Prosecution Insights
Last updated: October 02, 2026

Examiner: ZHANG, RICHARD Z

Tech Center 1700 • Art Units: 1711 1714 1724 1734

This examiner grants 66% of resolved cases

Analysis

Richard Z. Zhang is an examiner in Tech Center 1700 and Art Unit 1711. He has 208 resolved cases. The allowance rate for these cases is 65.9%. This percentage is a metric for practitioners to consider during prosecution. The interview lift is 64.5%. This lift shows the change in allowance probability when an interview occurs. The median days to allowance is 968. This duration is the time for an allowed application.

With 208 resolved cases, the data provides a basis for strategy. The 64.5% interview lift is a metric for those seeking to change their results. Practitioners should factor the 968-day timeline into their planning. The 65.9% allowance rate reflects the examiner's record in Tech Center 1700 and Art Unit 1711. The examiner's history shows a pattern of outcomes. Direct communication through the interview process is associated with the lift. The Art Unit environment is associated with these metrics. The duration of prosecution is a factor in strategy. The Tech Center context is relevant for understanding the trends.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

65.9%
Allow Rate
+0.9% vs TC avg
232
Total Applications
+64.5%
Interview Lift
968
Avg Prosecution Days
Based on 208 resolved cases, 2023–2026

Rejection Statute Breakdown

1.4%
§101 Eligibility
13.4%
§102 Novelty
46.8%
§103 Obviousness
35.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18736692 AUTOMATIC DISHWASHING DETERGENT WATER-SOLUBLE POUCH COMPRISING SOLVENT Final Rejection The Procter & Gamble Company
18778283 SYSTEMS AND METHODS FOR PROVIDING A FLOW OF AIR ABOUT A LENS OF A SENSOR OF A VEHICLE Final Rejection LG INNOTEK CO., LTD.
18746876 WASH AND RINSE ARM SYSTEM FOR DISH WASHER Final Rejection Ecolab USA Inc.
18720928 METHOD AND APPARATUS TO CLEAN ADDITIVELY MANUFACTURED COMPONENTS Final Rejection A. RAYMOND ET CIE
18469619 SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE Non-Final OA KIOXIA CORPORATION
19310794 METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES Non-Final OA Lam Research Corporation
18514859 SPACE FILLING DEVICE FOR WET BENCH Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18868298 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
19106488 WASHING MACHINE FOR WASHING EMPTY CONTAINERS ADAPTED TO BE FILLED WITH A POURABLE PRODUCT AND RELATIVE METHOD Non-Final OA SIDEL PARTICIPATIONS
19066142 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Non-Final OA SCREEN Holdings Co., Ltd.
19019865 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS Non-Final OA SCREEN Holdings Co., Ltd.
18781867 Process for Rinsing a Coating Product Application Device, and Associated Device Final Rejection Exel Industries

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