Tech Center 1700 • Art Units: 1784 1794
This examiner grants 66% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18551196 | SPUTTERING DEVICE FOR MULTILAYER OPTICAL RECORDING MEDIUM AND METHOD FOR MANUFACTURING MULTILAYER OPTICAL RECORDING MEDIUM | Non-Final OA | SONY GROUP CORPORATION |
| 18389591 | High Conformal Coating on Textured Surface of Processing Chamber Component | Non-Final OA | Applied Materials, Inc. |
| 18478878 | DIRECTIONAL RIE FEATURE RECTANGULARITY | Final Rejection | Applied Materials, Inc. |
| 18209348 | IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES | Final Rejection | APPLIED MATERIALS, INC. |
| 17685272 | BIASABLE ROTATING PEDESTAL | Non-Final OA | Applied Materials, Inc. |
| 18531641 | DIFFUSION BONDED TUNGSTEN CONTAINING TARGET TO COPPER ALLOY BACKING PLATE | Non-Final OA | Honeywell International Inc. |
| 19100649 | MAGNETRON SPUTTERING APPARATUS | Non-Final OA | DAEGU GYEONGBUK INSTITUTE OF SCIENCE AND TECHNOLOGY |
| 19042250 | ION BEAM SPUTTERING APPARATUS AND METHOD | Non-Final OA | New Zealand Institute for Earth Science Limited |
| 19025816 | FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES | Non-Final OA | View Operating Corporation |
| 18789253 | DEPOSITION SYSTEM AND METHOD | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 17696636 | SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS | Non-Final OA | KLA Corporation |
| 18931500 | Manganese-Nitride Based Novel Magnetic Materials | Non-Final OA | Georgetown University |
| 18860094 | Tubular Sputter Cathode | Non-Final OA | Bühler Alzenau GmbH |
| 18858996 | COATING SYSTEM AND METHOD FOR SEMICONDUCTOR EQUIPMENT COMPONENTS | Non-Final OA | Oerlikon Surface Solutions AG, Pfäffikon |
| 18265585 | Sputtering Target And Method For Manufacturing The Same | Final Rejection | JX ADVANCED METALS CORPORATION |
| 18020412 | METHOD OF FORMING A CATHODE LAYER, METHOD OF FORMING A BATTERY HALF CELL | Final Rejection | Dyson Technology Limited |
| 17308290 | ABLATING MATERIAL FOR AN OBJECT IN A PARTICLE BEAM DEVICE | Final Rejection | Carl Zeiss Microscopy GmbH |
| 18556881 | SEMICONDUCTOR-PACKAGING DEVICE | Final Rejection | JUSUNG ENGINEERING CO., LTD. |
| 18541027 | DEVICES AND METHODS FOR SPUTTERING AT LEAST TWO ELEMENTS | Non-Final OA | TechIFab GmbH |
| 18537523 | STABLE GROUND ANODE APERTURE FOR THIN FILM PROCESSING | Non-Final OA | INTEVAC, INC. |
| 18110269 | SYSTEM AND METHOD FOR MAKING THICK-MULTILAYER DIELECTRIC FILMS | Non-Final OA | INTEVAC, INC. |
| 17461928 | Deposition Method | Non-Final OA | SPTS TECHNOLOGIES LIMITED |
| 18354609 | PLASMA MONITORING DEVICE | Final Rejection | Dah Young Vacuum Equipment Co., Ltd. |
| 17587058 | Sputtering Target And Method For Manufacturing The Same | Non-Final OA | JX Nippon Mining & Metals Corporation |
| 18090122 | MEMBRANE ELECTRODE ASSEMBLY FOR PEM WATER ELECTROLYSIS CAPABLE OF IMPROVING THE ELECTRICAL CONDUCTIVITY OF THE ELECTRODE LAYER AND METHOD OF MANUFACTURING THEREOF | Non-Final OA | KOREA INSTITUTE OF ENERGY RESEARCH |
| 18000561 | METHOD AND DEVICE FOR APPLYING A COATING, AND COATED BODY | Non-Final OA | CemeCon AG |
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