Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 2881 3791
This examiner grants 85% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18810735 | REFLECTOR FOR GENERATING NEUTRAL BEAMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18688499 | INTEGRATED FESEM AND LDI-TOF-MS ANALYSIS SYSTEM | Non-Final OA | LG Energy Solution, Ltd. |
| 18697079 | APPARATUS FOR PREPARING ELECTRON MICROSCOPY SAMPLES AND METHODS OF USE THEREOF | Non-Final OA | The Regents of the University of California |
| 18713248 | METHOD FOR CONTROLLING MASS SPECTROMETER, AND MASS SPECTROMETER | Non-Final OA | Hitachi High-Tech Corporation |
| 18390046 | Processor System, Correction Method, and Correction Program | Final Rejection | Hitachi High-Tech Corporation |
| 18010939 | Electron Microscope | Final Rejection | Hitachi High-Tech Corporation |
| 18061338 | CHARGED PARTICLE BEAM GENERATION | Non-Final OA | Microchip Technology Incorporated |
| 18764432 | Mass Spectrometer | Non-Final OA | SHIMADZU CORPORATION |
| 18508669 | ION SOURCE APPARATUS AND MASS SPECTROMETER | Non-Final OA | SHIMADZU CORPORATION |
| 18548062 | ELECTRONIC TWEEZERS | Non-Final OA | ZHEJIANG UNIVERSITY |
| 18375512 | IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION | Final Rejection | KLA Corporation |
| 18148003 | ELECTROMAGNETIC WAVE ABSORBING MATERIAL, PREPARING METHOD THEREOF AND COMPOSITE STRUCTURE FOR SUPPRESSING ELECTROMAGNETIC INTERFERENCE | Non-Final OA | Industrial Technology Research Institute |
| 18596467 | PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS | Final Rejection | ASML Netherlands B.V. |
| 17941897 | APERTURE BODY, FLOOD COLUMN AND CHARGED PARTICLE TOOL | Non-Final OA | ASML Netherlands B.V. |
| 17909352 | BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM | Final Rejection | ASML Netherlands B.V. |
| 18293148 | GENERIC PEAK FINDER | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18273914 | Pressure Control in Vacuum Chamber of Mass Spectrometer | Non-Final OA | DH Technologies Development Pte. Ltd. |
| 18767485 | REDUCED BOERSCH EFFECT IN DISPERSIVE OPTICS | Non-Final OA | FEI Company |
| 18485133 | DRY ELECTRON SOURCE ENVIRONMENT | Non-Final OA | FEI Company |
| 18760092 | BEAM POSITION MEASUREMENT METHOD AND CHARGED PARTICLE BEAM WRITING METHOD | Non-Final OA | NuFlare Technology, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy