Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1741 1784 1794 2872
This examiner grants 68% of resolved cases
Patrick S. Ott is assigned to Art Unit 1741 in Tech Center 2800 and has managed 237 resolved cases. The examiner maintains an allowance rate of 67.9 percent, which serves as an indicator of the likelihood of success for applications. This 67.9 percent rate suggests a path to patent issuance. The 237 resolved cases provide a statistical basis for these conclusions.
The prosecution timeline is defined by a median days to allowance of 945. This 945-day period is a benchmark for applicants to use when forecasting their patent timelines. Furthermore, the interview lift of 23.2 percent indicates that direct dialogue with the examiner often helps move a case toward allowance. This 23.2 percent lift is a factor that practitioners should leverage to overcome potential rejections. By combining the 67.9 percent allowance rate with proactive interviewing, applicants can navigate Art Unit 1741.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18607688 | CASE SIDE WALL OF BATTERY CASE | Non-Final OA | TOYOTA JIDOSHA KABUSHIKI KAISHA |
| 18213683 | SPUTTERING TARGET AND METHOD FOR FORMING SPUTTERING TARGET | Non-Final OA | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
| 18647033 | CATHODE ACTIVE MATERIAL, CATHODE INCLUDING THE SAME, SOLID SECONDARY BATTERY INCLUDING THE SAME, AND METHOD OF PREPARING CATHODE ACTIVE MATERIAL | Non-Final OA | Samsung SDI Co., Ltd. |
| 19080129 | Two-Dimensional Materials, Their Composite Thin Films, and the Formation Thereof | Non-Final OA | Carnegie Mellon University |
| 19096353 | DELIVERY OF CONFIGURABLE PULSED VOLTAGE WAVEFORMS FOR SUBSTRATE PROCESSING | Non-Final OA | Applied Materials, Inc. |
| 18169065 | APPARATUS AND METHOD FOR FABRICATING PVD PEROVSKITE FILMS | Final Rejection | Applied Materials, Inc. |
| 18091552 | Methods and Apparatus for Processing a Substrate | Final Rejection | Applied Materials, Inc. |
| 17685272 | BIASABLE ROTATING PEDESTAL | Final Rejection | Applied Materials, Inc. |
| 18425323 | SENSOR IN CHAMBER INSERT RING ASSEMBLY | Non-Final OA | Tokyo Electron Limited |
| 19174274 | COBALT-NIOBIUM ALLOY SPUTTERING TARGET ASSEMBLY AND METHOD OF MAKING | Non-Final OA | Honeywell International Inc. |
| 19174301 | COBALT-TITANIUM ALLOY SPUTTERING TARGET ASSEMBLY AND METHOD OF MAKING | Non-Final OA | Honeywell International Inc. |
| 19040855 | MOLYBDENUM SPUTTERING TARGET WITH HIGH TRANSVERSE RUPTURE STRENGTH | Non-Final OA | Honeywell International Inc. |
| 17696636 | SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS | Final Rejection | KLA Corporation |
| 18931500 | Manganese-Nitride Based Novel Magnetic Materials | Final Rejection | Georgetown University |
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