Listed by the USPTO as YI, CHANGHYUN
Tech Center 2800 • Art Units: 2800 2812 2814 2826 2834
This examiner grants 94% of resolved cases
YI, CHANGHYUN is assigned to tech center 2800 and art unit 2800. The record covers 1106 resolved cases, with an allowance rate of 93.9% and a median of 655 days to allowance. Interviews show a 4.3% lift, indicating a modest positive association with allowance outcomes.
The listed companies are Taiwan Semiconductor Manufacturing Company, SK hynix, and Samsung Display. The listed firms are Haynes and Boone, LLP, Knobbe, Martens, Olson & Bear, LLP, and Cooper Legal Group LLC. The allowance rate and timing support an efficient prosecution profile, while interviews appear useful but not essential.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18597124 | DISPLAY DEVICE FOR VEHICLE AND VEHICLE INCLUDING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18397252 | SEMICONDUCTOR DEVICE | Final Rejection | SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC. |
| 18538557 | DIE WITH BOND PAD | Non-Final OA | TEXAS INSTRUMENTS INCORPORATED |
| 18499985 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR MEMORY DEVICE | Final Rejection | SK hynix Inc. |
| 18782434 | METHODS AND SYSTEMS FOR CONTROLLING HEIGHTS OF DEVICE PACKAGES | Non-Final OA | SK Hynix NAND Product Solutions Corp. (dba Solidigm) |
| 18513948 | LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME | Final Rejection | ROHM CO., LTD. |
| 18781815 | HEMT TRANSISTOR WITH ADJUSTED GATE-SOURCE DISTANCE, AND MANUFACTURING METHOD THEREOF | Non-Final OA | STMicroelectronics S.r.l. |
| 18787572 | FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18782962 | HYBRID SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18780969 | Protective Liner for Source/Drain Contact to Prevent Electrical Bridging While Minimizing Resistance | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18596416 | METHOD OF FORMING NANOSTRUCTURE DEVICE AND RELATED STRUCTURE | Non-Final OA | Taiwan Semiconductor Manufacturing Company Ltd. |
| 18789176 | SOURCE/DRAIN FORMATION WITH REDUCED SELECTIVE LOSS DEFECTS | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18787838 | BACKSIDE POWER RAIL AND METHODS OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18787531 | Semiconductor Devices and Methods | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18780927 | GATE-ALL-AROUND DEVICES HAVING SELF-ALIGNED CAPPING BETWEEN CHANNEL AND BACKSIDE POWER RAIL | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18780592 | SEMICONDUCTOR ARRANGEMENT AND METHOD OF MAKING | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy93.9% of resolved applications examined by Changhyun Yi were allowed (1,106 resolved cases), compared with 69.7% across Art Unit 2800 over the last five years.
This examiner's interview lift is +4.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Changhyun Yi took 655 days on average from filing to allowance.
Changhyun Yi examines applications in Art Unit 2800 in Tech Center 2800 (Semiconductors, Circuits & Optics).
