Listed by the USPTO as LEE, STEVEN SHIH-CHING
Tech Center 1700 • Art Units: 1731 1741 1781
This examiner grants 68% of resolved cases
LEE, STEVEN SHIH-CHING is assigned to Tech Center 1700 and Art Unit 1731. The dataset contains 189 resolved cases and shows a 67.7% allowance rate. The median time to allowance is 1118 days, so applicants should plan for a substantial interval between filing activity and allowance.
Interviews are associated with a 24.2% lift, making interview preparation relevant to prosecution before this examiner. Corning, Owens-Brockway Glass Container, and the Commissariat à l'Énergie Atomique et aux Énergies Alternatives are the leading listed companies. CARRIER SHENDE, CARTER DELUCA & FARRELL, and HODGSON RUSS are the leading listed firms.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18245781 | LIGHT-SENSITIVE GLASS AND PROCESS FOR INSCRIBING STRUCTURES FORMED FROM VARIATIONS IN BULK REFRACTIVE INDEX IN SUCH A GLASS | Final Rejection | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
| 19033989 | METHOD FOR MANUFACTURING OPTICAL FIBER | Final Rejection | SUMITOMO ELECTRIC INDUSTRIES, LTD. |
| 19311593 | METHODS AND APPARATUS FOR MANUFACTURING A GLASS RIBBON | Non-Final OA | CORNING INCORPORATED |
| 19153463 | SCORING APPARATUS AND GLASS CUTTING APPARATUS INCLUDING THE SAME | Non-Final OA | CORNING INCORPORATED |
| 18838727 | METHOD FOR PRODUCING GLASS SHEET | Final Rejection | NIPPON ELECTRIC GLASS CO., LTD. |
| 18788085 | FLUID-COOLED NEEDLE FOR MOLTEN MATERIAL FLOW CONTROL | Non-Final OA | Owens-Brockway Glass Container Inc. |
| 17947121 | AQUEOUS ION EXCHANGE STRENGTHENING OF GLASS ARTICLES | Final Rejection | Owens-Brockway Glass Container Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy67.7% of resolved applications examined by Steven Shih-Ching Lee were allowed (189 resolved cases), compared with 55.4% across Art Unit 1731 over the last five years.
This examiner's interview lift is +24.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Steven Shih-Ching Lee took 1,118 days on average from filing to allowance.
Steven Shih-Ching Lee examines applications in Art Unit 1731 in Tech Center 1700 (Chemistry & Materials).
