Prosecution Insights
Last updated: August 14, 2026

Versum Materials US LLC

19 pending office actions • 9 art units • 17 examiners • 0 of 19 (0%) have an AI response strategy ready • 28 patents granted in the last 365 days

Portfolio Summary

19
Total Pending OAs
12
Non-Final OAs
7
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 7 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

6
Overdue
0
Due this week
1
Due this month
0
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 7 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (6)Due ≤ 30 days (1)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

7
Hard (37%)
11
Medium (58%)
1
Easy (5%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§103 only10 (53%)
§112 only1 (5%)
Double-patenting + other1 (5%)
Multi-statute (no §101)7 (37%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

14
Life Sciences
74% of docket
0
Information Tech
0% of docket
0
Communications
0% of docket
2
Semiconductors
11% of docket
0
Mechanical / Eng
0% of docket
3
Business / Other
16% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

190 h
Manual time on pending OAs
38 h
Time saved (low, 20%)
66 h
Time saved (mid, 35%)
1.7 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
MCCLURE, CHRISTINA D 3 29.9% +32.9%
DEO, DUY VU NGUYEN 1 82.4% +7.0%
LAW, NGA LEUNG V 1 56.5% +20.9%
MOORE, MARGARET G 1 68.0% +15.0%
CHEN, BRET P 1 84.5% +16.7%
ALANKO, ANITA KAREN 1 69.7% -17.3%
NASSIRI MOTLAGH, ANITA 1 55.5% +25.0%
MOORE, KARLA A 1 43.1% +14.1%
PAGANO, ALEXANDER R 1 78.9% +11.1%
DUCLAIR, STEPHANIE P. 1 71.9% +19.8%

Quick Wins (1)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.

App #TitleExaminerDue in
18701169 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM CHEN, BRET P

Hard Cases (10)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18548846 SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM NGUYEN, SOPHIA T 104d overdue
16577580 Barrier Slurry Removal Rate Improvement PHAM, THOMAS T 17d overdue
17621198 COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM MCCLURE, CHRISTINA D 4d overdue
16695676 1-Methyl-1-Iso-Propoxy-Silacycloalkanes And Dense Organosilica Films Made Therefrom MCCLURE, CHRISTINA D 22d
18851796 Polycationic Polymer Or Copolymer Having Different Cation Types For Slurries In Chemical Mechanical Planarization DEO, DUY VU NGUYEN
18582396 HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME MOORE, KARLA A
18564117 Phosphonium Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization Slurries DUCLAIR, STEPHANIE P.
18561833 New Precursors For Depositing Films With High Elastic Modulus HERNANDEZ-KENNEY, JOSE

Interview Candidates (10)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18585563 ULTRA-HIGH PURITY TUNGSTEN CHLORIDES NASSIRI MOTLAGH, ANITA 156d overdue
18703240 SILANOLS AND SILANEDIOLS MOORE, MARGARET G 58d overdue
17621198 COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM MCCLURE, CHRISTINA D 4d overdue
16695676 1-Methyl-1-Iso-Propoxy-Silacycloalkanes And Dense Organosilica Films Made Therefrom MCCLURE, CHRISTINA D 22d
18709806 MULTILAYERED SILICON NITRIDE FILM LAW, NGA LEUNG V
18701169 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM CHEN, BRET P
18582396 HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME MOORE, KARLA A
18409373 ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME PAGANO, ALEXANDER R

Top Art Units

Art UnitApps
1718 5
1713 3
1717 2
1765 1
1734 1
1736 1
2893 1
1712 1
2817 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
18851796 Polycationic Polymer Or Copolymer Having Different Cation Types For Slurries In Chemical Mechanical Planarization DEO, DUY VU NGUYEN §102§103 Non-Final OA Pending Sep 27, 2024
18709806 MULTILAYERED SILICON NITRIDE FILM LAW, NGA LEUNG V 1717 §103 Non-Final OA Pending May 13, 2024
18703240 SILANOLS AND SILANEDIOLS MOORE, MARGARET G 1765 §103 Final Rejection 58d overdue Pending Apr 19, 2024
18701169 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM CHEN, BRET P 1718 §103 Non-Final OA Pending Apr 12, 2024
18696009 Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization Slurries ALANKO, ANITA KAREN 1713 §112 Non-Final OA Pending Mar 27, 2024
18585563 ULTRA-HIGH PURITY TUNGSTEN CHLORIDES NASSIRI MOTLAGH, ANITA 1734 §103 Final Rejection 156d overdue Pending Feb 23, 2024
18582396 HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME MOORE, KARLA A §103§112 Non-Final OA Pending Feb 20, 2024
18409373 ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME PAGANO, ALEXANDER R §102DP Non-Final OA Pending Jan 10, 2024
18564117 Phosphonium Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization Slurries DUCLAIR, STEPHANIE P. 1713 §103§112 Non-Final OA Pending Nov 27, 2023
18561833 New Precursors For Depositing Films With High Elastic Modulus HERNANDEZ-KENNEY, JOSE 1717 §103§112 Final Rejection Pending Nov 17, 2023
18555810 NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR NGUYEN, CAM N 1736 §103§112 Non-Final OA Pending Oct 17, 2023
18548846 SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM NGUYEN, SOPHIA T 2893 §103§112 Final Rejection 104d overdue Pending Sep 01, 2023
18006659 CYCLOSILOXANES AND FILMS MADE THEREWITH MURATA, AUSTIN 1712 §103 Non-Final OA Pending Jan 24, 2023
17754038 CHEMICAL MECHANICAL PLANARIZATION POLISHING COMPOSITIONS FOR IMPROVING WITH-IN DIE NON-UNIFORMITIES KNUDSON, BRAD ALLAN 2817 §103 Final Rejection 97d overdue Pending Mar 22, 2022
17642185 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM MCCLURE, CHRISTINA D 1718 §103 Final Rejection Pending Mar 10, 2022
17584120 Methods For Making Silicon Containing Films That Have High Carbon Content MAYY, MOHAMMAD 1718 §103 Non-Final OA Pending Jan 25, 2022
17621198 COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM MCCLURE, CHRISTINA D 1718 §103 Non-Final OA 4d overdue Pending Dec 20, 2021
16695676 1-Methyl-1-Iso-Propoxy-Silacycloalkanes And Dense Organosilica Films Made Therefrom MCCLURE, CHRISTINA D 1718 §103 Final Rejection 22d Pending Nov 26, 2019
16577580 Barrier Slurry Removal Rate Improvement PHAM, THOMAS T 1713 §102§103 Non-Final OA 17d overdue Pending Sep 20, 2019

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