Tech Center 1700 • Art Units: 1722 1737 1795
This examiner grants 55% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18325465 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18320387 | EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF | Final Rejection | Samsung Electronics Co., Ltd. |
| 18317328 | EXTREME ULTRAVIOLET (EUV) PHOTOMASK | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18299301 | PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18357297 | MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Non-Final OA | The Regents of the University of California |
| 18333933 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Non-Final OA | FUJIFILM Corporation |
| 17346982 | IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING PROGRAM | Final Rejection | FUJIFILM Corporation |
| 18200238 | PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18336111 | FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18039466 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Non-Final OA | HOYA CORPORATION |
| 18034656 | MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 17966230 | MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 17431700 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18235249 | TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY | Non-Final OA | Applied Materials, Inc. |
| 17961164 | EUV LITHOGRAPHY USING POLYMER CRYSTAL BASED RETICLE | Final Rejection | Meta Platforms Technologies, LLC |
| 17687499 | HALOGENATED MONOMERS AND POLYMERS FOR VOLUME BRAGG GRATINGS | Final Rejection | Meta Platforms Technologies, LLC |
| 18319757 | DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY | Non-Final OA | International Business Machines Corporation |
| 18779977 | PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18139266 | PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18103289 | METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,LTD. |
| 17885870 | STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17818368 | PHOTOMASK STRUCTURE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 17833830 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17744795 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | Final Rejection | MITSUBISHI CHEMICAL CORPORATION |
| 18068732 | PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST | Non-Final OA | Intel Corporation |
| 18323043 | METHOD FOR MANUFACTURING AN IDENTITY DOCUMENT, IDENTITY DOCUMENT AND METHOD FOR AUTHENTICATING SUCH AN IDENTITY DOCUMENT | Non-Final OA | IDEMIA FRANCE |
| 17884117 | DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPARATUS | Final Rejection | KIOXIA CORPORATION |
| 17642734 | HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18277428 | RESIST FILM THICKENING COMPOSITION AND METHOD FOR MANUFACTURING THICKENED PATTERN | Non-Final OA | MERCK PATENT GMBH |
| 18205127 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
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