Prosecution Insights
Last updated: July 17, 2026
Application No. 17/710,545

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF

Non-Final OA §103
Filed
Mar 31, 2022
Priority
Dec 29, 2021 — provisional 63/294,719
Examiner
ANGEBRANNDT, MARTIN J
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
4 (Non-Final)
55%
Grant Probability
Moderate
4-5
OA Rounds
0m
Est. Remaining
90%
With Interview

Examiner Intelligence

Grants 55% of resolved cases
55%
Career Allowance Rate
757 granted / 1368 resolved
-9.7% vs TC avg
Strong +34% interview lift
Without
With
+34.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
68 currently pending
Career history
1447
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
67.3%
+27.3% vs TC avg
§102
3.8%
-36.2% vs TC avg
§112
1.6%
-38.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1368 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-5,8,18,21 and 28 are rejected under 35 U.S.C. 103 as being unpatentable over Chatterjee et al. 20200272047. Chatterjee et al. 20200272047 (of record 9/7/2022) teaches with respect to figures 4A-E, carbon nanotubes (CNT,402) are grown from metal catalyst particles/droplets (404) to form an ordered (not random) arrangement of CNTs. The planar sheet of CNTs may have any shape and may have a lattice structure. These are then coated with hBN which has the same or similar lattice structure to the CNT (graphene) and can forma 2-5 nm thick coating (404) which is a boron nitride nanotube (BNNT) to yield a CNT-hBN or CNT-BNNT nanocomposite structure. A 2-5 nm conformal coating of CNT (406) is then formed over the boron nitride to form a CNT-hBN-CNT or CNT-BNNT-CNT. A second coating of boron nitride (410) can then be formed yielding the CNT-hBN-CNT-hBN or CNT-BNNT-CNT-BNNT illustrated in figure 4D [0041-0048]. The pellicle membrane is disclosed as being secured by an adhesive layer [0032]. PNG media_image1.png 209 385 media_image1.png Greyscale PNG media_image2.png 207 374 media_image2.png Greyscale PNG media_image3.png 209 372 media_image3.png Greyscale PNG media_image4.png 204 374 media_image4.png Greyscale PNG media_image5.png 421 400 media_image5.png Greyscale Chatterjee et al. 20200272047 des not exemplify the pellicle membrane illustrated figures 4D and 4E where the layers are CNT and BNNT attached to a pellicle frame. It would have been obvious to one skilled in the art to form the pellicles illustrated in figures 4D and 4E of to be a CNT-BNNT-CNT-BNNT based upon the disclosure at [0041-0048], where the 2-5 nm thick inner BNNT (406) is considered to be the single walled non-carbon nanotube and the 2-5 nm CNT (408) and 2-5 nm BNNT (410) layers on it are the two dimensional material and to attach this to a frame as disclosed at [0032] with a reasonable expectation of forming a useful pellicle. With respect to claim 21, the claim does not require the pellicle to be formed of TMD, so the embodiment where the boron nitride nanotubes meets this claim. Claims 1-5,8,18,21 and 28 are rejected under 35 U.S.C. 103 as being unpatentable over Chatterjee et al. 20200272047, in view of Ono et al. WO 2021210432. Ono et al. WO 2021210432 (machine translation attached) teaches that CNTs are formed on substrates such as silicon wafers, glass, metals, and polymer films. The obtained CNT is peeled off from the substrate by floating it on the liquid surface of a liquid such as water, an acid or an alkaline aqueous solution, or an organic solvent. The CNT film floating on the liquid surface is fixed to the support frame by scooping it with a support frame coated with an adhesive or the like. The obtained CNT film becomes a pellicle film 202 [0082]. Chatterjee et al. 20200272047 does not teach separation of the nanotubes from the substrate upon which they are grown. It would have been obvious to one skilled in the art to form the pellicles illustrated in figures 4D and 4E of Chatterjee et al. 20200272047 to be a CNT-BNNT-CNT-BNNT based upon the disclosure at [0041-0048] of Chatterjee et al. 20200272047, where the 2-5 nm thick inner BNNT (406) is considered to be the single walled non-carbon nanotube and the 2-5 nm CNT (408) and 2-5 nm BNNT (410) layers on it are the two dimensional material and peeling it form the substrate and then attaching it to a substrate as taught in Ono et al. WO 2021210432 at [0082] noting that attaching the nanotube pellicle to a frame as disclosed at [0032] of Chatterjee et al. 20200272047 with a reasonable expectation of forming a useful pellicle. Claims 22-26,29 and 30 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The ability to form a lattice makes multiple layers (which are oriented differently) unobvious. Claims 11,13,15 and 31 are allowed. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Martin J Angebranndt whose telephone number is (571)272-1378. The examiner can normally be reached 7-3:30 pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark F Huff can be reached at 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. MARTIN J. ANGEBRANNDT Primary Examiner Art Unit 1737 /MARTIN J ANGEBRANNDT/Primary Examiner, Art Unit 1737 May 28, 2026
Read full office action

Prosecution Timeline

Show 2 earlier events
Aug 11, 2025
Response Filed
Oct 08, 2025
Non-Final Rejection mailed — §103
Jan 08, 2026
Response Filed
Jan 30, 2026
Final Rejection mailed — §103
Apr 01, 2026
Response after Non-Final Action
May 18, 2026
Request for Continued Examination
May 20, 2026
Response after Non-Final Action
Jun 02, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12681378
MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRAPHIC MASK USING THE SAME
4y 1m to grant Granted Jul 14, 2026
Patent 12681384
PHOTORESIST COMPOSITION
3y 6m to grant Granted Jul 14, 2026
Patent 12675041
Agglutinant for Pellicles, Pellicle Frame with Agglutinant Layer, Pellicle, Exposure Original Plate with Pellicle, Exposure Method, Method for Producing Semiconductor, and Method for Producing Liquid Crystal Display Board
4y 8m to grant Granted Jul 07, 2026
Patent 12675046
BOTTOM ANTIREFLECTIVE COATING MATERIALS
1y 11m to grant Granted Jul 07, 2026
Patent 12663707
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
3y 5m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

4-5
Expected OA Rounds
55%
Grant Probability
90%
With Interview (+34.2%)
3y 1m (~0m remaining)
Median Time to Grant
High
PTA Risk
Based on 1368 resolved cases by this examiner. Grant probability derived from career allowance rate.

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