Prosecution Insights
Last updated: April 19, 2026
Application No. 17/962,009

SYSTEMS AND METHODS FOR PURGING REACTOR LOWER CHAMBERS WITH ETCHANTS DURING FILM DEPOSITION

Non-Final OA §112
Filed
Oct 07, 2022
Examiner
BENNETT, CHARLEE
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Asm Ip Holding B V
OA Round
1 (Non-Final)
57%
Grant Probability
Moderate
1-2
OA Rounds
3y 8m
To Grant
93%
With Interview

Examiner Intelligence

Grants 57% of resolved cases
57%
Career Allow Rate
309 granted / 539 resolved
-10.7% vs TC avg
Strong +36% interview lift
Without
With
+36.0%
Interview Lift
resolved cases with interview
Typical timeline
3y 8m
Avg Prosecution
56 currently pending
Career history
595
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
58.9%
+18.9% vs TC avg
§102
7.8%
-32.2% vs TC avg
§112
26.3%
-13.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 539 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I (1-9, 20) in the reply filed on 10/13/2025 is acknowledged. Claims 10-19 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected method (Group II), there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 10/13/2025. Applicant is reminded that upon the cancelation of claims to a non-elected invention, the inventorship must be corrected in compliance with 37 CFR 1.48(a) if one or more of the currently named inventors is no longer an inventor of at least one claim remaining in the application. A request to correct inventorship under 37 CFR 1.48(a) must be accompanied by an application data sheet in accordance with 37 CFR 1.76 that identifies each inventor by his or her legal name and by the processing fee required under 37 CFR 1.17(i). Drawings The drawings are objected to as failing to comply with 37 CFR 1.84(p)(5) because they do not include the following reference sign(s) mentioned in the description: 194. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. The drawings are objected to as failing to comply with 37 CFR 1.84(p)(4) because reference character “180” has been used to designate both rotation axis and (appears in Fig. 3 to point at a lift pin). Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. The drawings are objected to under 37 CFR 1.83(a). The drawings must show every feature of the invention specified in the claims. Therefore, the “etch header,” must be shown or the feature(s) canceled from the claim(s). No new matter should be entered. Corrected drawing sheets in compliance with 37 CFR 1.121(d) are required in reply to the Office action to avoid abandonment of the application. Any amended replacement drawing sheet should include all of the figures appearing on the immediate prior version of the sheet, even if only one figure is being amended. The figure or figure number of an amended drawing should not be labeled as “amended.” If a drawing figure is to be canceled, the appropriate figure must be removed from the replacement sheet, and where necessary, the remaining figures must be renumbered and appropriate changes made to the brief description of the several views of the drawings for consistency. Additional replacement sheets may be necessary to show the renumbering of the remaining figures. Each drawing sheet submitted after the filing date of an application must be labeled in the top margin as either “Replacement Sheet” or “New Sheet” pursuant to 37 CFR 1.121(d). If the changes are not accepted by the examiner, the applicant will be notified and informed of any required corrective action in the next Office action. The objection to the drawings will not be held in abeyance. Claim Interpretation The following is a quotation of 35 U.S.C. 112(f): (f) Element in Claim for a Combination. – An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof. The following is a quotation of pre-AIA 35 U.S.C. 112, sixth paragraph: An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof. The claims in this application are given their broadest reasonable interpretation using the plain meaning of the claim language in light of the specification as it would be understood by one of ordinary skill in the art. The broadest reasonable interpretation of a claim element (also commonly referred to as a claim limitation) is limited by the description in the specification when 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is invoked. As explained in MPEP § 2181, subsection I, claim limitations that meet the following three-prong test will be interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph: (A) the claim limitation uses the term “means” or “step” or a term used as a substitute for “means” that is a generic placeholder (also called a nonce term or a non-structural term having no specific structural meaning) for performing the claimed function; (B) the term “means” or “step” or the generic placeholder is modified by functional language, typically, but not always linked by the transition word “for” (e.g., “means for”) or another linking word or phrase, such as “configured to” or “so that”; and (C) the term “means” or “step” or the generic placeholder is not modified by sufficient structure, material, or acts for performing the claimed function. Use of the word “means” (or “step”) in a claim with functional language creates a rebuttable presumption that the claim limitation is to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites sufficient structure, material, or acts to entirely perform the recited function. Absence of the word “means” (or “step”) in a claim creates a rebuttable presumption that the claim limitation is not to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is not interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites function without reciting sufficient structure, material or acts to entirely perform the recited function. Claim limitations in this application that use the word “means” (or “step”) are being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action. Conversely, claim limitations in this application that do not use the word “means” (or “step”) are not being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action. This application includes one or more claim limitations that use the word “means” or “step” but are nonetheless not being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph because the claim limitation(s) recite(s) sufficient structure, materials, or acts to entirely perform the recited function. Such claim limitation(s) is/are: Computer program product (non-transitory memory with instructions para. [0073]) in claim 20. Because this/these claim limitation(s) is/are not being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, it/they is/are not being interpreted to cover only the corresponding structure, material, or acts described in the specification as performing the claimed function, and equivalents thereof. If applicant intends to have this/these limitation(s) interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, applicant may: (1) amend the claim limitation(s) to remove the structure, materials, or acts that performs the claimed function; or (2) present a sufficient showing that the claim limitation(s) does/do not recite sufficient structure, materials, or acts to perform the claimed function. Allowable Subject Matter Claims 1-9 are allowed. The following is a statement of reasons for the indication of allowable subject matter: The prior art of record (US 6153260 to Comita in view of US 6228781 to Murugesh) discloses a semiconductor processing system, comprising: a gas delivery module (gas intro side of 230/248/218, Fig. 2); a chamber body (212 [chamber]) connected to the gas delivery module (gas intro side of 230/248/218); a divider (228/284 [pre-heat ring]/[lower liner]) with an aperture (229 [gap]) fixed within an interior of the chamber body (212), the divider (228/284) separating an interior of the chamber body (212) into an upper chamber (222 [upper portion]) and a lower chamber (224 [lower portion]), the aperture (229) fluidly coupling the lower chamber to the upper chamber (c. 3, l. 36-58); a susceptor (220/226 [susceptor]/[shaft], Fig. 2) arranged within the aperture (229) and supported for within the interior of the chamber body (212) for rotation about a rotation axis (c. 3, l. 36-45); Murugesh discloses and a controller (60 [controller], Fig. 1A/1B) operably connected to the gas delivery module (33 [gas delivery system]) and having a non-transitory machine-readable memory with instructions recorded on the memory that cause the controller to (c. 7-8, l. 60-67, 1-15): flowing a cleaning gas to the lower chamber (lower 16) with a first flow including an etchant while etching the upper chamber of the chamber body (c. 2, l. 5-15). However the prior art of record fails to teach or suggest purging the lower chamber with a first purge flow including an etchant while etching the upper chamber, purge the lower chamber with a second purge flow including the etchant while depositing a precoat in the upper chamber of the chamber body; and purge the lower chamber with a third purge flow including the etchant while depositing a film onto a substrate in the upper chamber of the chamber body, as set forth in the pending claims. The apparatus of Comita in view of Murugesh fails to disclose the above limitations. Further, no other prior art was located that fairly suggested the claimed invention in whole or in part, along with the requisite motivation for combination, to anticipate or render the claimed invention obvious. This subject matter is therefore rendered allowable. Claim 20 is allowed. The following is a statement of reasons for the indication of allowable subject matter: The prior art of record discloses (US 20090111246 to Bauer in view of US 6228781 to Murugesh) a lower chamber etchant purge kit, comprising: an etchant conduit (gas line of 140 [valve], Fig. 7) configured to fluidly couple an etchant source to a chamber of a chamber body (122 [reaction chamber]); a tee fitting (not referenced but disclosed in Fig. 7 where the two gas lines cross) configured to fluidly couple a carrier/purge source (104 [carrier gas source]) to the etchant conduit (gas line of 140) for intermixing a carrier/purge gas with etchant flowing through the etchant conduit (gas line of 140, para. [0057-0058]); an etchant mass flow controller (MFC) (114 [MFC]) configured to control mass fraction of etchant intermixed with the carrier/purge gas provided to the chamber of the chamber body (122, para. [0058]); and a computer program product para. [0059]) including instructions that, when read by a controller (150 [central controller]), cause the controller to: Murugesh discloses and a controller (60 [controller], Fig. 1A/1B) operably connected to the gas delivery module (33 [gas delivery system]) and having a non-transitory machine-readable memory with instructions recorded on the memory that cause the controller to (c. 7-8, l. 60-67, 1-15): flowing a cleaning gas to the lower chamber (lower 16) with a first flow including an etchant while etching the upper chamber of the chamber body (c. 2, l. 5-15). However the prior art of record fails to teach or suggest purging the lower chamber with a first purge flow including an etchant while etching the upper chamber, purge the lower chamber with a second purge flow including the etchant while depositing a precoat in the upper chamber of the chamber body; and purge the lower chamber with a third purge flow including the etchant while depositing a film onto a substrate in the upper chamber of the chamber body, as set forth in the pending claims. The apparatus of Comita in view of Murugesh fails to disclose the above limitations. Further, no other prior art was located that fairly suggested the claimed invention in whole or in part, along with the requisite motivation for combination, to anticipate or render the claimed invention obvious. This subject matter is therefore rendered allowable. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. US 20220157604 discloses a purge gas inlet (364, Fig. 3) is disposed at an elevation below the gas injection plenum (314) and substrate support (307, para. [0045]). US 20220157602 discloses maintaining or reintroducing an oxygen-containing precursor (309, Fig. 3A) from beneath the support platen (320), and striking a capacitively coupled plasma between the support platen (320) and the showerhead (305, para. [0055]). US 20220130668 discloses purge gas source (144, Fig. 1) may be connected to the reactor (102), may include a purge gas (34), and may be configured flow the purge gas (34) through the lower chamber (120) of the reactor (102) intermixed with the halogen-containing gas (28, para. [0045]). Any inquiry concerning this communication or earlier communications from the examiner should be directed to Charlee J. C. Bennett whose telephone number is (571)270-7972. The examiner can normally be reached M-Th 10am-6pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at 5712725166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Charlee J. C. Bennett/Primary Examiner, Art Unit 1718
Read full office action

Prosecution Timeline

Oct 07, 2022
Application Filed
Mar 18, 2026
Non-Final Rejection — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12603249
SELECTIVE DEPOSITION USING DIFFERENTIAL SURFACE CHARGING
2y 5m to grant Granted Apr 14, 2026
Patent 12597589
ELECTROSTATIC CHUCK
2y 5m to grant Granted Apr 07, 2026
Patent 12592366
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME
2y 5m to grant Granted Mar 31, 2026
Patent 12584215
APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
2y 5m to grant Granted Mar 24, 2026
Patent 12584220
SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS
2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
57%
Grant Probability
93%
With Interview (+36.0%)
3y 8m
Median Time to Grant
Low
PTA Risk
Based on 539 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month