Prosecution Insights
Last updated: April 19, 2026
Application No. 17/457,728

Hybrid Dielectric Scheme in Packages

Non-Final OA §103
Filed
Dec 06, 2021
Examiner
MAIGA, SIDI MOHAMED
Art Unit
2847
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Taiwan Semiconductor Manufacturing Co., Ltd.
OA Round
3 (Non-Final)
76%
Grant Probability
Favorable
3-4
OA Rounds
2y 8m
To Grant
85%
With Interview

Examiner Intelligence

Grants 76% — above average
76%
Career Allow Rate
22 granted / 29 resolved
+7.9% vs TC avg
Moderate +9% lift
Without
With
+9.4%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
32 currently pending
Career history
61
Total Applications
across all art units

Statute-Specific Performance

§103
64.2%
+24.2% vs TC avg
§102
28.5%
-11.5% vs TC avg
§112
6.6%
-33.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 29 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant's arguments filed 12/1/2025 have been fully considered but they are not persuasive. Applicant argued that the prior art does not disclose: “ the first diffusion barrier layer is planar; the second diffusion barrier layer is physically and continuously joined to an additional diffusion barrier of a respective underlying one of the first plurality of vias.” Examiner respectfully disagree: Mountsier discloses (Fig. 1D) a diffusion barrier layer that is planar (under the via) and no where in the claim does it say that the barrier layer cannot be on the side surface of the via. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on 12/10/2025 has been entered. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 10, 12 - 13 is/are rejected under 35 U.S.C. 103 as being unpatentable over KANEKO et al. (US 20140097009 A1, “KANEKO”) in view of Mountsier et al. (US 20100187693 A1, “Mountsier”). Regarding claim 10, KANEKO discloses (Fig. 1A, 17 & 18) a package (1) comprising: a plurality of polymer layers (39); a plurality of molding compound layers (31, 33, 35, 37), wherein the plurality of polymer layers and the plurality of molding compound layers are positioned alternatingly (para [0142] the insulating layer 32, 34 and 36 can be replaced by 39), and each of the plurality of molding compound layers physically contacts an overlying one and an underlying one of the plurality of polymer layers (Fig. 1A); a first plurality of vias (42, 44, 46), each in one of the plurality of polymer layers; and a second plurality of vias (41, 43, 45, 47), each in one of the plurality of molding compound layers, wherein the first plurality of vias and the second plurality of vias are electrically interconnected (see Fig. 1A); a first plurality of metal lines (20G, 20E), each in one of the plurality of polymer layers (39), wherein each of the first plurality of metal lines comprises a first diffusion barrier layer, and the first diffusion barrier layer is planar; and a second plurality of metal lines (20F, 20D), each in one of the plurality of molding compound layers (32, 34 and 36), wherein each of the second plurality of metal lines comprises a second diffusion barrier layer, and the second diffusion barrier layer is physically and continuously joined to an additional diffusion barrier of a respective underlying one of the first plurality of vias. KANEKO fails to disclose wherein each of the first plurality of metal lines comprises a first diffusion barrier layer, and the first diffusion barrier layer is planar; and wherein each of the second plurality of metal lines comprises a second diffusion barrier layer, and the second diffusion barrier layer is physically and continuously joined to an additional diffusion barrier of a respective underlying one of the first plurality of vias However, Mountsier discloses (Fig. 1D) wherein each of the first plurality of metal lines comprises a first diffusion barrier layer (105), and the first diffusion barrier layer is planar (see Fig. 1D); and wherein each of the second plurality of metal lines comprises a second diffusion barrier layer (105), and the second diffusion barrier layer is physically and continuously joined to an additional diffusion barrier of a respective underlying one of the first plurality of vias (109). KANEKO and Mountsier are both considered to be analogous to the claimed invention because they are in the same field of multi-layer substrate. Therefore, it would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have modified KANEKO to incorporate the teachings of Mountsier and provide wherein each of the first plurality of metal lines comprises a first diffusion barrier layer (105), and the first diffusion barrier layer is planar (see Fig. 1D); and wherein each of the second plurality of metal lines comprises a second diffusion barrier layer (105), and the second diffusion barrier layer is physically and continuously joined to an additional diffusion barrier of a respective underlying one of the first plurality of vias (109). Doing so would block the conductive materials from conductive lines into dielectric materials (abstract). Regarding claim 12, KANEKO in view of Mountsier discloses the package of claim 10, wherein KANEKO further discloses that each of the first plurality of vias (42, 44, 46) is physically and continuously connected to an overlying conductive line without interface in between (see fig. 1A). . Regarding claim 13, KANEKO in view of Mountsier discloses the package of claim 10, wherein KANEKO further discloses that the plurality of polymer layers (39) are thinner than the plurality of molding compound layers (para [0140]). Claim(s) 11, 14 and 16 is/are rejected under 35 U.S.C. 103 as being unpatentable over KANEKO et al. (US 20140097009 A1, “KANEKO”) in view of Mountsier et al. (US 20100187693 A1, “Mountsier”) as applied to claim 10 above, and further in view of MAEDA et al. (US 20130161079 A1, “MAEDA”). Regarding