Prosecution Insights
Last updated: October 02, 2026

Examiner: LUK, EMMANUEL S

Tech Center 3700 • Art Units: 1741 1742 1744 1774 1789 1791 3664 3736

This examiner grants 72% of resolved cases

Analysis

Emmanuel S. Luk is an examiner in Art Unit 1741 of Tech Center 3700. Based on 1051 resolved cases, the examiner maintains an allowance rate of 71.5 percent. This rate indicates a favorable environment for patent applicants, with more than seven out of ten cases reaching a grant. Practitioners can use the 71.5 percent figure to benchmark the likelihood of success for applications assigned to this examiner.

The interview lift is 26.3 percent. This data point shows that interviews are a productive tool, significantly increasing the chances of an allowance. Practitioners should utilize the 26.3 percent lift to resolve rejections and move toward a grant, as verbal engagement provides a clear advantage over written responses alone. This lift suggests that the examiner is receptive to direct discussion of technical issues.

The median days to allowance is 1032. This duration reflects the typical time required for prosecution, lasting nearly three years. The combination of a 71.5 percent allowance rate and a 1032-day median provides a predictable path for applications. These metrics allow for effective planning and help in managing client expectations regarding both the outcome and the timing of a patent grant.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

71.5%
Allow Rate
+1.5% vs TC avg
1,080
Total Applications
+26.3%
Interview Lift
1032
Avg Prosecution Days
Based on 1051 resolved cases, 2023–2026

Rejection Statute Breakdown

0.6%
§101 Eligibility
14.4%
§102 Novelty
58.1%
§103 Obviousness
16.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18420009 LINER STRUCTURE Final Rejection Samsung Electronics Co., Ltd.
19101646 Dry Electrode Manufacturing Apparatus Non-Final OA LG Energy Solution, Ltd.
18814668 ELECTRODE FOR DISCHARGE SURFACE TREATMENT AND PRODUCTION METHOD OF THE SAME Non-Final OA IHI Corporation
18874899 ROLLER SORTER DIRECTLINK Non-Final OA KRONES AG
18910120 FOCUSED ROTARY JET SPINNING DEVICES AND METHODS OF USE THEREOF Final Rejection President and Fellows of Harvard College
18908921 METHOD OF TRANSFERRING AN OBJECT USING A STAMP WITH SHAPE MEMORY POLYMER NANOTIPS Non-Final OA POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
19204174 APPARATUS AND METHOD FOR THREE-DIMENSIONAL PRINTING Non-Final OA SprintRay Inc.
19173456 METHOD FOR MOLDING ELASTIC BODY AND ELASTIC BODY MOLDING DEVICE Non-Final OA MITSUBISHI CABLE INDUSTRIES, LTD.
18834035 VAPOR DEPOSITION MASK, FRAMED VAPOR DEPOSITION MASK, METHOD OF MANUFACTURING VAPOR DEPOSITION MASK, METHOD OF MANUFACTURING ORGANIC DEVICE, AND METHOD OF MANUFACTURING FRAMED VAPOR DEPOSITION MASK Non-Final OA DAI NIPPON PRINTING CO., LTD.
18922911 RESIN FILM MANUFACTURING APPARATUS AND ITS CONTROL METHOD Non-Final OA THE JAPAN STEEL WORKS, LTD.
18823337 NON-SHEDDING HYBRID NONWOVENS AND METHOD OF PRODUCING SAME Non-Final OA North Carolina State University
18874621 Devices and Methods for Forming Eyelets in Urinary Catheters Non-Final OA Hollister Incorporated
18598786 FIRE RETARDANT THERMOPLASTIC COMPOSITE AND METHOD FOR FORMING SAME Final Rejection Rohr, Inc.
18924332 PRODUCTION OF FABRIC WITH ENHANCED THERMOREGULATION PROPERTIES Non-Final OA HyperNatural Corp.
18586032 ADJUSTMENT OF A SPATIAL POSITION OF A MATERIAL DEPOSITION DEVICE ALIGNED TO DEPOSIT A STRUCTURAL MATERIAL AT A TARGET POINT OF DEPOSITION Final Rejection ICON Technology, Inc.
13374441 System and method for creating a venturi effect within an orifice Non-Final OA SPHERICAL IP, LLC.

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