Prosecution Insights
Last updated: October 23, 2026
Application No. 17/894,296

ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK

Final Rejection §103
Filed
Aug 24, 2022
Priority
Aug 24, 2021 — JP 2021-136616
Examiner
CROWELL, ANNA M
Art Unit
1716
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tokyo Electron Limited
OA Round
2 (Final)
44%
Grant Probability
Moderate
3-4
OA Rounds
0m
Est. Remaining
75%
With Interview

Examiner Intelligence

Grants 44% of resolved cases
44%
Career Allowance Rate
196 granted / 440 resolved
-20.5% vs TC avg
Strong +31% interview lift
Without
With
+30.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 10m
Avg Prosecution
26 currently pending
Career history
482
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
57.9%
+17.9% vs TC avg
§102
16.5%
-23.5% vs TC avg
§112
13.8%
-26.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 440 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, Species II (claims 1-2 and 5-9) in the reply filed on December 22, 2025 is acknowledged. Claims 3-4 and 10-15 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected species and invention, there being no allowable generic or linking claim. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 1-2, 5-7, and 9 is/are rejected under 35 U.S.C. 103 as being unpatentable over Maeta (U.S. 2021/0006182) in view of Mase et al. (U.S. 2019/0283212). Referring to Figures 1-3 and paragraphs [0063]-[0070],[0096]-[0102], Maeta discloses an electrostatic chuck 1 for electrostatically attracting a substrate, comprising: a chuck body 2 formed of first ceramic particles and having a substrate-facing surface facing the substrate attracted to the electrostatic chuck (par. [0061]); and a plurality of convex portions 22 formed on the substrate-facing surface of the chuck body (par.[0069]), wherein each of the plurality of convex portions is formed of second ceramic particles. Maeta is silent on ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less. Referring to Figure 6 and paragraphs [0051]-[0052], [0061], Mase et al. teach that it is conventionally known in the art for the ceramic particles of an electrostatic chuck to have a major axis diameter of 50 mm or more and 1,000 mm or less since it’s a conventionally known property used for a substrate suction surface of electrostatic chucks. Therefore, it would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to have modified the convex portion of Maeta to have ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less as taught by Mase et al. since it’s a conventionally known property used for a substrate suction surface of electrostatic chucks. Maeta is silent on convex portions having a porosity of 0.1% or more and 1.0% or less. Referring to column 13, lines 51-55 and column 14, lines 1-14, Kamitani et al. teach an electrostatic chuck wherein the chuck body has a porosity of 0.1% or more and 1.0% or less in order to prevent insulation breakdown from repetitive voltage impression. Therefore, it would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to have modified the convex portion of Maeta to have a porosity of 0.1% or more and 1.0% or less as taught by Kamitani et al. in order to prevent insulation breakdown from repetitive voltage impression. With respect to claim 2, the electrostatic chuck of Maeta further includes wherein a surface roughness of an endmost surface 22a of each of the plurality of convex portions 22 is 0.01 mm or less in terms of an arithmetic mean roughness (pars.[0096]-[0097]). With respect to claim 5, the electrostatic chuck of Maeta in view of Mase et al. and Kamitani et al., wherein each of the plurality of convex portions, including the tip-side layer, is entirely formed of the second ceramic particles having the major axis diameter of 50 mm or more and 1,000 mm or less, and has the porosity of 0.1% or more and 1.0% or less (Mase et al.-par.[0061]), Kamitani et al.- col. 13, lines 51-55 and col. 14, lines 1-14). With respect to claim 6, the electrostatic chuck of Maeta further includes wherein a surface roughness of the substrate-facing surface 11d of the chuck body is 0.01 mm or less in terms of an arithmetic mean roughness (par.[0202]). With respect to claim 7, a substrate support comprising: the electrostatic chuck of Maeta; and further includes a base 3 having an upper surface on which the electrostatic chuck is provided (par.[0061]). With respect to claim 9, referring to Figures 1-3 and paragraphs [0063]-[0070],[0096]-[0102], Maeta discloses an electrostatic chuck 1 for electrostatically attracting a substrate, comprising: a chuck body 2 formed of first ceramic particles and having a substrate-facing surface facing the substrate attracted to the electrostatic chuck (par.[0061]); and a plurality of convex portions 22 formed on the substrate-facing surface of the chuck body (par.