Listed by the USPTO as KIM, ROBERT H
Tech Center 2800 • Art Units: 2800 2881
This examiner grants 54% of resolved cases
KIM, ROBERT H is listed in tech center 2800 and art unit 2800. The profile contains 56 resolved cases, with an allowance rate of 53.6%. The median time to allowance is 1099 days, and interviews are associated with a 23.7% lift.
The named companies are Ushio Denki Kabushiki Kaisha, Varian Inc., and Atom Computing Inc. The firms appearing in the profile are BIRCH STEWART KOLASCH & BIRCH, LLP and WILSON SONSINI GOODRICH & ROSATI. Because the resolved-case record is limited, practitioners should treat the outcome measures as a focused record rather than a broad historical sample. The interview measure provides a specific reason to evaluate examiner engagement in case planning.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17859894 | STORAGE AND DRAINAGE MECHANISM, LIGHT SOURCE APPARATUS, AND STORAGE AND DRAINAGE METHOD | Final Rejection | Ushio Denki Kabushiki Kaisha |
| 17538563 | SEMICONDUCTOR MANUFACTURING DEVICE WITH EMBEDDED FLUID CONDUITS | Final Rejection | Varian Semiconductor Equipment Associates, Inc. |
| 18948178 | METHODS AND SYSTEMS FOR GENERATING HIGH-CONTRAST ARRAYS | Non-Final OA | Atom Computing Inc. |
| 18114674 | METHOD AND APPARATUS OF MASS ANALYSING POSITIVELY CHARGED IONS AND NEGATIVELY CHARGED IONS | Final Rejection | TOFWERK AG |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy53.6% of resolved applications examined by Robert H Kim were allowed (56 resolved cases), compared with 69.7% across Art Unit 2800 over the last five years.
This examiner's interview lift is +23.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Robert H Kim took 1,099 days on average from filing to allowance.
Robert H Kim examines applications in Art Unit 2800 in Tech Center 2800 (Semiconductors, Circuits & Optics).
