Tech Center 3700 • Art Units: 1712 1716 1792 3722
This examiner grants 45% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 17970163 | PLASMA CONTROL APPARATUS AND PLASMA PROCESSING SYSTEM | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17948943 | PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18543302 | ESC DESIGN WITH ENHANCED TUNABILITY FOR WAFER FAR EDGE PLASMA PROFILE CONTROL | Non-Final OA | Applied Materials, Inc. |
| 18099846 | FORMATION OF METALLIC FILMS ON ELECTROLESS METAL PLATING OF SURFACES | Final Rejection | Applied Materials, Inc. |
| 17370619 | SHOWERHEAD ASSEMBLY WITH RECURSIVE GAS CHANNELS | Final Rejection | Applied Materials, Inc. |
| 16134200 | SYSTEMS AND PROCESSES FOR PLASMA TUNING | Final Rejection | Applied Materials, Inc. |
| 18450625 | PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD | Non-Final OA | Kioxia Corporation |
| 18789854 | HYDROPHOBIZATION TREATMENT APPARATUS, HYDROPHOBIZATION TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18240010 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18199401 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR ALIGNING RING MEMBER | Non-Final OA | Tokyo Electron Limited |
| 17894296 | ELECTROSTATIC CHUCK, SUBSTRATE SUPPORT, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK | Non-Final OA | Tokyo Electron Limited |
| 17734125 | ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM | Final Rejection | Tokyo Electron Limited |
| 17272945 | MOUNTING BASE, SUBSTRATE PROCESSING DEVICE, EDGE RING, AND EDGE RING TRANSFER METHOD | Non-Final OA | Tokyo Electron Limited |
| 17641871 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Final Rejection | Hitachi High-Tech Corporation |
| 17729645 | REACTOR SYSTEMS AND METHODS FOR CLEANING REACTOR SYSTEMS | Non-Final OA | ASM IP Holding B.V. |
| 16815284 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Final Rejection | KOKUSAI ELECTRIC CORPORATION |
| 17894374 | SUBSTRATE TREATING APPARATUS | Final Rejection | SEMES CO., LTD. |
| 17335239 | APPARATUS FOR TREATING SUBSTRATE | Non-Final OA | SEMES CO., LTD. |
| 17604956 | ELECTROSTATIC CHUCK SYSTEM | Non-Final OA | Lam Research Corporation |
| 17221021 | Core-Shell Particles and Composite Material Synthesized Therefrom | Final Rejection | Persimmon Technologies Corporation |
| 18512815 | CARBON CONTAINING PRECURSORS FOR BEAM-INDUCED DEPOSITION | Non-Final OA | FEI Company |
| 17070735 | ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, AND PLASMA PROCESSING APPARATUS | Non-Final OA | ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA |
| 18236243 | Rigid Sapphire Based Direct Patterning Deposition Mask | Non-Final OA | eMagin Corporation |
| 18352506 | APPARATUS FOR TREATING SUBSTRATE | Non-Final OA | PSK INC. |
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