Listed by the USPTO as NELSON, HUNTER JARED
Tech Center 2800 • Art Units: 2828
This examiner grants 38% of resolved cases
NELSON, HUNTER JARED has resolved 32 cases, with an allowance rate of 37.5% and an interview lift of 26.0%. The median time to allowance is 1383 days. This combination indicates that interview activity is a relevant prosecution consideration, while the allowance outcome remains selective across the recorded matters.
The examiner is assigned to tech center 2800 and art unit 2828. The leading companies in the recorded matters are Kyoto University, Lumentum Operations LLC, and Sony Group Corporation. The leading firms are FOLEY & LARDNER LLP, Harrity & Harrity, LLP, and Xsensus. Practitioners handling matters in this docket may find interview preparation useful when developing a response strategy.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18556953 | LASER ELEMENT AND ELECTRONIC DEVICE | Non-Final OA | SONY GROUP CORPORATION |
| 18264698 | SURFACE EMITTING ELEMENT, METHOD FOR DETECTING OPTIC CHARACTERISTIC, AND METHOD FOR ADJUSTING OPTICAL CHARACTERISTIC | Non-Final OA | SONY GROUP CORPORATION |
| 18658031 | LIGHT SOURCE MODULE AND LIGHT OUTPUT METHOD | Non-Final OA | NEC Corporation |
| 17904385 | SEMICONDUCTOR LASER ELEMENT | Non-Final OA | Panasonic Holdings Corporation |
| 17769153 | DEVICE FOR REGROWTH OF A THICK STRUCTURE, PHOTONIC DEVICE COMPRISING THE SAME AND ASSOCIATED METHODS OF FABRICATION | Non-Final OA | THALES |
| 17922787 | LASER SYSTEM | Final Rejection | Mitsubishi Electric Corporation |
| 17974972 | SEMICONDUCTOR STACK AND LIGHT-EMITTING DEVICE | Final Rejection | SUMITOMO ELECTRIC INDUSTRIES, LTD. |
| 17799935 | REFLECTING MIRROR, VERTICAL CAVITY SURFACE EMITTING LASER, VERTICAL CAVITY SURFACE EMITTING LASER ARRAY, PROJECTOR, HEAD UP DISPLAY, MOVABLE BODY, HEAD MOUNT DISPLAY, OPTOMETRY APPARATUS, AND LIGHTING APPARATUS | Final Rejection | RICOH COMPANY, LTD. |
| 18579587 | METHOD FOR PRODUCING A PLURALITY OF SURFACE-EMITTING SEMICONDUCTOR LASER DIODES | Non-Final OA | ams-OSRAM International GmbH |
| 18110587 | LOW COST DISCRETELY TUNABLE LASER SYSTEM WITH STABILIZATION | Non-Final OA | CORNING INCORPORATED |
| 18295297 | TUNABLE Q-SWITCHED LASER USING OSC MODULATOR | Final Rejection | Meta Platforms Technologies, LLC |
| 17812796 | MESA/TRENCH FREE VERTICAL CAVITY SURFACE EMITTING LASER (VCSEL) | Final Rejection | Mellanox Technologies, Ltd. |
| 17882047 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18204903 | WAVELENGTH TUNABLE METASURFACE BASED EXTERNAL CAVITY LASER | Non-Final OA | PRESIDENT AND FELLOWS OF HARVARD COLLEGE |
| 17923886 | WAVELENGTH TUNABLE METASURFACE BASED EXTERNAL CAVITY LASER | Final Rejection | PRESIDENT AND FELLOWS OF HARVARD COLLEGE |
| 18006263 | FIBER LASER DEVICE | Non-Final OA | Fujikura Ltd. |
| 18281791 | PHOTONIC CRYSTAL SURFACE-EMITTING LASER AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | Kyoto University |
| 18307564 | SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING SAME | Final Rejection | KYOTO UNIVERSITY |
| 17916116 | TWO-DIMENSIONAL PHOTONIC-CRYSTAL LASER | Non-Final OA | KYOTO UNIVERSITY |
| 18689619 | LASER APPARATUS | Non-Final OA | LUTRONIC CORPORATION |
| 18194143 | EMITTER ASSEMBLY WITH LOCKING PINS | Non-Final OA | Lumentum Operations LLC |
| 18067296 | VERTICAL CAVITY SURFACE EMITTING LASER WITH ENHANCED MODULATION BANDWIDTH | Final Rejection | Lumentum Operations LLC |
| 17875531 | MULTI-WAVELENGTH LIGHT-EMITTING SEMICONDUCTOR DEVICES | Non-Final OA | IQE plc |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy37.5% of resolved applications examined by Hunter Jared Nelson were allowed (32 resolved cases), compared with 64.7% across Art Unit 2828 over the last five years.
This examiner's interview lift is +26.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Hunter Jared Nelson took 1,383 days on average from filing to allowance.
Hunter Jared Nelson examines applications in Art Unit 2828 in Tech Center 2800 (Semiconductors, Circuits & Optics).
