Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1722 1737 1795
This examiner grants 55% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18325465 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18320387 | EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF | Final Rejection | Samsung Electronics Co., Ltd. |
| 18200238 | PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME | Final Rejection | Samsung Display Co., LTD. |
| 18336111 | FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 17900065 | METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAME | Non-Final OA | ASM IP Holding B.V. |
| 18039466 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Non-Final OA | HOYA CORPORATION |
| 17966230 | MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 17683110 | METHOD FOR MANUFACTURING MULTILAYERED-REFLECTIVE-FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING REFLECTIVE MASK | Non-Final OA | HOYA CORPORATION |
| 17431700 | REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18333933 | FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE | Non-Final OA | FUJIFILM Corporation |
| 17346982 | IMAGE FORMING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING PROGRAM | Final Rejection | FUJIFILM Corporation |
| 17961164 | EUV LITHOGRAPHY USING POLYMER CRYSTAL BASED RETICLE | Final Rejection | Meta Platforms Technologies, LLC |
| 18319757 | DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY | Non-Final OA | International Business Machines Corporation |
| 18139266 | PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18103289 | METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,LTD. |
| 17885870 | STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17818368 | PHOTOMASK STRUCTURE AND METHOD OF MANUFACTURING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 17833830 | EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17558092 | MASK AND METHOD FOR FABRICATING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18328507 | Polymerizable Monomer, Polymer Compound, Resist Composition, And Patterning Process | Final Rejection | SHIN-ETSU CHEMICAL CO., LTD. |
| 18205127 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18320361 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Final Rejection | Shin-Etsu Chemical Co., Ltd. |
| 18115095 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 17603930 | Pellicle, Exposure Original Plate with Pellicle, Method for Producing Semiconductor Device, Method for Producing Liquid Crystal Display Board, Method for Regenerating Exposure Original Plate, and Peeling Residue Reduction Method | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 17603932 | Agglutinant for Pellicle, Pellicle, Exposure Original Plate with Pellicle, Method for Producing Semiconductor Device, Method for Producing Liquid Crystal Display Board, Method for Regenerating Exposure Original Plate, and Peeling Residue Reduction Method | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18352556 | MATERIALS AND METHODS FOR FORMING RESIST BOTTOM LAYER | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18618406 | PELLICLE FOR EUV LITHOGRAPHY | Non-Final OA | ASML NETHERLANDS B.V. |
| 18617149 | METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION | Non-Final OA | ASML NETHERLANDS B.V. |
| 17922768 | OPTICAL ELEMENT AND PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 17792464 | PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
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