM CO., LTD. |
| 18409960 | Mass Spectrometry System and Peak Evaluation Method | Non-Final OA | JEOL Ltd. |
| 18707137 | Ion Optical Elements and Methods of Manufacturing the Same | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18293148 | GENERIC PEAK FINDER | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18273914 | Pressure Control in Vacuum Chamber of Mass Spectrometer | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18713037 | SINGLE-PARTICLE INDUCTIVELY-COUPLED PLASMA MASS SPECTROMETRY PARTICLE SIZING AND COUNTING METHOD, SYSTEM, COMPUTER PROGRAM AND COMPUTER-READABLE DATA CARRIER | Non-Final OA | ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) |
| 18767485 | REDUCED BOERSCH EFFECT IN DISPERSIVE OPTICS | Non-Final OA | FEI Company |
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