Tech Center 2600 • Art Units: 1686 2115 2193 2682
This examiner grants 81% of resolved cases
Zhipeng Wang is an examiner in Art Unit 1686, part of Tech Center 2600. The examiner has 545 resolved cases, resulting in an allowance rate of 80.9%. This rate suggests the frequency of successful outcomes for patent applicants. The median days to allowance is 1022, which indicates the prosecution timeline for successful cases. Practitioners should weigh the 1022-day median pendency when planning their strategy in Art Unit 1686.
The interview lift for this examiner is 23.1%. This is a positive impact, showing that interviews can increase the chances of allowance beyond the 80.9% baseline. With 545 resolved cases, the data is statistically strong for Tech Center 2600. The 80.9% allowance rate and 23.1% lift suggest that while the process may take 1022 days, direct engagement is an effective way to ensure a successful outcome. Practitioners can use the 545 resolved cases to benchmark the 80.9% allowance rate and the 1022-day median pendency during prosecution.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18235294 | SAFETY SYSTEM AND METHOD USING A SAFETY SYSTEM | Non-Final OA | SICK AG |
| 18972287 | METHODS AND APPARATUS TO IMPROVE USER EXPERIENCE ON COMPUTING DEVICES | Non-Final OA | Intel Corporation |
| 18738582 | LOAD FREQUENCY STABILIZATION USING OPTIMIZED MPC-(1+PIDN) CONTROLLER FOR HIGH ORDER INTERCONNECTED RENEWABLE ENERGY BASED POWER SYSTEMS | Non-Final OA | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS |
| 18346193 | IMPLEMENTING TEMPERATURE CHANGE DURING A 4D PRINTING PROCESS | Non-Final OA | International Business Machines Corporation |
| 18662802 | COMPUTER VISION FOR SUSCEPTOR LEVELING AND ALIGNMENT | Non-Final OA | Applied Materials, Inc. |
| 18208360 | SELECTION OF TRAINING DATA FOR ARTIFICIAL INTELLIGENCE MODELS | Non-Final OA | HONEYWELL INTERNATIONAL INC. |
| 18566886 | OPERATING AND DISPLAY UNIT FOR A FIELD DEVICE | Final Rejection | VEGA Grieshaber KG |
| 18529730 | INFORMATION DISPLAYING METHOD AND COMPUTER PROGRAM PRODUCT FOR SEMICONDUCTOR MANUFACTURING APPARATUS | Final Rejection | EBARA CORPORATION |
| 18637076 | SYSTEMS AND METHODS FOR LOCATION-BASED ACTIVATION AND/OR APPLICATION OF MAKEUP LOOKS | Non-Final OA | ELC MANAGEMENT LLC |
| 18825235 | CONTROL METHODS AND SYSTEMS USING EXTERNAL 3D MODELING AND NEURAL NETWORKS | Non-Final OA | View, Inc. |
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