Prosecution Insights
Last updated: May 29, 2026

Examiner: OTT, PATRICK S

Tech Center 1700 • Art Units: 1784 1794

This examiner grants 66% of resolved cases

Performance Statistics

66.5%
Allow Rate
+1.5% vs TC avg
257
Total Applications
+20.8%
Interview Lift
938
Avg Prosecution Days
Based on 215 resolved cases, 2023–2026

Rejection Statute Breakdown

1.0%
§101 Eligibility
11.0%
§102 Novelty
74.0%
§103 Obviousness
8.1%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18551196 SPUTTERING DEVICE FOR MULTILAYER OPTICAL RECORDING MEDIUM AND METHOD FOR MANUFACTURING MULTILAYER OPTICAL RECORDING MEDIUM Non-Final OA SONY GROUP CORPORATION
18389591 High Conformal Coating on Textured Surface of Processing Chamber Component Non-Final OA Applied Materials, Inc.
18478878 DIRECTIONAL RIE FEATURE RECTANGULARITY Final Rejection Applied Materials, Inc.
18209348 IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES Final Rejection APPLIED MATERIALS, INC.
17685272 BIASABLE ROTATING PEDESTAL Non-Final OA Applied Materials, Inc.
18531641 DIFFUSION BONDED TUNGSTEN CONTAINING TARGET TO COPPER ALLOY BACKING PLATE Non-Final OA Honeywell International Inc.
19100649 MAGNETRON SPUTTERING APPARATUS Non-Final OA DAEGU GYEONGBUK INSTITUTE OF SCIENCE AND TECHNOLOGY
19042250 ION BEAM SPUTTERING APPARATUS AND METHOD Non-Final OA New Zealand Institute for Earth Science Limited
19025816 FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES Non-Final OA View Operating Corporation
18789253 DEPOSITION SYSTEM AND METHOD Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
17696636 SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS Non-Final OA KLA Corporation
18931500 Manganese-Nitride Based Novel Magnetic Materials Non-Final OA Georgetown University
18860094 Tubular Sputter Cathode Non-Final OA Bühler Alzenau GmbH
18858996 COATING SYSTEM AND METHOD FOR SEMICONDUCTOR EQUIPMENT COMPONENTS Non-Final OA Oerlikon Surface Solutions AG, Pfäffikon
18265585 Sputtering Target And Method For Manufacturing The Same Final Rejection JX ADVANCED METALS CORPORATION
18020412 METHOD OF FORMING A CATHODE LAYER, METHOD OF FORMING A BATTERY HALF CELL Final Rejection Dyson Technology Limited
17308290 ABLATING MATERIAL FOR AN OBJECT IN A PARTICLE BEAM DEVICE Final Rejection Carl Zeiss Microscopy GmbH
18556881 SEMICONDUCTOR-PACKAGING DEVICE Final Rejection JUSUNG ENGINEERING CO., LTD.
18541027 DEVICES AND METHODS FOR SPUTTERING AT LEAST TWO ELEMENTS Non-Final OA TechIFab GmbH
18537523 STABLE GROUND ANODE APERTURE FOR THIN FILM PROCESSING Non-Final OA INTEVAC, INC.
18110269 SYSTEM AND METHOD FOR MAKING THICK-MULTILAYER DIELECTRIC FILMS Non-Final OA INTEVAC, INC.
17461928 Deposition Method Non-Final OA SPTS TECHNOLOGIES LIMITED
18354609 PLASMA MONITORING DEVICE Final Rejection Dah Young Vacuum Equipment Co., Ltd.
17587058 Sputtering Target And Method For Manufacturing The Same Non-Final OA JX Nippon Mining & Metals Corporation
18090122 MEMBRANE ELECTRODE ASSEMBLY FOR PEM WATER ELECTROLYSIS CAPABLE OF IMPROVING THE ELECTRICAL CONDUCTIVITY OF THE ELECTRODE LAYER AND METHOD OF MANUFACTURING THEREOF Non-Final OA KOREA INSTITUTE OF ENERGY RESEARCH
18000561 METHOD AND DEVICE FOR APPLYING A COATING, AND COATED BODY Non-Final OA CemeCon AG

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