Prosecution Insights
Last updated: April 19, 2026
Application No. 17/866,532

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME

Non-Final OA §102§103§112
Filed
Jul 17, 2022
Examiner
CHEN, DAVID Z
Art Unit
2815
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Taiwan Semiconductor Manufacturing Company Ltd.
OA Round
3 (Non-Final)
44%
Grant Probability
Moderate
3-4
OA Rounds
3y 9m
To Grant
94%
With Interview

Examiner Intelligence

Grants 44% of resolved cases
44%
Career Allow Rate
299 granted / 675 resolved
-23.7% vs TC avg
Strong +49% interview lift
Without
With
+49.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 9m
Avg Prosecution
63 currently pending
Career history
738
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
47.4%
+7.4% vs TC avg
§102
26.4%
-13.6% vs TC avg
§112
24.4%
-15.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 675 resolved cases

Office Action

§102 §103 §112
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Continued Examination Under 37 CFR 1.114 A request for continued examination under 37 CFR 1.114, including the fee set forth in 37 CFR 1.17(e), was filed in this application after final rejection. Since this application is eligible for continued examination under 37 CFR 1.114, and the fee set forth in 37 CFR 1.17(e) has been timely paid, the finality of the previous Office action has been withdrawn pursuant to 37 CFR 1.114. Applicant's submission filed on February 04, 2026 has been entered. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 24 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. As to claim 24, the limitation “the first surface of the first die” lacks antecedent basis. Thus, the limitation renders the claim indefinite and clarification is required. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim(s) 8-9, 11, 13-14, 21, 23, 28, and 30 are rejected under 35 U.S.C. 102(a)(1)(2) as being anticipated by U.S. Patent Application Publication No. 2016/0172268 A1 to Katkar et al. (“Katkar”). As to claim 8, Katkar discloses a semiconductor device, comprising: a first integrated circuit die (10); a plurality of heat dissipation patterns (120) on an outermost surface (112) of the first integrated circuit die (10), wherein at least one of the heat dissipation patterns (120) having a curved sidewall is in direct contact with the outermost surface (112) of the first integrated circuit die (10); and an encapsulant (110, 42), encapsulating the first integrated circuit die (10), wherein the encapsulant (110, 42) is disposed between the heat dissipation patterns (120) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). As to claim 9, Katkar further discloses wherein the heat dissipation patterns (120) each include a conductive paste, a conductive pattern (120) or combinations thereof (See ¶ 0029). As to claim 11, Katkar further discloses wherein the heat dissipation patterns (120) are arranged in an array (See Fig. 4, ¶ 0029). As to claim 13, Katkar further discloses wherein a surface of the encapsulant (110, 42) is substantially coplanar with surfaces of the heat dissipation patterns (120) (See Fig. 3, ¶ 0033). As to claim 14, Katkar further discloses wherein in a top view, a shape of the heat dissipation patterns (120) includes circle, rectangular, fusiform or combinations thereof, or the heat dissipation patterns are connected to form a net (See Fig. 3, Fig. 4). As to claim 21, Katkar discloses a semiconductor device, comprising: a first die (10), comprising a first interconnect structure (320); a plurality of heat dissipation patterns (120) disposed at an outermost surface (112) of the first die (10) and electrically isolated from the first interconnect structure (320), wherein at least one of the heat dissipation patterns (120) being spherical shaped is in direct contact with the outermost surface (112) of the first die (10); and an encapsulant (110, 42), encapsulating the first die (10) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). As to claim 23, Katkar further discloses wherein the encapsulant (110, 42) is disposed between the heat dissipation patterns (120), and first surfaces of the heat dissipation patterns (120) are substantially coplanar with a first surface of the encapsulant (110, 42) (See Fig. 3, ¶ 0033). As to claim 28, Katkar discloses a semiconductor device, comprising: a first die (10), comprising a first semiconductor substrate (semiconductor die of 10) having a first surface (112) and a second surface (111); a plurality of heat dissipation patterns (120) on the first surface (112) of the first semiconductor substrate (semiconductor die of 10), wherein at least one of the heat dissipation patterns (120) having a curved sidewall is in direct contact with the first surface (112) of the first die (10); and an interconnect substrate (40), wherein the first die (10) is electrically connected to the interconnect substrate (40) through the second surface (111) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). As to claim 30, Katkar discloses further comprising a first encapsulant (110, 42) encapsulating the first die (10) and disposed between the heat dissipation patterns (120) (See Fig. 5). