Tech Center 3700 • Art Units: 1712 1715 1716 1792 2811 2818 2892 3723
This examiner grants 68% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18465130 | FILM FORMING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD |
| 18232983 | ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION | Non-Final OA | RTX Corporation |
| 19299301 | THROUGHPUT IMPROVEMENTS FOR LOW-TEMPERATURE/BEOL-COMPATIBLE HIGHLY SCALABLE GRAPHENE SYNTHESIS METHODS INCLUDING PROCESSING IN RETASKED TOOLS | Non-Final OA | Destination 2D Inc. |
| 18468863 | DEPOSITION DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18466941 | DEPOSITION MASK | Non-Final OA | Samsung Display Co., LTD. |
| 18311389 | DEPOSITION DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18590141 | LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS | Final Rejection | Applied Materials, Inc. |
| 18500707 | MULTI-FLOW METHODS, AND RELATED APPARATUS, FOR SEMICONDUCTOR MANUFACTURING | Non-Final OA | Applied Materials, Inc. |
| 18456836 | SEMICONDUCTOR PROCESSING CHAMBER LID AND COATING | Non-Final OA | Applied Materials, Inc. |
| 18466108 | SEMICONDUCTOR DEVICE FABRICATION METHOD USING A DEPOSITION APPARATUS WITH A CONTOURED WAFER CARRIER RING | Non-Final OA | WESTERN DIGITAL TECHNOLOGIES, INC., |
| 18476341 | MANUFACTURING DEVICE OF DISPLAY DEVICE | Non-Final OA | Magnolia White Corporation |
| 18541164 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18553337 | PLASMA PROCESSING APPARATUS | Non-Final OA | TOKYO ELECTRON LIMITED |
| 17931957 | DEPOSITION METHOD AND DEPOSITION APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18446564 | Deposition Apparatus and Method with EM Radiation | Final Rejection | Taiwan Semiconductor Manufacturing Co, Ltd. |
| 18403024 | REACTANT DELIVERY SYSTEM AND REACTOR SYSTEM INCLUDING SAME | Non-Final OA | ASM IP Holding B.V. |
| 18508949 | GAS INJECTOR | Non-Final OA | ASM IP Holding B.V. |
| 18376025 | LIQUID VAPORIZER | Final Rejection | ASM IP Holding B.V. |
| 18371227 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | ASM IP Holding B.V. |
| 18199058 | SUBSTRATE PROCESSING METHOD | Non-Final OA | ASM IP Holding B.V. |
| 18147916 | METHODS FOR SELECTIVE DEPOSITION UTILIZING N-TYPE DOPANTS AND/OR ALTERNATIVE DOPANTS TO ACHIEVE HIGH DOPANT INCORPORATION | Non-Final OA | ASM IP Holding B.V. |
| 18074629 | REMOTE SOLID SOURCE REACTANT DELIVERY SYSTEMS FOR VAPOR DEPOSITION REACTORS | Non-Final OA | ASM IP Holding B.V. |
| 17329829 | SYSTEM AND METHODS FOR DIRECT LIQUID INJECTION OF VANADIUM PRECURSORS | Final Rejection | ASM IP HOLDING B.V. |
| 18463435 | SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Kokusai Electric Corporation |
| 18357293 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 18336524 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18186333 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 17897618 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 18537044 | EVAPORATION SOURCE FOR VACUUM EVAPORATION APPARATUS | Non-Final OA | ULVAC, INC. |
| 18526061 | MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, PLUG, AND METHOD OF MANUFACTURING PLUG | Non-Final OA | NGK INSULATORS, LTD. |
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