Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1713 1722 1737 1795
This examiner grants 55% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18417718 | METHOD OF MANUFACTURING A PHOTOMASK | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18526038 | PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18133118 | METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGHT AND METHOD FOR FORMING PATTERN BY USING THE RESIST PATTERN AS MASK | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18336111 | FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | Final Rejection | CANON KABUSHIKI KAISHA |
| 18561978 | METHOD OF MAKING HOLOGRAMS USING LIQUID CRYSTAL MASTERS | Non-Final OA | Magic Leap, Inc. |
| 18333933 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Final Rejection | FUJIFILM Corporation |
| 17346982 | IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING PROGRAM | Final Rejection | FUJIFILM Corporation |
| 18323043 | METHOD FOR MANUFACTURING AN IDENTITY DOCUMENT, IDENTITY DOCUMENT AND METHOD FOR AUTHENTICATING SUCH AN IDENTITY DOCUMENT | Non-Final OA | IDEMIA FRANCE |
| 18068732 | PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST | Final Rejection | Intel Corporation |
| 17961164 | EUV LITHOGRAPHY USING POLYMER CRYSTAL BASED RETICLE | Final Rejection | Meta Platforms Technologies, LLC |
| 18766358 | PELLICLE STRUCTURE FOR EUV LITHOGRAPHY AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18508423 | PHOTORESIST COMPOSITION | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18139266 | PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18118498 | PELLICLE AND METHOD OF MANUFACTURING THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17885870 | STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17833830 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17710545 | PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17558092 | MASK AND METHOD FOR FABRICATING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18320566 | LITHOGRAPHY SYSTEM AND METHODS | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18235249 | TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY | Final Rejection | Applied Materials, Inc. |
| 18318926 | HYBRID POLYMER/CRYSTAL PHOTOMECHANICAL MATERIALS | Non-Final OA | The Regents of the University of Colorado, a body corporate |
| 18009618 | Holographic Recording Materials and Methods of Making Same | Non-Final OA | The Regents of the University of Colorado, a body corporate |
| 18319757 | DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY | Final Rejection | International Business Machines Corporation |
| 18346279 | PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF PHOTORESIST PATTERN | Non-Final OA | United Microelectronics Corp. |
| 18167093 | PHOTOMASK STRUCTURE, SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF | Final Rejection | United Microelectronics Corp. |
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