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 10 and 27 are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent Application Publication No. 2016/0172268 A1 to Katkar et al. (“Katkar”) as applied to claims 8 and 21 above, and further in view of U.S. Patent Application Publication No. 2017/0162531 A1 to Ko et al. (“Ko”). The teaching of Katkar has been discussed above. As to claim 10, although Katkar discloses wherein the heat dissipation patterns (120) each include solder (See ¶ 0029), Katkar does not further disclose wherein the heat dissipation patterns each include silver powder. However, Ko does disclose wherein the heat dissipation patterns (3) each include silver powder (See Fig. 1, ¶ 0081, ¶ 0114). In view of the teaching of Ko, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Katkar to have wherein the heat dissipation patterns each include silver powder because silver powder along with solder are known thermal conductive materials to provide satisfactory heat dissipation (See Katkar and Ko). As to claim 27, although Katkar discloses wherein a material of the heat dissipation patterns (120) comprises a solder (See ¶ 0029), Katkar does not further disclose wherein the material of the heat dissipation patterns comprises a silver paste, a copper paste, a graphite paste or combinations thereof. However, Ko does disclose wherein the material of the heat dissipation patterns (3) comprises solders, a silver paste, a copper paste, a graphite paste or combinations thereof (See Fig. 1, ¶ 0081, ¶ 0114). In view of the teaching of Ko, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Katkar to have wherein a material of the heat dissipation patterns comprises a silver paste, a copper paste, a graphite paste or combinations thereof because silver paste, a copper paste, a graphite paste or combinations thereof along with solder are known thermal conductive materials to provide satisfactory heat dissipation (See Katkar and Ko). Claim(s) 8, 12, 21, 23, and 25 are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent Application Publication No. 2021/0125955 A1 to Suh et al. (“Suh”) in view of U.S. Patent Application Publication No. 2016/0172268 A1 to Katkar et al. (“Katkar”). As to claim 8, although Suh discloses a semiconductor device, comprising: a first integrated circuit die (700); and an encapsulant (600), encapsulating the first integrated circuit die (700) (See Fig. 6, ¶ 0078, ¶ 0079, ¶ 0081) Suh does not further disclose a plurality of heat dissipation patterns on an outermost surface of the first integrated circuit die, wherein at least one of the heat dissipation patterns having a curved sidewall is in direct contact with the outermost surface of the first integrated circuit die; and wherein the encapsulant is disposed between the heat dissipation patterns. However, Katkar does disclose a plurality of heat dissipation patterns (120) on an outermost surface (112) of the first integrated circuit die (10), wherein at least one of the heat dissipation patterns (120) having a curved sidewall is in direct contact with the outermost surface (112) of the first integrated circuit die (10); and wherein the encapsulant (110, 42) is disposed between the heat dissipation patterns (120) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). In view of the teaching of Katkar, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Suh to have a plurality of heat dissipation patterns on an outermost surface of the first integrated circuit die, wherein at least one of the heat dissipation patterns having a curved sidewall is in direct contact with the outermost surface of the first integrated circuit die; and wherein the encapsulant is disposed between the heat dissipation patterns because the heat dissipation patterns improve heat dissipation characteristics by providing vertical thermally conductive pathways away from the first integrated circuit die (See ¶ 0029). As to claim 12, Suh in view of Katkar further discloses wherein the encapsulant (600/110, 42) further encapsulates a second integrated circuit die (500), and surfaces of the heat dissipation patterns (120) are substantially coplanar with the second integrated circuit die (500) (See Suh Fig. 6 and Katkar ¶ 0033). As to claim 21, although Suh discloses a semiconductor device, comprising: a first die (700), comprising a first interconnect structure (720); and an encapsulant (600), encapsulating the first die (700) (See Fig. 6, ¶ 0078, ¶ 0079, ¶ 0080, ¶ 0081), Suh does not further disclose a plurality of heat dissipation patterns disposed at an outermost surface of the first die and electrically isolated from the first interconnect structure, wherein at least one of the heat dissipation patterns being spherical shaped is in direct contact with the outermost surface of the first die. However, Katkar does disclose a plurality of heat dissipation patterns (120) disposed at an outermost surface (112) of the first die (10) and electrically isolated from the first interconnect structure (320), wherein at least one of the heat dissipation