[0069]), wherein the plurality of convex portions are formed by forming a layer of second ceramic particles on the substrate-facing surface of the chuck body, selectively irradiating portions of the layer of the second ceramic particles corresponding to the plurality of convex portions with light (par.[0192], i.e. laser) and subsequently removing unirradiated portions in the layer of the second ceramic particles (par.[0101]-[0102]). Maeta is silent on ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less. Referring to Figure 6 and paragraphs [0051]-[0052], [0061], Mase et al. teach that it is conventionally known in the art for the ceramic particles of an electrostatic chuck to have a major axis diameter of 50 mm or more and 1,000 mm or less since it’s a conventionally known property used for a substrate suction surface of electrostatic chucks. Therefore, it would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to have modified the irradiated portions of Maeta to have ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less as taught by Mase et al. since it’s a conventionally known property used for a substrate suction surface of electrostatic chucks. Maeta is silent on a porosity of the irradiated portions is set to 0.1% or more and 1.0% or less. Referring to column 13, lines 51-55 and column 14, lines 1-14, Kamitani et al. teach an electrostatic chuck wherein the chuck body has a porosity of 0.1% or more and 1.0% or less in order to prevent insulation breakdown from repetitive voltage impression. Therefore, it would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to have modified the irradiated portion of Maeta to have a porosity of 0.1% or more and 1.0% or less as taught by Kamitani et al. in order to prevent insulation breakdown from repetitive voltage impression. Claim(s) 8 is/are rejected under 35 U.S.C. 103 as being unpatentable over Maeta (U.S. 2021/0006182) in view of Mase et al. (U.S. 2019/0283212) and Kamitani et al. (U.S. 7,586,734) as applied to claims 1-2, 5-7, and 9 above, and further in view of Hayashi (U.S. 2015/0243541). The teachings of Maeta in view of Mase et al. and Kamitani et al. have been discussed above. Specifically, Maeta discloses a substrate support. Maeta in view of Mase et al. and Kamitani et al. is silent on a processing chamber configured to be depressurized and accommodate the substrate support. Referring to Figure 1 and paragraph [0034], Hayashi teaches that it is conventionally known in the art during substrate processing for a processing chamber to be configured to be depressurized and accommodate the substrate support. Therefore, it would have been obvious to one of ordinary skill in the art, before the effective filing date of the claimed invention, to have modified the apparatus of Maeta in view of Mase et al. and Kamitani et al. to include a processing chamber configured to be depressurized and accommodate the substrate support as taught by Hayashi since it is a conventionally known component used in substrate processing under vacuum conditions. Response to Arguments Applicant’s arguments have been considered but are moot because the new reference Mase et al. teach wherein each of the plurality of convex portions is formed of second ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Venkatraman et al.’592, Ito et al.’515, and Hiramatsu et al.’607 teach ceramic particles having a major axis diameter of 50 mm or more and 1,000 mm or less. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Michelle CROWELL whose telephone number is (571)272-1432. The examiner can normally be reached Monday-Thursday 10:00am-6:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Parviz Hassanzadeh can be reached at 571-272-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Michelle CROWELL/Examiner, Art Unit 1716 /SYLVIA MACARTHUR/Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Aug 24, 2022
Application Filed
Mar 09, 2026
Non-Final Rejection mailed — §103
Jun 30, 2026
Applicant Interview (Telephonic)
Jul 02, 2026
Examiner Interview Summary
Jul 09, 2026
Response Filed
Oct 08, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12770836
APPARATUS FOR TREATING SUBSTRATE
5y 4m to grant Granted Oct 20, 2026
Patent 12770831
ION SOURCE AND OPERATING METHOD THEREOF
3y 2m to grant Granted Oct 20, 2026
Patent 12763296
HEATED PEDESTAL WITH LOW IMPEDANCE RF ROD
3y 1m to grant Granted Oct 13, 2026
Patent 12757671
HEATING/COOLING DEVICE AND HEATING/COOLING METHOD
4y 6m to grant Granted Oct 06, 2026
Patent 12712158
METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
4y 1m to grant Granted Aug 18, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
44%
Grant Probability
75%
With Interview (+30.6%)
3y 10m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 440 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month