claim 11, KANEKO in view of Mountsier discloses the package of claim 10, KANEKO in view of Mountsier fails to disclose wherein each of the second plurality of vias forms a planar interface with an overlying conductive line (see annotated figure below). However MAEDA discloses, wherein each of the second plurality of vias forms a planar interface with an overlying conductive line (see annotated figure below). It would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have each of the second plurality of vias forms a planar interface with an overlying conductive line as shown by MAEDA, with the circuit board of KANEKO in view of Mountsier, since as shown by MAEDA having each of the second plurality of vias forms a planar interface with an overlying conductive line is commonly done as it simplifies the manufacturing process. PNG media_image1.png 317 723 media_image1.png Greyscale Regarding claim 14, KANEKO in view of Mountsier discloses the package of claim 10, KANEKO in view of Mountsier fails to disclose wherein each of the second plurality of vias has a top surface coplanar with a top surface of a respective one of the molding compound layers. However MAEDA discloses, wherein each of the second plurality of vias has a top surface coplanar with a top surface of a respective one of the molding compound layers (see annotated figure above). It would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have each of the second plurality of vias has a top surface coplanar with a top surface of a respective one of the molding compound layers as shown by MAEDA, with the circuit board of KANEKO in view of Mountsier, since as shown by MAEDA having wherein each of the second plurality of vias has a top surface coplanar with a top surface of a respective one of the molding compound layers is commonly done as it simplifies the manufacturing process. Regarding claim 16, KANEKO in view of Mountsier discloses the package of claim 10, wherein each of the plurality of polymer layers (39) is formed of a homogeneous material (para [0140]), and each of the plurality of molding compound layers (31, 33, 35, 37) comprises a base material (para [0140]). KANEKO in view of Mountsier fails to disclose filler particles in the base material. However, MAEDA discloses (Fig. 3) filler particles in the base material (para [0046]). KANEKO in view of Mountsier and MAEDA are both considered to be analogous to the claimed invention because they are in the same field of wiring substrate. Therefore, it would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have modified KANEKO in view of Mountsier to incorporate the teachings of MAEDA and provide filler particles in the base material (para [0046]). Doing so would lower the coefficient of thermal expansion. Claim(s) 21 is/are rejected under 35 U.S.C. 103 as being unpatentable over KANEKO et al. (US 20140097009 A1, “KANEKO”) in view of Mountsier et al. (US 20100187693 A1, “Mountsier”) as applied to claim 10 above, and further in view of LAI et al. (US 20150214162 A1, “LAI”). Regarding claim 21, KANEKO in view of Mountsier discloses the package of claim 10, KANEKO in view of Mountsier is silent on wherein an entirety of the first diffusion barrier layer is planar, and wherein the first diffusion barrier layer comprises both of a vertical portion and a horizontal portion. However, LAI discloses (Fig. 2) wherein an entirety of the first diffusion barrier layer (150) is planar, and wherein the first diffusion barrier layer comprises both of a vertical portion and a horizontal portion (see Fig. 2). KANEKO in view of Mountsier and LAI are both considered to be analogous to the claimed invention because they are in the same field of multi-layer substrate. Therefore, it would have been obvious to someone of ordinary skill in the art before the effective filing date of the claimed invention to have modified KANEKO in view of Mountsier to incorporate the teachings of LAI and provide wherein an entirety of the first diffusion barrier layer (150) is planar, and wherein the first diffusion barrier layer comprises both of a vertical portion and a horizontal portion (see Fig. 2). Doing so would provide long-term reliability and optimal electrical performance. Allowable Subject Matter Claim 1 – 5, 7 – 9 and 17 – 20 are allowed. Claim 22 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SIDI MOHAMED MAIGA whose telephone number is (703)756-1870. The examiner can normally be reached Monday - Friday 8 am 5 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Timothy Thompson can be reached on 571-272-2342. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SIDI M MAIGA/ Examiner, Art Unit 2847 /STANLEY TSO/Primary Examiner, Art Unit 2847
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Prosecution Timeline

Dec 06, 2021
Application Filed
Apr 03, 2025
Non-Final Rejection — §103
Aug 11, 2025
Response Filed
Sep 27, 2025
Final Rejection — §103
Dec 01, 2025
Response after Non-Final Action
Dec 10, 2025
Request for Continued Examination
Dec 23, 2025
Response after Non-Final Action
Feb 07, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12586995
ELECTRICAL APPARATUS AND PLUG
2y 5m to grant Granted Mar 24, 2026
Patent 12588142
HIGH-FREQUENCY ELECTRONIC COMPONENT
2y 5m to grant Granted Mar 24, 2026
Patent 12568584
WIRING BOARD
2y 5m to grant Granted Mar 03, 2026
Patent 12563665
INSULATING CIRCUIT BOARD AND SEMICONDUCTOR DEVICE IN WHICH SAME IS USED
2y 5m to grant Granted Feb 24, 2026
Patent 12550257
WIRING SUBSTRATE
2y 5m to grant Granted Feb 10, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
76%
Grant Probability
85%
With Interview (+9.4%)
2y 8m
Median Time to Grant
High
PTA Risk
Based on 29 resolved cases by this examiner. Grant probability derived from career allow rate.

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