Listed by the USPTO as NIA, FATEMEH ESFANDIARI
Tech Center 3700 • Art Units: 2855 2856 3752 3762
This examiner grants 72% of resolved cases
NIA, FATEMEH ESFANDIARI works in USPTO Technology Center 3700, art unit 2855. The profile records 249 resolved cases and an allowance rate of 71.5%. The median time to allowance is 984 days. Interview lift is 19.9%, indicating a meaningful positive association between interviews and allowance outcomes in the available record.
The listed companies are Apple Inc., Robert Bosch GmbH, and NEC Corporation. The listed firms are BakerHostetler, Barron & Young PLLC, and Bradley Arant Boult Cummings LLP. The allowance rate suggests that applicants may need careful claim development and direct treatment of the cited art. The interview result supports using examiner discussions to clarify technical issues and evaluate focused amendment paths. Practitioners should preserve those points in the written prosecution record and plan around the median timing when setting client expectations. The company and firm activity provides context for matters involving sophisticated technology portfolios.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18754521 | Electronic Devices With Relative Humidity Sensors | Non-Final OA | Apple Inc. |
| 18738435 | MICROELECTROMECHANICAL DEVICE, MICROELECTROMECHANICAL PRESSURE SENSOR, MICROELECTROMECHANICAL MICROPHONE AND MICROELECTROMECHANICAL COMBINATION SENSOR ELEMENT. | Non-Final OA | Robert Bosch GmbH |
| 18230523 | MEASUREMENT SYSTEM AND FLOAT | Final Rejection | NEC Corporation |
| 17758824 | RECYCLABLE DOSING DEVICE | Final Rejection | SOCIETE DES PRODUITS NESTLE S.A. |
| 18575776 | WHEEL SPEED SENSING DEVICE | Non-Final OA | HL MANDO CORPORATION |
| 18449758 | LIQUID LEAKAGE DETECTION SYSTEM AND LIQUID LEAKAGE SENSOR | Non-Final OA | ROHM CO., LTD. |
| 18731062 | STRETCHABLE ION-GEL SENSOR AND METHOD OF PREPARING THE SAME | Non-Final OA | POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy71.5% of resolved applications examined by Fatemeh Esfandiari Nia were allowed (249 resolved cases), compared with 76.8% across Art Unit 2855 over the last five years.
This examiner's interview lift is +19.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Fatemeh Esfandiari Nia took 984 days on average from filing to allowance.
Fatemeh Esfandiari Nia examines applications in Art Unit 2855 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
