Tech Center 1700 • Art Units: 1711 1714 1724 1734
This examiner grants 66% of resolved cases
Richard Z. Zhang is an examiner in Tech Center 1700 and Art Unit 1711. He has 208 resolved cases. The allowance rate for these cases is 65.9%. This percentage is a metric for practitioners to consider during prosecution. The interview lift is 64.5%. This lift shows the change in allowance probability when an interview occurs. The median days to allowance is 968. This duration is the time for an allowed application.
With 208 resolved cases, the data provides a basis for strategy. The 64.5% interview lift is a metric for those seeking to change their results. Practitioners should factor the 968-day timeline into their planning. The 65.9% allowance rate reflects the examiner's record in Tech Center 1700 and Art Unit 1711. The examiner's history shows a pattern of outcomes. Direct communication through the interview process is associated with the lift. The Art Unit environment is associated with these metrics. The duration of prosecution is a factor in strategy. The Tech Center context is relevant for understanding the trends.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18736692 | AUTOMATIC DISHWASHING DETERGENT WATER-SOLUBLE POUCH COMPRISING SOLVENT | Final Rejection | The Procter & Gamble Company |
| 18778283 | SYSTEMS AND METHODS FOR PROVIDING A FLOW OF AIR ABOUT A LENS OF A SENSOR OF A VEHICLE | Final Rejection | LG INNOTEK CO., LTD. |
| 18746876 | WASH AND RINSE ARM SYSTEM FOR DISH WASHER | Final Rejection | Ecolab USA Inc. |
| 18720928 | METHOD AND APPARATUS TO CLEAN ADDITIVELY MANUFACTURED COMPONENTS | Final Rejection | A. RAYMOND ET CIE |
| 18469619 | SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE | Non-Final OA | KIOXIA CORPORATION |
| 19310794 | METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES | Non-Final OA | Lam Research Corporation |
| 18514859 | SPACE FILLING DEVICE FOR WET BENCH | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18868298 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 19106488 | WASHING MACHINE FOR WASHING EMPTY CONTAINERS ADAPTED TO BE FILLED WITH A POURABLE PRODUCT AND RELATIVE METHOD | Non-Final OA | SIDEL PARTICIPATIONS |
| 19066142 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 19019865 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18781867 | Process for Rinsing a Coating Product Application Device, and Associated Device | Final Rejection | Exel Industries |
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