Prosecution Insights
Last updated: October 02, 2026
Application No. 16/388,225

Compositions and Methods Using Same for Deposition of Silicon-Containing Films

Non-Final OA §103
Filed
Apr 18, 2019
Priority
Oct 24, 2014 — provisional 62/068,248 +2 more
Examiner
WILCZEWSKI, MARY A
Art Unit
2898
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Versum Materials US LLC
OA Round
10 (Non-Final)
85%
Grant Probability
Favorable
10-11
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
712 granted / 839 resolved
+16.9% vs TC avg
Moderate +10% lift
Without
With
+10.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
38 currently pending
Career history
870
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
44.5%
+4.5% vs TC avg
§102
24.1%
-15.9% vs TC avg
§112
21.7%
-18.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 839 resolved cases

Office Action

§103
DETAILED ACTION This Office action is in response to the Request for Continued Examination (RCE) and the Amendment filed on 06 August 2026. Claims 1, 3, 4, and 9-12 are pending in the application. Claims 2, 5-8 and 13-22 have been cancelled. This application is a divisional of application Serial No. 15/520,330, filed on 19 April 2017, now US Patent 10,316,407, which is a national stage application under 35 U.S.C. 371 of PCT/US2015/027045, filed on 23 October 2015, which claims benefit of provisional application 62/068,248, filed on 24 October 2014. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 06 August 2026 has been entered. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Acknowledgment is made of applicant’s claim for foreign priority under 35 U.S.C. 119 (a)-(d). The certified copy has been filed in parent Application No. 15/520,330, filed on 19 April 2017. Terminal Disclaimer The terminal disclaimer filed on 14 January 2021 disclaiming the terminal portion of any patent granted on this application which would extend beyond the expiration date of US Patent 10,316,407 has been reviewed and is accepted. The terminal disclaimer has been recorded. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 11 and 12 are again rejected under 35 U.S.C. 103 as being unpatentable over Scantlin et al., the article entitled “The Borane-Catalyzed Condensation of Trisilazane and N-Methyldisilazane”, in view of Sanchez et al., US 2016/0237099, both of record. Scantlin et al. disclose a composition comprising a silicon precursor selected from the group of bis(disilylamino)silane (N,N’-disilyltrisilazane), see “Borane-Catalyzed Condensations” on page 3082 and Table I on page 3083. Claim 11 requires the silicon precursor contain greater than, or equal to, 3 ppm, and less than 5 ppm, of halide ions. Although Scantlin et al. are silent about whether or not the bis(disilylamino)silane (N,N’-disilyltrisilazane) contains halide ions, Sanchez et al. teach the synthesis of silicon precursors containing less than 5 ppm of halide ions by using starting reactants, catalyst and optional solvents which are halogen free, see paragraph [0045]. Sanchez et al. disclose the solvent can be alkanes such as C.sub.5 to C.sub.20 linear, branched or cyclic alkanes and mixtures thereof; alkenes such as 1-octadecene, cyclooctadiene and cyclohexene; chloroalkanes such as methylene chloride and ethylene chloride; arenes such as toluene, xylene, mesitylene and naftalene and heterocycles such as quinoline and pyridine and mixtures thereof, see paragraph [0057]. Alkanes with 5 to 20 carbon atoms can be linear, branched, or cyclic, depending on their structure, but they are all alkyl hydrocarbons if they contain only carbon and hydrogen atoms with only single bonds. Sanchez et al. also disclose that the solvent should be non-reactive, anhydrous, and should be selected such that its boiling point differs from the boiling point of the product compound by about 10° C. In light of the disclosure of Sanchez in paragraph [0057], it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention that the solvent could have been an alkyl hydrocarbon. The method of Sanchez et al. provides trisilylamine and tridisilylamine compounds containing less than 5 ppm of halide ions, thereby yielding a silicon nitride film which is not contaminated with chlorine or aminohalogens, see paragraphs [0002]-[0005]. Therefore, in order to obtain a high-quality silicon nitride film, it would have been obvious to the skilled artisan that the precursor used in the composition for depositing the silicon nitride film should contain less than 5 ppm of halide ions. Claim 11 requires a solvent, wherein the solvent has a boiling point and wherein the difference between the boiling point of the solvent and that of the silicon precursor compound is 30oC or less. Sanchez et al. disclose halogen free amine substituted trisilylamine and tridisilylamine compounds and a method of their preparation. Furthermore, Sanchez et al. disclose that the solvent is selected so that its boiling point differs from the boiling point of the silicon precursor compound by about 10° C, see paragraph [0057]. In light of the teachings of Sanchez, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention that the silicon precursor disclosed by Sanchez et al. could have been used in the known reaction of Scantlin et al., thereby yielding a composition comprising a solvent (used in the synthesis process of Sanchez et al.), wherein the difference between the boiling point of the solvent and that of the silicon precursor compound is 30oC or less, since solvents are known to effect reaction rates, thereby providing control over the chemical reaction of Scantlin et al. With respect to claim 12, in light of the teachings of Sanchez et al., it would have been obvious to the skilled artisan that the halide ions could comprise chloride ions, see paragraph [0045] of Sanchez et al. Allowable Subject Matter Claims 1, 3, 4, 9, and 10 are allowable over the prior art of record. Response to Arguments Applicant's arguments filed 06 August 2026 with respect to claims 11 and 12 have been fully considered but they are not persuasive. Applicant has argued that independent claim 11 has been amended to require “the solvent is selected from the group consisting of an ether, a tertiary amine, an alkyl hydrocarbon, a tertiary aminoether, and combinations thereof”. Sanchez et al. disclose the solvent can be alkanes such as C.sub.5 to C.sub.20 linear, branched or cyclic alkanes and mixtures thereof, see paragraph [0057]. Alkanes with 5 to 20 carbon atoms can be linear, branched, or cyclic, depending on their structure, but they are all alkyl hydrocarbons if they contain only carbon and hydrogen atoms with only single bonds. Sanchez et al. also disclose that the solvent should be non-reactive, anhydrous, and should be selected such that its boiling point differs from the boiling point of the product compound by about 10° C. In light of the disclosure of Sanchez in paragraph [0057], it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention that the solvent could have been an alkyl hydrocarbon. Therefore, amending claim 11 to require ““the solvent is selected from the group consisting of an ether, a tertiary amine, an alkyl hydrocarbon, a tertiary aminoether, and combinations thereof” is not deemed to patentably distinguish Applicant’s claimed composition from that of Scantlin et al. in view of Sanchez et al. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MARY A WILCZEWSKI whose telephone number is (571)272-1849. The examiner can normally be reached M-TH 7:30 AM-5:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jessica Manno can be reached on 571-272-2339. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. MARY A. WILCZEWSKI Primary Examiner Art Unit 2898 /MARY A WILCZEWSKI/Primary Examiner, Art Unit 2898
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Prosecution Timeline

Show 22 earlier events
Mar 31, 2025
Request for Continued Examination
Apr 02, 2025
Response after Non-Final Action
Apr 14, 2025
Non-Final Rejection mailed — §103
Oct 14, 2025
Response Filed
Feb 06, 2026
Final Rejection mailed — §103
Aug 06, 2026
Request for Continued Examination
Aug 08, 2026
Response after Non-Final Action
Sep 09, 2026
Non-Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

10-11
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+10.2%)
2y 7m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 839 resolved cases by this examiner. Grant probability derived from career allowance rate.

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