Prosecution Insights
Prosecution Insights
Tech Center 3700 • Art Units: 1712 1713 1716 1792 3722
This examiner grants 45% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18754531 | BARRIER LAYER REMOVAL DEVICE AND BARRIER LAYER REMOVAL METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18133277 | PLASMA ETCHING APPARATUS AND OPERATING METHOD THEREOF | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18773858 | Vapor Deposition Processes | Non-Final OA | ASM IP Holding B.V. |
| 18510043 | SYSTEMS AND APPARATUS FOR SEMICONDUCTOR EQUIPMENT | Non-Final OA | ASM IP Holding B.V. |
| 17729645 | REACTOR SYSTEMS AND METHODS FOR CLEANING REACTOR SYSTEMS | Non-Final OA | ASM IP Holding B.V. |
| 18227097 | SEMICONDUCTOR MANUFACTURING CHAMBER WITH PLASMA/GAS FLOW CONTROL DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company LTD |
| 18663897 | MAGNETIC HOLDING STRUCTURES FOR PLASMA PROCESSING APPLICATIONS | Non-Final OA | Applied Materials, Inc. |
| 18543302 | ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFILE CONTROL | Non-Final OA | Applied Materials, Inc. |
| 18227767 | PROCESS STACK FOR CVD PLASMA TREATMENT | Non-Final OA | Applied Materials, Inc. |
| 16134200 | SYSTEMS AND PROCESSES FOR PLASMA TUNING | Final Rejection | Applied Materials, Inc. |
| 18450625 | PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Final Rejection | Kioxia Corporation |
| 18789854 | HYDROPHOBIZATION TREATMENT APPARATUS, HYDROPHOBIZATION TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | Final Rejection | Tokyo Electron Limited |
| 18659116 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18240010 | PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18199401 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR ALIGNING RING MEMBER | Non-Final OA | Tokyo Electron Limited |
| 17734125 | ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM | Non-Final OA | Tokyo Electron Limited |
| 18512815 | CARBON CONTAINING PRECURSORS FOR BEAM-INDUCED DEPOSITION | Non-Final OA | FEI Company |
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