Listed by the USPTO as SHIFERAW, HENOK ASRES
Tech Center 2800 • Art Units: 2672 2676 2681 2682 2872
This examiner grants 89% of resolved cases
Henok Asres Shiferaw is an examiner in Art Unit 2672, Tech Center 2800. The examiner has 597 resolved cases and a high allowance rate of 88.8 percent. Prosecution is notably efficient, with a median of 650 days to allowance. The interview lift is 3.6 percent, suggesting that while interviews are helpful, the baseline probability of allowance is already quite high. This 3.6 percent lift offers a slight advantage during the 650-day median pendency.
Top companies appearing before this examiner include NEC Corporation, Sick AG, and Kyocera Document Solutions Inc. These applicants are frequently represented by McCarter & English, LLP and MILLEN, WHITE, ZELANO & BRANIGAN, P.C. The 88.8 percent allowance rate and the 650-day median pendency indicate a favorable and fast-moving environment for patent applications in this art unit.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18675058 | METHODS FOR CALENDAR-BASED JOB MANAGEMENT IN A PRINTING SYSTEM | Non-Final OA | KYOCERA DOCUMENT SOLUTIONS, INC. |
| 18121796 | Adaptive Filtering of Occupancy Map for Dynamic Mesh Compression | Final Rejection | Nokia Technologies Oy |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy88.8% of resolved applications examined by Henok Asres Shiferaw were allowed (597 resolved cases), compared with 70.8% across Art Unit 2672 over the last five years.
This examiner's interview lift is +3.6 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Henok Asres Shiferaw took 650 days on average from filing to allowance.
Henok Asres Shiferaw examines applications in Art Unit 2672 in Tech Center 2800 (Semiconductors, Circuits & Optics).