patterns (120) being spherical shaped is in direct contact with the outermost surface (112) of the first die (10) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). In view of the teaching of Katkar, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Suh to have a plurality of heat dissipation patterns disposed at an outermost surface of the first die and electrically isolated from the first interconnect structure, wherein at least one of the heat dissipation patterns being spherical shaped is in direct contact with the outermost surface of the first die because the heat dissipation patterns improve heat dissipation characteristics by providing vertical thermally conductive pathways away from the first die (See ¶ 0029). As to claim 23, Suh in view of Katkar further discloses wherein the encapsulant (600/110, 42) is disposed between the heat dissipation patterns (120), and first surfaces of the heat dissipation patterns (120) are substantially coplanar with a first surface of the encapsulant (600/110, 42) (See Suh Fig. 6 and Katkar Fig. 3). As to claim 25, Suh in view of Katkar discloses further comprising a second die (500) encapsulated by the encapsulant (600/110, 42), wherein the first surfaces of the heat dissipation patterns (120) are substantially coplanar with a first surface of the second die (500) (See Suh Fig. 6 and Katkar ¶ 0033). Claim(s) 21-24 and 26 are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent Application Publication No. 2022/0293580 A1 to Park et al. (“Park”) in view of U.S. Patent Application Publication No. 2016/0172268 A1 to Katkar et al. (“Katkar”). As to claim 21, although Park discloses a semiconductor device, comprising: a first die (200), comprising a first interconnect structure (above 210); and an encapsulant (900), encapsulating the first die (200) (See Fig. 1, Fig. 4, ¶ 0022, ¶ 0023, ¶ 0024, ¶ 0026, ¶ 0028, ¶ 0094, ¶ 0100, ¶ 0101, ¶ 0102) (Notes: the first interconnect structure comprises elements providing interconnections), Park does not further disclose a plurality of heat dissipation patterns disposed at an outermost surface of the first die and electrically isolated from the first interconnect structure, wherein at least one of the heat dissipation patterns being spherical shaped is in direct contact with the outermost surface of the first die. However, Katkar does disclose a plurality of heat dissipation patterns (120) disposed at an outermost surface (112) of the first die (10) and electrically isolated from the first interconnect structure (320), wherein at least one of the heat dissipation patterns (120) being spherical shaped is in direct contact with the outermost surface (112) of the first die (10) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). In view of the teaching of Katkar, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Park to have a plurality of heat dissipation patterns disposed at an outermost surface of the first die and electrically isolated from the first interconnect structure, wherein at least one of the heat dissipation patterns being spherical shaped is in direct contact with the outermost surface of the first die because the heat dissipation patterns improve heat dissipation characteristics by providing vertical thermally conductive pathways away from the first die (See ¶ 0029). As to claim 22, Park in view of Katkar further discloses wherein the first die (200/10) further comprises a semiconductor substrate (210), and the first interconnect structure (above 210) is disposed between the semiconductor substrate (210) and the heat dissipation patterns (120) (See Park Fig. 1, Fig. 4, ¶ 0026 and Katkar Fig. 3). As to claim 23, Park in view of Katkar further discloses wherein the encapsulant (900/110, 42) is disposed between the heat dissipation patterns (120), and first surfaces of the heat dissipation patterns (120) are substantially coplanar with a first surface of the encapsulant (900/110, 42) (See Park Fig. 1, Fig. 4 and Katkar ¶ 0033). As to claim 24, Park in view of Katkar further discloses wherein second surfaces opposite to the first surfaces of the heat dissipation patterns (120) are substantially coplanar with a second surface opposite to the first surface of the encapsulant (900/110, 42) and a second surface opposite to the first surface of the first die (200/10) (See Park Fig. 1, Fig. 4 and Katkar Fig. 5). As to claim 26, Park in view of Katkar further discloses wherein the heat dissipation patterns (120) are in direct contact with the first interconnect structure (above 210) and disposed within a periphery of the first die (200/10) (See Park Fig. 1, Fig. 4 and Katkar Fig. 3). Claim(s) 28 and 30-34 are rejected under 35 U.S.C. 103 as being unpatentable over U.S. Patent Application Publication No. 2018/0254260 A1 to Wei et al. (“Wei”) in view of U.S. Patent Application Publication No. 2016/0172268 A1 to Katkar et al. (“Katkar”). As to claim 28, although Wei discloses a semiconductor device, comprising: a first die (202H of 20), comprising a first semiconductor substrate (200) having a first surface and a second surface; and an interconnect