Prosecution Insights
Last updated: October 02, 2026

Examiner: SMITH, KATELYN WHATLEY

Tech Center 1700 • Art Units: 1714 1746 1747 1749 1798

This examiner grants 45% of resolved cases

Analysis

Katelyn Whatley Smith works in Art Unit 1714 and has resolved 375 cases. The examiner's allowance rate is 45.3 percent. This suggests a more challenging prosecution environment in Tech Center 1700 compared to examiners with higher rates. Practitioners should prepare for a rigorous examination process given the 45.3 percent allowance rate across these 375 resolved cases.

However, the interview lift of 42.1 percent is quite high, indicating that interviews are a very effective strategy for securing an allowance. This 42.1 percent lift suggests that direct engagement is a primary tool for overcoming rejections in Art Unit 1714. Practitioners should prioritize interviews to improve their chances significantly above the baseline.

The median days to allowance is 1355, which is a longer prosecution timeline. This duration of 1355 days is a critical factor for applicants to consider when planning their patent lifecycle in Tech Center 1700. By understanding both the high interview lift and the extended pendency, practitioners can better navigate the complexities of the examination process.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

45.3%
Allow Rate
-19.7% vs TC avg
377
Total Applications
+42.1%
Interview Lift
1355
Avg Prosecution Days
Based on 375 resolved cases, 2023–2026

Rejection Statute Breakdown

0.8%
§101 Eligibility
11.4%
§102 Novelty
58.1%
§103 Obviousness
26.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19029772 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Non-Final OA SCREEN Holdings Co., Ltd.
18703275 CIGARETTE AND DEVICE FOR GENERATING AEROSOL WITH THE SAME Non-Final OA KT&G CORPORATION
18696861 AEROSOL-GENERATING DEVICE AND OPERATION METHOD THEREOF Non-Final OA KT&G CORPORATION

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