substrate (180), wherein the first die (202H of 20) is electrically connected to the interconnect substrate (180) through the second surface (See Fig. 1, ¶ 0022-¶ 0033, ¶ 0036-¶ 0044), Wei does not further disclose a plurality of heat dissipation patterns on the first surface of the first semiconductor substrate, wherein at least one of the heat dissipation patterns having a curved sidewall is in direct contact with the first surface of the first die. However, Katkar does disclose a plurality of heat dissipation patterns (120) on the first surface (112) of the first semiconductor substrate (at 10), wherein at least one of the heat dissipation patterns (120) having a curved sidewall is in direct contact with the first surface (112) of the first die (10) (See Fig. 3, Fig. 4, Fig. 5, ¶ 0027-¶ 0037). In view of the teaching of Katkar, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to modify the teaching of Wei to have a plurality of heat dissipation patterns on the first surface of the first semiconductor substrate, wherein at least one of the heat dissipation patterns having a curved sidewall is in direct contact with the first surface of the first die because the heat dissipation patterns improve heat dissipation characteristics by providing vertical thermally conductive pathways away from the first die (See ¶ 0029). As to claim 30, Wei in view of Katkar discloses further comprising a first encapsulant (110/110, 42) encapsulating the first die (202H of 20/10) and disposed between the heat dissipation patterns (120) (See Wei Fig. 1 and Katkar Fig. 3). As to claim 31, Wei discloses further comprising a second die (10, 202H of 30) and an underfill (108), wherein the second die (10, 202H of 30) is encapsulated by the first encapsulant (110) and electrically connected to the interconnect substrate (180), the underfill (108) is continuously disposed between the interconnect substrate (180) and the first die (202H of 20), between the interconnect substrate (180) and the second die (10, 202H of 30) and between the first die (202H of 20) and the second die (10, 202H of 30), and the first encapsulant (110) is overlapped with the underfill (108) between the first die (202H of 20) and the second die (10, 202 of 30) (See Fig. 1). As to claim 32, Wei discloses further comprising a second encapsulant (210) different from the first encapsulant (110), wherein the second encapsulant (210) is disposed between the second die (10, 202H of 30) and the first encapsulant (110) and between the second die (10, 202H of 30) and the underfill (108) (See Fig. 1). As to claim 33, Wei further discloses wherein the interconnect substrate (180) comprises a second semiconductor substrate (180), a plurality of through vias (182) penetrating through the second semiconductor substrate (180), an interconnect layer (106) at a first side of the second semiconductor substrate (180) and facing the first die (202H of 20) and a plurality of electrical connectors (114) electrically connected to the through vias (182) and at a second side opposite to the first side of the second semiconductor substrate (180) (See Fig. 1). As to claim 34, Wei further discloses wherein the first encapsulant (110) is continuously disposed between a sidewall of the first die (202H of 20) and a sidewall of the second die (10, 202H of 30), the underfill (108) is continuously disposed between the sidewall of the first die (202H of 20) and the sidewall of the second die (10, 202H of 30), and the first encapsulant (110) between the sidewall of the first die (202H of 20) and the sidewall of the second die (10, 202H of 30) is physically connected to the underfill (108) between the sidewall of the first die (202H of 20) and the sidewall of the second die (10, 202H of 30) (See Fig. 1). Response to Arguments Applicant's arguments with respect to claims 8, 21, and 28 have been considered but are moot in view of the new ground(s) of rejection. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DAVID CHEN whose telephone number is (571)270-7438. The examiner can normally be reached M-F 12-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, JOSHUA BENITEZ can be reached at (571) 270-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID CHEN/Primary Examiner, Art Unit 2815
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Prosecution Timeline

Jul 17, 2022
Application Filed
May 22, 2025
Non-Final Rejection — §102, §103, §112
Aug 28, 2025
Response Filed
Nov 21, 2025
Final Rejection — §102, §103, §112
Jan 12, 2026
Interview Requested
Jan 20, 2026
Examiner Interview Summary
Jan 20, 2026
Applicant Interview (Telephonic)
Feb 04, 2026
Request for Continued Examination
Feb 07, 2026
Response after Non-Final Action
Mar 28, 2026
Non-Final Rejection — §102, §103, §112 (current)

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Prosecution Projections

3-4
Expected OA Rounds
44%
Grant Probability
94%
With Interview (+49.2%)
3y 9m
Median Time to Grant
High
PTA Risk
Based on 675 resolved cases by this examiner. Grant probability derived from career allow rate.

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